Metrology system optimization for parameter tracking

Patent metadata

Field	Value
Publication number	US-9255877-B2
Application number	US-201414278224-A
Country	US
Kind code	B2
Filing date	May 15, 2014
Priority date	May 21, 2013
Publication date	Feb 9, 2016
Grant date	Feb 9, 2016

Abstract

Methods and systems for evaluating the capability of a measurement system to track measurement parameters through a given process window are presented herein. Performance evaluations include random perturbations, systematic perturbations, or both to effectively characterize the impact of model errors, metrology system imperfections, and calibration errors, among others. In some examples, metrology target parameters are predetermined as part of a Design of Experiments (DOE). Estimated values of the metrology target parameters are compared to the known DOE parameter values to determine the tracking capability of the particular measurement. In some examples, the measurement model is parameterized by principal components to reduce the number of degrees of freedom of the measurement model. In addition, exemplary methods and systems for optimizing the measurement capability of semiconductor metrology systems for metrology applications subject to process variations are presented.

First claim

What is claimed is:

1. A method comprising:
receiving a measurement model characterizing a response of a metrology system to a measurement of a metrology target onto a computing system, wherein the measurement model includes one or more parameters of interest characterizing the metrology target and one or more system parameters characterizing the metrology system, the computing system configured to:
determine a set of known values associated with any of the one or more parameters of interest that span a desired process window associated with the metrology target;
determine a set of perturbed synthetic measurement signals based on a set of simulations of the measurement model characterizing a set of measurements of the metrology target for each of the set of known values of any of the one or more parameters of interest and at least one perturbation signal;
determine estimated values associated with each of the one or more parameters of interest based on the set of perturbed synthetic measurement signals;
determine a metric indicative of a parameter tracking performance of the metrology system based on the estimated values associated with each of the one or more parameters of interest and the known values associated with each of the one or more parameters of interest; and
store the metric in a memory.

2. The method of claim 1 , wherein the at least one pertubation signal is indicative of a systematic perturbation of the metrology system.

3. The method of claim 1 , wherein the at least one pertubation signal is indicative of a random perturbation of the metrology system.

4. The method of claim 1 , further comprising:
changing a parameterization of the measurement model based on a value of the metric indicative of a parameter tracking performance of the metrology system.

5. The method of claim 1 , further comprising:
changing a metrology target structure based on a value of the metric indicative of a parameter tracking performance of the metrology system.

6. The method of claim 1 , further comprising:
changing a structure of the metrology system based on a value of the metric indicative of a parameter tracking performance of the metrology system.

7. The method of claim 1 , further comprising:
changing a combination of measurement modalities of the metrology system based on a value of the metric indicative of a parameter tracking performance of the metrology system.

8. The method of claim 1 , wherein the determining of the estimated values associated with each of the one or more parameters of interest based on the set of synthetic measurement signals involves transforming the measurement model parameterization to a set of principal components.

9. The method of claim 1 , wherein at least one of the parameters of interest is a process parameter.

10. The method of claim 1 , wherein the determining the estimated values associated with each of the one or more parameters of interest involves a non-linear regression of the measurement model.

11. A metrology system comprising:
an illumination source;
a detector; and
a computing system configured to
receive a measurement model characterizing a response of a metrology system to a measurement of a metrology target, wherein the measurement model includes one or more parameters of interest characterizing the metrology target and one or more system parameters characterizing the metrology system;
determine a set of known values associated with any of the one or more parameters of interest that span a desired process window associated with the metrology target;
determine a set of perturbed synthetic measurement signals based on a set of simulations of the measurement model characterizing a set of measurements of the metrology target for each of the set of known values of any of the one or more parameters of interest and at least one perturbation signal;
determine estimated values associated with each of the one or more parameters of interest based on the set of perturbed synthetic measurement signals;
determine a metric indicative of a parameter tracking performance of the metrology system based on the estimated values associated with each of the one or more parameters of interest and the known values associated with each of the one or more parameters of interest; and
store the metric in a memory.

12. The metrology system of claim 11 , wherein the computing system is further configured to:
change a parameterization of the measurement model based on a value of the metric indicative of a parameter tracking performance of the metrology system.

13. The metrology system of claim 11 , wherein the computing system is further configured to:
change a metrology target structure based on a value of the metric indicative of a parameter tracking performance of the metrology system.

14. The metrology system of claim 11 , wherein the computing system is further configured to:
change a structure of the metrology system based on a value of the metric indicative of a parameter tracking performance of the metrology system.

15. The metrology system of claim 11 , wherein the computing system is further configured to:
change a combination of measurement modalities of the metrology system based on a value of the metric indicative of a parameter tracking performance of the metrology system.

16. The metrology system of claim 11 , wherein the determining of the estimated values associated with each of the one or more parameters of interest based on the set of synthetic measurement signals involves transforming the measurement model parameterization to a set of principal components.

17. A metrology system comprising:
a computing system; and
a non-transitory, computer-readable medium including, code for causing the computing system to:
receive a measurement model characterizing a response of a metrology system to a measurement of a metrology target, wherein the measurement model includes one or more parameters of interest characterizing the metrology target and one or more system parameters characterizing the metrology system;
determine a set of known values associated with any of the one or more parameters of interest that span a desired process window associated with the metrology target;
determine a set of perturbed synthetic measurement signals based on a set of simulations of the measurement model characterizing a set of measurements of the metrology target for each of the set of known values of any of the one or more parameters of interest and at least one perturbation signal;
determine estimated values associated with each of the one or more parameters of interest based on the set of perturbed synthetic measurement signals;
determine a metric indicative of a parameter tracking performance of the metrology system based on the estimated values associated with each of the one or more parameters of interest and the known values associated with each of the one or more parameters of interest; and
store the metric in a memory.

18. The metrology system of claim 17 , wherein the determining of the estimated values associated with each of the one or more parameters of interest based on the set of synthetic measurement signals involves transforming the measurement model parameterization to a set of principal components.

19. The metrology system of claim 17 , wherein at least one of the parameters of interest is a process parameter.

20. The metrology system of claim 17 , wherein the determining the estimated values associated with each of the one or more parameters of interest

Assignees

• Kla Tencor Corp

Inventors

• Veldman Andrei
• Shchegrov Andrei V
• Brady Gregory
• Dziura Thaddeus Gerard
• Pandev Stilian Ivanov
• Kuznetsov Alexander

Classifications

• G01B11/0625

  with measurement of absorption or reflection · CPC title

• G01N21/211 Primary

  Ellipsometry (optical thickness measurement G01B11/06) · CPC title

• G01B2210/56

  Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth · CPC title

• G01N2021/213

  Spectrometric ellipsometry · CPC title

• G01N21/9501

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title