Full beam metrology for x-ray scatterometry systems
US-12320763-B2 · Jun 3, 2025 · US
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Veldman Andrei patents
Veldman Andrei is listed as an inventor on 31 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Veldman Andrei |
| Total patents | 31 |
| First publication | Apr 30, 2015 |
| Latest publication | Jun 3, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Optical metrology tool equipped with modulated illumination sources
US-11913874-B2 · Feb 27, 2024 · US
Full Beam Metrology For X-Ray Scatterometry Systems
US-2022268714-A1 · Aug 25, 2022 · US
Full beam metrology for x-ray scatterometry systems
US-11313816-B2 · Apr 26, 2022 · US
Visualization of three-dimensional semiconductor structures
US-11099137-B2 · Aug 24, 2021 · US
Optimizing computational efficiency by multiple truncation of spatial harmonics
US-11086288-B2 · Aug 10, 2021 · US
Methods and systems for characterization of an x-ray beam with high spatial resolution
US-11073487-B2 · Jul 27, 2021 · US
Optical metrology tool equipped with modulated illumination sources
US-2021223166-A1 · Jul 22, 2021 · US
Optical metrology tool equipped with modulated illumination sources
US-10969328-B2 · Apr 6, 2021 · US
Visualization of Three-Dimensional Semiconductor Structures
US-2020393386-A1 · Dec 17, 2020 · US
Recent patents
Latest publications not already listed above.
Visualization of three-dimensional semiconductor structures
US-10794839-B2 · Oct 6, 2020 · US
Full Beam Metrology For X-Ray Scatterometry Systems
US-2020300790-A1 · Sep 24, 2020 · US
Full beam metrology for X-ray scatterometry systems
US-10775323-B2 · Sep 15, 2020 · US
Visualization of Three-Dimensional Semiconductor Structures
US-2020271595-A1 · Aug 27, 2020 · US
Hybrid metrology for patterned wafer characterization
US-10712145-B2 · Jul 14, 2020 · US
Phase revealing optical and X-ray semiconductor metrology
US-10677586-B2 · Jun 9, 2020 · US
Phase Revealing Optical and X-Ray Semiconductor Metrology
US-2020080836-A1 · Mar 12, 2020 · US
Optical Metrology Tool Equipped with Modulated Illumination Sources
US-2019195782-A1 · Jun 27, 2019 · US
Optimizing Computational Efficiency By Multiple Truncation Of Spatial Harmonics
US-2019129376-A1 · May 2, 2019 · US
Optical metrology tool equipped with modulated illumination sources
US-10215688-B2 · Feb 26, 2019 · US
Optimizing computational efficiency by multiple truncation of spatial harmonics
US-10185303-B2 · Jan 22, 2019 · US
Methods And Systems For Characterization Of An X-Ray Beam With High Spatial Resolution
US-2018328868-A1 · Nov 15, 2018 · US
Hybrid Metrology For Patterned Wafer Characterization
US-2018112968-A1 · Apr 26, 2018 · US
Full Beam Metrology For X-Ray Scatterometry Systems
US-2018106735-A1 · Apr 19, 2018 · US
Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
US-9885962-B2 · Feb 6, 2018 · US
Optical Metrology Tool Equipped with Modulated Illumination Sources
US-2017016815-A1 · Jan 19, 2017 · US
Computation efficiency by iterative spatial harmonics order truncation
US-9523800-B2 · Dec 20, 2016 · US
Optimizing Computational Efficiency By Multiple Truncation Of Spatial Harmonics
US-2016246285-A1 · Aug 25, 2016 · US
Optical metrology tool equipped with modulated illumination sources
US-9400246-B2 · Jul 26, 2016 · US
Metrology system optimization for parameter tracking
US-9255877-B2 · Feb 9, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kla Tencor Corp | 23 |
| Kla Corp | 10 |
| Veldman Andrei | 1 |
| Hench John J | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G01B2210/56 | 15 |
| G03F7/70633 | 13 |
| G01N21/211 | 12 |
| G01N2021/213 | 12 |
| G01N21/9501 | 11 |