Optical metrology tool equipped with modulated illumination sources

Patent metadata

Field	Value
Publication number	US-10969328-B2
Application number	US-201916284950-A
Country	US
Kind code	B2
Filing date	Feb 25, 2019
Priority date	Oct 11, 2011
Publication date	Apr 6, 2021
Grant date	Apr 6, 2021

Abstract

The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.

First claim

What is claimed:

1. An optical metrology tool, comprising:
a first illumination source configured to generate illumination of a first wavelength;
at least one additional illumination source configured to generate illumination of an additional wavelength, the additional wavelength different from the first wavelength, the first illumination source and the at least one additional illumination source configured to illuminate a surface of a sample disposed on a sample stage;
a set of illumination optics configured to direct illumination of the first wavelength and illumination of the at least one additional wavelength from the first illumination source and the at least one additional illumination source to the surface of the sample;
a set of collection optics;
a detector configured to detect at least a portion of illumination emanating from a surface of the sample, wherein the set of collection optics is configured to direct illumination emanating from the surface of the sample to the detector;
a first illumination switching device optically coupled to the first illumination source, wherein the first illumination switching device is configured to control transmitted intensity of the illumination of the first wavelength;
at least one additional illumination switching device optically coupled to the at least one additional illumination source, wherein the at least one additional illumination switching device is configured to control transmitted intensity of the illumination of the additional wavelength, wherein at least one of the first illumination switching device and the at least one additional switching device comprises at least one of a Pockel cell or an acousto-optical switch device; and
a modulation control system including one or more processors, wherein the modulation control system is communicatively coupled to the first illumination switching device and the at least one additional switching device, wherein the illumination control system is configured to modulate transmitted intensity of the illumination of the first wavelength and transmitted intensity of the illumination of the additional wavelength by controlling one or more characteristics of the illumination switching device.

2. The optical metrology tool of claim 1 , wherein at least one of the first illumination switching device and the at least one additional switching device comprises:
the Pockel cell;
a first linear polarizer;
a second linear polarizer; and
wherein the Pockel cell is disposed between the first linear polarizer and the second linear polarizer.

3. The optical metrology tool of claim 1 , wherein at least one of the first illumination source and the at least one additional illumination source comprises:
one or more lasers.

4. The optical metrology tool of claim 1 , wherein at least one of the first illumination source and the at least one additional illumination source comprises:
one or more light-emitting diodes (LEDs).

5. The optical metrology tool of claim 1 , wherein at least one of the first illumination source and the at least one additional illumination source comprises:
one or more broadband sources.

6. The optical metrology tool of claim 1 , wherein the first illumination source includes a broadband source and the at least one additional illumination source includes a narrowband source, wherein pulses of the broadband source are interleaved in time with the pulses of the narrow band source.

7. The optical metrology tool of claim 1 , wherein the first illumination source, the at least one additional illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in at least one of a reflectometry geometry, a scatterometry geometry, and an ellipsometry geometry.

8. The optical metrology tool of claim 1 , wherein the detector comprises:
at least one of a CCD array, a CMOS array, one-dimensional photodiode array, a two-dimensional photodiode array.

9. The optical metrology tool of claim 1 , wherein the detector is synchronized with the control system.

10. The optical metrology tool of claim 1 , further comprising:
a spectral monitoring system configured to monitor one or more spectral characteristics of illumination of at least one of the first illumination source and the at least one additional illumination source, the spectral monitoring system further configured to transmit a signal indicative one or more spectral characteristics of illumination of at least one of the first illumination source and the at least one additional illumination source to the modulation control system.

Assignees

• Kla Tencor Corp
• Kla Corp

Inventors

• Shchegrov Andrei V
• Rotter Lawrence D
• Wang David Y
• Veldman Andrei
• Peterlinz Kevin
• Brady Gregory
• Shaughnessy Derrick A

Classifications

• G01B11/0616 Primary

  of coating · CPC title

• G01B11/00 Primary

  Measuring arrangements characterised by the use of optical techniques · CPC title

• G01N21/45

  using interferometric methods; using Schlieren methods · CPC title

• G01N21/211 Primary

  Ellipsometry (optical thickness measurement G01B11/06) · CPC title

• G03F7/70633

  Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching · CPC title