Organometallic solution based high resolution patterning compositions
US-2015056542-A1 · Feb 26, 2015 · US
Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
US11156915B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11156915-B2 |
| Application number | US-201816108893-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 22, 2018 |
| Priority date | Mar 24, 2016 |
| Publication date | Oct 26, 2021 |
| Grant date | Oct 26, 2021 |
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Abstract
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An actinic ray-sensitive or radiation-sensitive composition contains a cation including a metal atom and a ligand, in which the number of particles in liquid having particle diameters of 0.15 μm or less included in 1 mL of the actinic ray-sensitive or radiation-sensitive composition is 10 or less.
First claim
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What is claimed is: 1. An actinic ray-sensitive or radiation-sensitive composition comprising: a cation including a metal atom; and a ligand, wherein the number of particles in liquid having particle diameters of 0.15 μm or less included in 1 mL of the actinic ray-sensitive or radiation-sensitive composition is 10 or less. 2. The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , wherein the actinic ray-sensitive or radiation-sensitive composition contains a suboxide cation of a metal atom, a counter anion, a peroxide-based ligand, and water. 3. The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , wherein the actinic ray-sensitive or radiation-sensitive composition contains the cation including a metal atom, an organic ligand, and an organic solvent. 4. The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , wherein the metal atom is at least one selected from hafnium, zirconium, and tin. 5. The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , wherein the metal atom is at least one selected from hafnium and zirconium. 6. The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , wherein the metal atom is tin. 7. A method for purifying an actinic ray-sensitive or radiation-sensitive composition, comprising subjecting a solution of an actinic ray-sensitive or radiation-sensitive composition containing a cation including a metal atom and a ligand to circulation filtration using a filter of a polyethylene-based resin, wherein the number of particles in liquid having particle diameters of 0.15 μm or less included in 1 mL of the actinic ray-sensitive or radiation-sensitive composition after the circulation filtration is 10 or less. 8. The method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 7 , wherein the circulation filtration is performed using a filter of a polyamide-based resin in combination with the filter of a polyethylene-based resin. 9. The method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 8 , wherein a pore diameter of the filter of a polyethylene-based resin is 10 nm or less. 10. The method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 7 , wherein a pore diameter of the filter of a polyethylene-based resin is 10 nm or less. 11. A pattern forming method comprising the method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 7 . 12. A method for manufacturing an electronic device, comprising the pattern forming method according to claim 11 .
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Classifications
using a scanning corpuscular radiation beam, e.g. an electron beam · CPC title
Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title
Aqueous alkaline compositions · CPC title
- G03F7/0043Primary
Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof (G03F7/0044 takes precedence) · CPC title
Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title
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- What does patent US11156915B2 cover?
- An actinic ray-sensitive or radiation-sensitive composition contains a cation including a metal atom and a ligand, in which the number of particles in liquid having particle diameters of 0.15 μm or less included in 1 mL of the actinic ray-sensitive or radiation-sensitive composition is 10 or less.
- Who is the assignee on this patent?
- Fujifilm Corp
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0043. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Oct 26 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).