Photoresist layer outgassing prevention
US-2024282577-A1 · Aug 22, 2024 · US
Non-aqueous compositions
Non-aqueous compositions · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/325 |
| Official title | {Non-aqueous compositions} |
| Display label | Non-aqueous compositions |
| Total patents | 1,572 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 156 |
| 2016 | 212 |
| 2017 | 164 |
| 2018 | 149 |
| 2019 | 129 |
| 2020 | 128 |
| 2021 | 114 |
| 2022 | 124 |
| 2023 | 120 |
| 2024 | 119 |
| 2025 | 127 |
| 2026 | 30 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method of manufacturing electronic device, and electronic device
US-2015378257-A1 · Dec 31, 2015 · US
Sulfonamide-containing photoresist compositions and methods of use
US-9223209-B2 · Dec 29, 2015 · US
Resist pattern-forming method, and radiation-sensitive resin composition
US-9223207-B2 · Dec 29, 2015 · US
Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device
US-2015362836-A1 · Dec 17, 2015 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
US-9213237-B2 · Dec 15, 2015 · US
Patterning process, resist composition, polymer, and monomer
US-9213235-B2 · Dec 15, 2015 · US
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound
US-2015355539-A1 · Dec 10, 2015 · US
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device
US-2015338732-A1 · Nov 26, 2015 · US
Pattern forming method, compound used therein, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
US-2015331314-A1 · Nov 19, 2015 · US
Photoresist and Method
US-2015331317-A1 · Nov 19, 2015 · US
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
US-9188862-B2 · Nov 17, 2015 · US
Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound
US-2015323866-A1 · Nov 12, 2015 · US
Resist underlayer film forming composition containing silicon having ester group
US-2015316849-A1 · Nov 5, 2015 · US
Resist performance for the negative tone develop organic development process
US-2015309415-A1 · Oct 29, 2015 · US
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
US-9170489-B2 · Oct 27, 2015 · US
Resist pattern-forming method, and radiation-sensitive resin composition
US-9170488-B2 · Oct 27, 2015 · US
Patterning process and resist composition
US-9164384-B2 · Oct 20, 2015 · US
Process for manufacturing resist composition and patterning process
US-2015286143-A1 · Oct 8, 2015 · US
Photoresist composition and process of producing photoresist pattern
US-2015286137-A1 · Oct 8, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/325?
- CPC G03F7/325 is the Cooperative Patent Classification code for “Non-aqueous compositions.”
- How many patents are filed under CPC G03F7/325 (Non-aqueous compositions)?
- Our database includes 1,572 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/325 growing?
- Publication counts under this code: 119 in 2024 vs 127 in 2025 (latest complete years).