Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device

Patent metadata

Field	Value
Publication number	US-2018364569-A1
Application number	US-201816109868-A
Country	US
Kind code	A1
Filing date	Aug 23, 2018
Priority date	Mar 24, 2016
Publication date	Dec 20, 2018
Grant date	—

Abstract

An actinic ray-sensitive or radiation-sensitive composition, and an actinic ray-sensitive or radiation-sensitive composition obtained by the method for producing an actinic ray-sensitive or radiation-sensitive composition each contain a cation having a metal atom, and a ligand, in which a value of σ represented by Equation (1) is 2.2 or less. A pattern forming method and the method for manufacturing an electronic device each use the actinic ray-sensitive or radiation-sensitive composition.

σ
=

∑

k
=
1

N



{

(

μ
-

X
k

)

2

×

y
k

}

(
1
)

First claim

What is claimed is:

1 . An actinic ray-sensitive or radiation-sensitive composition comprising:
a cation having a metal atom; and a ligand, wherein a value of σ represented by Equation (1) is 2.2 or less for a metal atom having the highest mass content ratio in the cation,

σ
=

∑

k
=
1

N



{

(

μ
-

X
k

)

2

×

y
k

}

(
1
)

in Equation (1),
N represents the number of the types of isotopes of the metal atom having the highest mass content ratio, and for N types of isotopes, the mass numbers are represented by x 1 , x 2 , x 3 , . . . , and x N in order from the smallest to the largest, and the existence ratios corresponding to these mass numbers are represented by y 1 , y 2 , y 3 , . . . , and y N , respectively, with y 1 +y 2 +y 3 + . . . +y N =1,
the average mass number μ is represented by Equation (2),
k represents an integer of 1 to N,
x k represents the mass number of the k-th isotope in order from the smallest mass number,
y k represents the existence ratio of the k-th isotope in order from the smallest mass number,

μ
=

∑

i
=
1

N



(

x
i

×

y
i

)

(
2
)

in Equation (2),
N represents the number of the types of isotopes of the metal atom having the highest mass content ratio,
i represents an integer of 1 to N,
x i represents the mass number of the i-th isotope in order from the smallest mass number, and
y i represents the existence ratio of the i-th isotope in order from the smallest mass number.

2 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , further comprising:
a counter anion, and water, wherein the cation having the metal atom having the highest mass content ratio is a suboxide cation of the metal atom and the ligand is a peroxide-based ligand.

3 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 , further comprising:
an organic solvent, wherein the ligand is an organic ligand.

4 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom having the highest mass content ratio is hafnium, zirconium, or tin.

5 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom having the highest mass content ratio is hafnium or zirconium.

6 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom having the highest mass content ratio is tin.

7 . The actinic ray-sensitive or radiation-sensitive composition according to claim 2 ,
wherein the metal atom having the highest mass content ratio is tin.

8 . The actinic ray-sensitive or radiation-sensitive composition according to claim 3 ,
wherein the metal atom having the highest mass content ratio is tin.

9 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom having the highest mass content ratio is hafnium and the value of σ is 1.2 or less.

10 . The actinic ray-sensitive or radiation-sensitive composition according to claim 2 ,
wherein the metal atom having the highest mass content ratio is hafnium and the value of σ is 1.2 or less.

11 . The actinic ray-sensitive or radiation-sensitive composition according to claim 3 ,
wherein the metal atom having the highest mass content ratio is hafnium and the value of π is 1.2 or less.

12 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom having the highest mass content ratio is zirconium and the value of σ is 1.2 or less.

13 . The actinic ray-sensitive or radiation-sensitive composition according to claim 2 ,
wherein the metal atom having the highest mass content ratio is zirconium and the value of σ is 1.2 or less.

14 . The actinic ray-sensitive or radiation-sensitive composition according to claim 3 ,
wherein the metal atom having the highest mass content ratio is zirconium and the value of σ is 1.2 or less.

15 . The actinic ray-sensitive or radiation-sensitive composition according to claim 1 ,
wherein the metal atom having the highest mass content ratio is tin and the value of σ is 1.8 or less.

16 . The actinic ray-sensitive or radiation-sensitive composition according to claim 2 ,
wherein the metal atom having the highest mass content ratio is tin and the value of σ is 1.8 or less.

17 . A method for producing the actinic ray-sensitive or radiation-sensitive composition according to claim 1 , comprising:
purifying the cation having the metal atom by gel filtration chromatography.

18 . The method for producing an actinic ray-sensitive or radiation-sensitive composition according to claim 17 , further comprising a step of measuring the existence ratios of isotopes of the metal atom in the cation by mass spectrometry.

Assignees

• Fujifilm Corp

Inventors

• Nihashi Wataru
• Tsubaki Hideaki

Classifications

• G03F7/2006

  using coherent light; using polarised light · CPC title

• G03F7/168

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title

• G03F7/0044 Primary

  involving an interaction between the metallic and non-metallic component, e.g. photodope systems · CPC title

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title

• G03F7/322

  Aqueous alkaline compositions · CPC title