Optimizing computational efficiency by multiple truncation of spatial harmonics

Patent metadata

Field	Value
Publication number	US-11086288-B2
Application number	US-201816232479-A
Country	US
Kind code	B2
Filing date	Dec 26, 2018
Priority date	Feb 21, 2015
Publication date	Aug 10, 2021
Grant date	Aug 10, 2021

Abstract

Methods and systems for solving measurement models of complex device structures with reduced computational effort and memory requirements are presented. The computational efficiency of electromagnetic simulation algorithms based on truncated spatial harmonic series is improved for periodic targets that exhibit a fundamental spatial period and one or more approximate periods that are integer fractions of the fundamental spatial period. Spatial harmonics are classified according to each distinct period of the target exhibiting multiple periodicity. A distinct truncation order is selected for each group of spatial harmonics. This approach produces optimal, sparse truncation order sampling patterns, and ensures that only harmonics with significant contributions to the approximation of the target are selected for computation. Metrology systems employing these techniques are configured to measure process parameters and structural and material characteristics associated with different semiconductor fabrication processes.

First claim

What is claimed is:

1. A measurement system comprising:
an illumination source configured to provide an amount of illumination light to a periodic metrology target having multiple spatial periods including a first spatial period and a second spatial period in a first direction of the periodic metrology target, wherein a ratio of the first spatial period and the second spatial period is a ratio of two integers;
a detector configured to receive an amount of collected light from the periodic metrology target in response to the amount of illumination light and generate a plurality of measured signals; and
one or more computing systems configured to:
receive an indication of the multiple spatial periods of the periodic metrology target;
classify a plurality of spatial harmonics associated with the periodic metrology target into a plurality of different groups according to each of the multiple spatial periods of the periodic metrology target, wherein each group of spatial harmonics has a different harmonic spacing; and
select a truncation order associated with each of the plurality of different groups of spatial harmonics.

2. The measurement system of claim 1 , wherein the one or more computing systems are further configured to:
receive the plurality of measured signals from the detector; and
perform a regression analysis to estimate one or more parameters of interest of the periodic metrology target based on a fitting of a measurement model simulated at the selected truncation orders to the measured signals, wherein the measurement model simulated at the selected truncation orders includes an electromagnetic simulator utilizing a Fourier expansion of the periodic metrology target in terms of the plurality of spatial harmonics.

3. The measurement system of claim 1 , wherein the indication of the multiple spatial periods of the metrology target is received from a user.

4. The measurement system of claim 1 , further comprising:
determining each of the multiple spatial periods of the periodic metrology target.

5. The measurement system of claim 4 , wherein the determining of each of the multiple spatial periods of the periodic metrology target involves:
computing a Fourier series of spatial harmonics of a material property of the periodic metrology target that affects electromagnetic wave scattering from the periodic metrology target geometry to a relatively high truncation order; and
analyzing the amplitudes of each of the spatial harmonics of the Fourier series.

6. The measurement system of claim 4 , wherein the determining of each of the multiple spatial periods of the periodic metrology target involves an analysis of the geometry of the periodic metrology target.

7. The measurement system of claim 6 , wherein the illumination source is an x-ray illumination source.

8. The measurement system of claim 4 , wherein the determining of each of the multiple spatial periods of the periodic metrology target involves an analysis of the plurality of measured signals.

9. The measurement system of claim 1 , wherein the selecting of the truncation order associated with each of the plurality of different groups of spatial harmonics involves:
determining an amplitude of each of the spatial harmonics of each of the plurality of different groups; and
selecting the truncation order associated with each of the plurality of different groups based on a rate of decay of the amplitude of the spatial harmonics of each of the plurality of different groups.

10. The measurement system of claim 1 , wherein the selecting of the truncation order associated with each of the plurality of different groups of spatial harmonics involves:
performing a separate convergence test for each of the plurality of different groups of spatial harmonics using an electromagnetic simulator that utilizes a Fourier expansion of the periodic metrology target in terms of the plurality of spatial harmonics.

11. The measurement system of claim 1 , wherein the periodic metrology target having multiple spatial periods in the first direction of the target, also includes multiple spatial periods in a second direction, different from the the first direction, wherein the multiple spatial periods in the second direction includes a first spatial period and a second spatial period in the second direction of the periodic metrology target, wherein a ratio of the first spatial period in the second direction and the second spatial period in the second direction is a ratio of two integers.

12. The measurement system of claim 1 , wherein a different truncation order is associated with each of the plurality of different groups of spatial harmonics.

13. The measurement system of claim 1 , wherein the periodic metrology target includes a first periodic structure having a relatively small pitch and a second periodic structure having a different, relatively small pitch, wherein a combination of the first periodic structure and the second periodic structure is a combined structure having a relatively large pitch.

14. The measurement system of claim 1 , wherein the periodic metrology target includes a first structure having a finite number of periods of relatively small pitch and a second structure having a relatively large pitch, wherein the second structure includes the first structure.

15. A method for improving electromagnetic computation efficiency in metrology, the method comprising:
receiving an indication of multiple spatial periods of a periodic metrology target including a fundamental spatial period and one or more approximate spatial periods in a first direction of the periodic metrology target, wherein each of the one or more approximate spatial periods is an integer fraction of the fundamental spatial period;
classifying a plurality of spatial harmonics associated with the periodic metrology target into a plurality of different groups according to each of the multiple spatial periods of the periodic metrology target, wherein each group of spatial harmonics has a different harmonic spacing; and
selecting a separate truncation order for each of the different groups of spatial harmonics.

16. The method of claim 15 , further comprising:
receiving a plurality of measurement signals of the periodic metrology target from a measurement system; and
performing a regression analysis to estimate one or more parameters of interest of the periodic metrology target based on a fitting of a measurement model simulated at the selected truncation orders to the plurality of measurement signals, wherein the measurement model simulated at the selected truncation orders includes an electromagnetic simulator utilizing a Fourier expansion of the periodic metrology target in terms of the plurality of spatial harmonics.

17. The method of claim 15 , further comprising:
determining each of multiple spatial periods of the metrology target, wherein the determining involves:
computing a Fourier series of spatial harmonics of a dielectric permittivity of the periodic metrology target geometry to a relatively high truncation order; and
analyzing the amplitudes of each of the spatial harmonics.

18. The method of claim 15 , wherein the selecting of the separate truncation order associated with each of the plurality of different groups of spatial harmonics involves:
performing a separate convergence test for each of the plurality of different groups of spatial harmonics using an electromagnetic simulator that utilizes a Fourier expansion of the periodic metrology target in terms of the plurality of spatial harmonics.

Assignees

• Kla Tencor Corp

Inventors

• Veldman Andrei

Classifications

• G03F7/70508

  Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus · CPC title

• G03F7/706847

  Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG] · CPC title

• G03F7/706851

  Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection · CPC title

• G03F7/706839

  Modelling, e.g. modelling scattering or solving inverse problems · CPC title

• G03F7/70633

  Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching · CPC title