Treatment liquid and pattern forming method
US-12306538-B2 · May 20, 2025 · US
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Tsubaki Hideaki patents
Tsubaki Hideaki is listed as an inventor on 73 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Tsubaki Hideaki |
| Total patents | 73 |
| First publication | Jan 1, 2015 |
| Latest publication | May 20, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device
US-2024353753-A1 · Oct 24, 2024 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device
US-2024329531-A1 · Oct 3, 2024 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device
US-2024053679-A1 · Feb 15, 2024 · US
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device
US-11640113-B2 · May 2, 2023 · US
Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
US-11460769-B2 · Oct 4, 2022 · US
Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
US-11156915-B2 · Oct 26, 2021 · US
Treatment liquid and pattern forming method
US-2021200097-A1 · Jul 1, 2021 · US
Treatment liquid and pattern forming method
US-11042094-B2 · Jun 22, 2021 · US
Treatment liquid and pattern forming method
US-10962884-B2 · Mar 30, 2021 · US
Recent patents
Latest publications not already listed above.
Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device
US-10890847-B2 · Jan 12, 2021 · US
Pattern forming method and electronic device manufacturing method
US-10788754-B2 · Sep 29, 2020 · US
Pattern forming method, method for manufacturing electronic device, and laminate
US-10761426-B2 · Sep 1, 2020 · US
Pattern forming method, method for manufacturing electronic device, and laminate
US-10663864-B2 · May 26, 2020 · US
Rinsing liquid, pattern forming method, and electronic device manufacturing method
US-10599038-B2 · Mar 24, 2020 · US
Developer, pattern forming method, and electronic device manufacturing method
US-10562991-B2 · Feb 18, 2020 · US
Coating composition, antireflection film, manufacturing method therefor, laminate, and solar cell module
US-2019334037-A1 · Oct 31, 2019 · US
Pattern forming method and method for manufacturing electronic device
US-10394127-B2 · Aug 27, 2019 · US
Coating composition, antireflection film, laminate, method for manufacturing laminate, and solar cell module
US-2019233677-A1 · Aug 1, 2019 · US
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device
US-2019219921-A1 · Jul 18, 2019 · US
Resist composition, pattern forming method, and method of manufacturing electronic device
US-2019219922-A1 · Jul 18, 2019 · US
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device
US-2019187558-A1 · Jun 20, 2019 · US
Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
US-2019018317-A1 · Jan 17, 2019 · US
Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
US-2018364569-A1 · Dec 20, 2018 · US
Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
US-2018364568-A1 · Dec 20, 2018 · US
Pattern forming method and method for manufacturing electronic device
US-2018267404-A1 · Sep 20, 2018 · US
Treatment liquid and pattern forming method
US-2018217499-A1 · Aug 2, 2018 · US
Treatment liquid and pattern forming method
US-2018217503-A1 · Aug 2, 2018 · US
Developer, pattern forming method, and electronic device manufacturing method
US-2018186907-A1 · Jul 5, 2018 · US
Pattern forming method, method for manufacturing electronic device, and laminate
US-2018180996-A1 · Jun 28, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Fujifilm Corp | 73 |
| Tsubaki Hideaki | 6 |
| Takahashi Hidenori | 4 |
| Hirano Shuji | 3 |
| Ito Takayuki | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0392 | 60 |
| G03F7/0397 | 54 |
| G03F7/325 | 53 |
| G03F7/038 | 43 |
| G03F7/039 | 42 |