Optical metrology tool equipped with modulated illumination sources

Patent metadata

Field	Value
Publication number	US-11913874-B2
Application number	US-202117222330-A
Country	US
Kind code	B2
Filing date	Apr 5, 2021
Priority date	Oct 11, 2011
Publication date	Feb 27, 2024
Grant date	Feb 27, 2024

Abstract

The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.

First claim

What is claimed:

1. An optical metrology tool, comprising:
a modulatable pumping source configured to generate illumination beam;
a plasma cell, the plasma cell including a bulb for containing a volume of gas;
a set of optical elements configured to shape the illumination beam and focus the illumination beam from the modulatable pumping source into the volume of gas in order to maintain a plasma within the volume of gas;
a set of illumination optics configured to direct the illumination beam from the plasma cell to the surface of a sample;
a set of collection optics;
a detector configured to detect at least a portion of illumination emanating from a surface of a sample, wherein the set of collection optics is configured to direct illumination from the surface of the sample to the detector;
a pump control system communicatively coupled to the modulatable pumping source, wherein the pump control system includes one or more processors configured to execute program instructions maintained on a carrier medium configured to cause the pump control system to modulate a drive current of the modulatable pumping source at a selected modulation frequency in order to produce time-varying characteristics within the plasma contained within the plasma cell.

2. The optical metrology tool of claim 1 , wherein the modulatable pumping illumination source comprises:
one or more lasers.

3. The optical metrology tool of claim 1 , wherein the time-varying characteristics comprise:
time-varying thermal distributions.

4. The optical metrology tool of claim 1 , wherein the detector comprises:
at least one of a CCD array, a CMOS array, one-dimensional photodiode array, a two-dimensional photodiode array.

5. The optical metrology tool of claim 1 , wherein the detector is synchronized with the control system.

6. The optical metrology tool of claim 1 , wherein the pump control system reduces the noise level within a particular frequency bandwidth by modulating the pumping source at frequencies greater than a bandwidth of the detector.

7. The optical metrology tool of claim 1 , wherein the plasma cell is configured to contain at least one of argon, xenon, or mercury.

8. The optical metrology tool of claim 1 , wherein the sample comprises a semiconductor wafer.

9. The optical metrology tool of claim 1 , further comprising a dichroic mirror configured to transmit illumination from the pumping source to the plasma cell and further configured to reflect broadband illumination emitted by the plasma cell.

10. The optical metrology tool of claim 1 , wherein the optical metrology tool is arranged as at least one of a reflectometer, scatterometer, ellipsometer, or spectrometer.

11. The optical metrology tool of claim 1 , wherein the modulatable pumping source is modulated at a frequency between 20 kHz and 40 kHz.

12. The optical metrology tool of claim 1 , wherein the modulatable pumping source is configured to modulate at least one an intensity or wavelength of illumination beam.

Assignees

• Kla Corp

Inventors

• Shchegrov Andrei V
• Rotter Lawrence D
• Wang David Y
• Veldman Andrei
• Peterlinz Kevin
• Brady Gregory
• Shaughnessy Derrick A

Classifications

• H10P74/27

  Structural arrangements therefor · CPC title

• G01N21/211 Primary

  Ellipsometry (optical thickness measurement G01B11/06) · CPC title

• G01B11/0616 Primary

  of coating · CPC title

• G01N21/4738

  Diffuse reflection (precedence is given to G01N21/55 - G01N21/57 if specular component is taken into consideration), e.g. also for testing fluids, fibrous materials · CPC title

• G01N21/55

  Specular reflectivity · CPC title