Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device

Patent metadata

Field	Value
Publication number	US-2019018317-A1
Application number	US-201816132671-A
Country	US
Kind code	A1
Filing date	Sep 17, 2018
Priority date	Mar 24, 2016
Publication date	Jan 17, 2019
Grant date	—

Abstract

An actinic ray-sensitive or radiation-sensitive composition, and an actinic ray-sensitive or radiation-sensitive composition obtained from a method for purifying an actinic ray-sensitive or radiation-sensitive composition and a method for producing an actinic ray-sensitive or radiation-sensitive composition contain a cation having a metal atom and a ligand, and have each of a content of sodium, a content of magnesium, and a content of iron of 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition. A pattern forming method includes the method for producing or purifying the actinic ray-sensitive or radiation-sensitive composition. A method for producing an electronic device includes the pattern forming method.

First claim

What is claimed is:

1 . An actinic ray-sensitive or radiation-sensitive composition comprising:
a cation having a metal atom; and a ligand, wherein a content of sodium is 50 ppm by mass or less with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive composition, a content of magnesium is 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition, and a content of iron is 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition.

2 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , containing a suboxide cation of the metal atom, a counter anion, a peroxide-based ligand, and water.

3 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , containing the cation having the metal atom, an organic ligand, and an organic solvent.

4 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom is at least one selected from the group consisting of hafnium, zirconium, and tin.

5 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom is at least one selected from the group consisting of hafnium and zirconium.

6 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom is tin.

7 . A method for purifying an actinic ray-sensitive or radiation-sensitive composition, comprising purifying the actinic ray-sensitive or radiation-sensitive composition containing a cation having a metal atom and a ligand until
a content of sodium reaches 50 ppm by mass or less with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive composition, a content of magnesium reaches 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition, and a content of iron reaches 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition.

8 . The method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 7 ,
wherein the purifying step is recrystallizing the actinic ray-sensitive or radiation-sensitive composition by the use of water or an organic solvent.

9 . The method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 8 ,
wherein the water or the organic solvent has a content of sodium of 50 ppm by mass or less with respect to the water or the organic solvent, a content of magnesium of 50 ppm by mass or less with respect to the water or the organic solvent, and a content of iron of 50 ppm by mass or less with respect to the water or the organic solvent.

10 . The method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 7 , further comprising measuring the contents of sodium, magnesium, and iron in the actinic ray-sensitive or radiation-sensitive composition by inductively coupled plasma mass spectrometry.

11 . A method for producing an actinic ray-sensitive or radiation-sensitive composition containing a cation having a metal atom and a ligand, comprising preparing an actinic ray-sensitive or radiation-sensitive composition by the use of a material obtained by purification such that:
a content of sodium is 50 ppm by mass or less with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive composition, a content of magnesium is 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition, and a content of iron is 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition.

12 . The method for producing an actinic ray-sensitive or radiation-sensitive composition according to claim 11 ,
wherein the purification is performed by recrystallizing the material by the use of water or an organic solvent.

13 . The method for producing an actinic ray-sensitive or radiation-sensitive composition according to claim 12 ,
wherein the water or the organic solvent has a content of sodium of 50 ppm by mass or less with respect to the water or the organic solvent, a content of magnesium of 50 ppm by mass or less with respect to the water or the organic solvent, and a content of iron of 50 ppm by mass or less with respect to the water or the organic solvent.

14 . The method for producing an actinic ray-sensitive or radiation-sensitive composition according to claim 11 , further comprising measuring the contents of sodium, magnesium, and iron in the actinic ray-sensitive or radiation-sensitive composition by inductively coupled plasma mass spectrometry.

15 . A pattern forming method comprising the method for purifying an actinic ray-sensitive or radiation-sensitive composition according to claim 7 .

16 . A pattern forming method comprising the method for producing an actinic ray-sensitive or radiation-sensitive composition according to claim 11 .

17 . A method for manufacturing an electronic device, comprising the pattern forming method according to claim 15 .

18 . A method for manufacturing an electronic device, comprising the pattern forming method according to claim 16 .

Assignees

• Fujifilm Corp

Inventors

• Tsubaki Hideaki
• Nihashi Wataru

Classifications

• G03F7/38

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title

• G03F7/0044 Primary

  involving an interaction between the metallic and non-metallic component, e.g. photodope systems · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• G03F7/2006

  using coherent light; using polarised light · CPC title

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title