Optical metrology tool equipped with modulated illumination sources

Patent metadata

Field	Value
Publication number	US-10215688-B2
Application number	US-201615217549-A
Country	US
Kind code	B2
Filing date	Jul 22, 2016
Priority date	Oct 11, 2011
Publication date	Feb 26, 2019
Grant date	Feb 26, 2019

Abstract

The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.

First claim

What is claimed:

1. An optical metrology tool, comprising:
a first illumination source configured to generate illumination of a first wavelength;
at least one additional illumination source configured to generate illumination of an additional wavelength, the additional wavelength different from the first wavelength, the first illumination source and the at least one additional illumination source configured to illuminate a surface of a sample disposed on a sample stage;
a set of illumination optics configured to direct illumination of the first wavelength and illumination of the at least one additional wavelength from the first illumination source and the at least one additional illumination source to the surface of the sample;
a set of collection optics;
a detector configured to detect at least a portion of illumination emanating from a surface of the sample, wherein the set of collection optics is configured to direct illumination emanating from the surface of the sample to the detector; and
a modulation control system communicatively coupled to the first illumination source and the at least one additional illumination source, wherein the modulation control system is configured to modulate a drive current of the first illumination source in order to generate a first illumination waveform of the first wavelength, wherein the modulation control system is configured to modulate a drive current of the at least one additional illumination source in order to generate an additional illumination waveform of the additional wavelength, wherein pulses of the first illumination waveform are interleaved in time with at least pulses of the additional illumination waveform, the first illumination waveform and the additional illumination waveform having a selected waveform frequency.

2. The optical metrology tool of claim 1 , wherein at least one of the first illumination source and the at least one additional illumination source comprises:
one or more lasers.

3. The optical metrology tool of claim 2 , wherein the one or more lasers comprise:
one or more semiconductor diode lasers.

4. The optical metrology tool of claim 2 , wherein the one or more lasers comprise:
one or more diode-pumped solid-state lasers.

5. The optical metrology tool of claim 1 , wherein at least one of the first illumination source and the at least one additional illumination source comprises:
one or more light-emitting diodes (LEDs).

6. The optical metrology tool of claim 1 , wherein at least one of the first illumination source and the at least one additional illumination source comprises:
one or more broadband sources.

7. The optical metrology tool of claim 6 , further comprising:
one or more spectral filters configured to filter an output of the one or more broadband sources.

8. The optical metrology tool of claim 1 , wherein the first illumination source includes a broadband source and the at least one additional illumination source includes a narrowband source, wherein pulses of the broadband source are interleaved in time with the pulses of the narrow band source.

9. The optical metrology tool of claim 1 , wherein the control system is further configured to control a duty cycle of the first illumination source and a duty cycle of the at least one additional illumination source in order to control a selected power balance between one or more pulses of the first illumination waveform and one or more pulses of the additional illumination waveform.

10. The optical metrology tool of claim 1 , wherein the control system is further configured to control a peak power output of the first illumination source and a peak power output of the at least one additional illumination source in order to control a selected power balance between one or more pulses of the first illumination waveform and one or more pulses of the additional illumination waveform.

11. The optical metrology tool of claim 1 , wherein the modulation control system is further configured to modulate a drive current of at least one of the first illumination source and the at least one additional illumination source at a selected modulation frequency in order to modulate an output of the at least one of the first illumination source and the at least one additional illumination source, the selected modulation frequency suitable for generating illumination having a coherence length below a selected level.

12. The optical metrology tool of claim 11 , wherein the selected modulation frequency is greater than the selected waveform frequency of the first illumination waveform and the additional illumination waveform.

13. The optical metrology tool of claim 1 , wherein the first illumination source, the at least one additional illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in a reflectometry geometry.

14. The optical metrology tool of claim 13 , wherein the modulatable illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in at least one of an angle-resolved reflectometry geometry and a spectroscopic reflectometry geometry.

15. The optical metrology tool of claim 1 , wherein the first illumination source, the at least one additional illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in a scatterometry geometry.

16. The optical metrology tool of claim 1 , wherein the first illumination source, the at least one additional illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in an ellipsometry geometry.

17. The optical metrology tool of claim 1 , wherein the detector comprises:
at least one of a CCD array, a CMOS array, a one-dimensional photodiode array, and a two-dimensional photodiode array.

18. The optical metrology tool of claim 1 , wherein the detector is synchronized with the control system.

19. The optical metrology tool of claim 1 , further comprising:
a spectral monitoring system configured to monitor one or more spectral characteristics of illumination of at least one of the first illumination source and the at least one additional illumination source, the spectral monitoring system further configured to transmit a signal indicative of one or more spectral characteristics of illumination of at least one of the first illumination source and the at least one additional illumination source to the modulation control system.

Assignees

• Kla Tencor Corp

Inventors

• Shchegrov Andrei V
• Rotter Lawrence D
• Wang David Y
• Veldman Andrei
• Peterlinz Kevin
• Brady Gregory
• Shaughnessy Derrick A

Classifications

• G01N21/4738

  Diffuse reflection (precedence is given to G01N21/55 - G01N21/57 if specular component is taken into consideration), e.g. also for testing fluids, fibrous materials · CPC title

• G03F7/70633

  Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching · CPC title

• G01B11/0616 Primary

  of coating · CPC title

• G01N21/211 Primary

  Ellipsometry (optical thickness measurement G01B11/06) · CPC title

• G01N21/45

  using interferometric methods; using Schlieren methods · CPC title