Symmetric plasma process chamber
US-12555748-B2 · Feb 17, 2026 · US
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Rauf Shahid patents
Rauf Shahid is listed as an inventor on 109 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Rauf Shahid |
| Total patents | 109 |
| First publication | Feb 10, 2015 |
| Latest publication | Feb 17, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Shielding for immersed plasma source
US-2025292991-A1 · Sep 18, 2025 · US
Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber
US-12300473-B2 · May 13, 2025 · US
Reducing aspect ratio dependent etch with direct current bias pulsing
US-12237149-B2 · Feb 25, 2025 · US
Smart dynamic load simulator for rf power delivery control system
US-2024395505-A1 · Nov 28, 2024 · US
Smart dynamic load simulator for RF power delivery control system
US-12080519-B2 · Sep 3, 2024 · US
Reducing aspect ratio dependent etch with direct current bias pulsing
US-2024162007-A1 · May 16, 2024 · US
Symmetric VHF source for a plasma reactor
US-11935724-B2 · Mar 19, 2024 · US
Smart dynamic load simulator for rf power delivery control system
US-2023411119-A1 · Dec 21, 2023 · US
Symmetric vhf source for a plasma reactor
US-2023197406-A1 · Jun 22, 2023 · US
Recent patents
Latest publications not already listed above.
Symmetric VHF source for a plasma reactor
US-11587766-B2 · Feb 21, 2023 · US
Apparatus to reduce polymers deposition
US-11551965-B2 · Jan 10, 2023 · US
Substrate edge ring that extends process environment beyond substrate diameter
US-2022293397-A1 · Sep 15, 2022 · US
Symmetric plasma process chamber
US-2022254606-A1 · Aug 11, 2022 · US
Symmetric plasma process chamber
US-11315760-B2 · Apr 26, 2022 · US
Plasma chamber with a multiphase rotating modulated cross-flow
US-2022084794-A1 · Mar 17, 2022 · US
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
US-2022051910-A1 · Feb 17, 2022 · US
Showerhead with interlaced gas feed and removal and methods of use
US-11189502-B2 · Nov 30, 2021 · US
Symmetric vhf source for a plasma reactor
US-2021313147-A1 · Oct 7, 2021 · US
Plasma reactor with electrode array in ceiling
US-11114284-B2 · Sep 7, 2021 · US
Ion-ion plasma atomic layer etch process
US-11101113-B2 · Aug 24, 2021 · US
Symmetric VHF source for a plasma reactor
US-11043361-B2 · Jun 22, 2021 · US
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
US-10811226-B2 · Oct 20, 2020 · US
Electrostatic chuck with variable pixelated magnetic field
US-10790180-B2 · Sep 29, 2020 · US
Electrostatic chuck for high bias radio frequency (rf) power application in a plasma processing chamber
US-2020286717-A1 · Sep 10, 2020 · US
Apparatus and methods for reducing particles in semiconductor process chambers
US-10770269-B2 · Sep 8, 2020 · US
Apparatus to reduce polymers deposition
US-2020185256-A1 · Jun 11, 2020 · US
Symmetric plasma process chamber
US-2020185192-A1 · Jun 11, 2020 · US
Symmetric plasma process chamber
US-10615006-B2 · Apr 7, 2020 · US
Cooling base with spiral channels for ESC
US-10586718-B2 · Mar 10, 2020 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 109 |
| Rauf Shahid | 4 |
| Dorf Leonid | 2 |
| Collins Kenneth S | 2 |
| Misra Nipun | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H05H1/46 | 42 |
| H01J37/32082 | 36 |
| H01J37/3244 | 34 |
| H01J37/32834 | 33 |
| H01J37/32715 | 33 |