Optical metrology tool equipped with modulated illumination sources

US9400246B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9400246-B2
Application numberUS-201213648768-A
CountryUS
Kind codeB2
Filing dateOct 10, 2012
Priority dateOct 11, 2011
Publication dateJul 26, 2016
Grant dateJul 26, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.

First claim

Opening claim text (preview).

What is claimed: 1. An optical metrology tool, comprising: a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage; a set of illumination optics configured to direct illumination from the modulated illumination source to the surface of the sample; a set of collection optics; a detector configured to detect at least a portion of illumination emanating from a surface of the sample, wherein the set of collection optics is configured to direct illumination from the surface of the sample to the detector wherein the modulatable illumination source, the detector, the set of illumination optics, and the set of collections optics are positioned to perform optical metrology on the sample; and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency, wherein the modulatable illumination source, in response to the modulation control system, modulates the illumination from the modulatable illumination source so as to suppress one or more coherence features within the illumination relative to illumination from the modulatable illumination source in an unmodulated state. 2. The optical metrology tool of claim 1 , wherein the selected modulation frequency comprises: a modulation frequency suitable for generating illumination having a selected fringe visibility curve. 3. The optical metrology tool of claim 2 , wherein the modulation frequency suitable for generating illumination having a selected fringe visibility curve comprises: a modulation frequency suitable for generating illumination having a fringe visibility curve suitable for achieving coherence artifacts below a selected tolerance level. 4. The optical metrology tool of claim 2 , wherein the selected fringe visibility curve is configured to suppress generation of interference fringes having an intensity above a selected level. 5. The optical metrology tool of claim 2 , wherein the selected fringe visibility curve is substantially different from a fringe visibility curve of the illumination source in an unmodulated state. 6. The optical metrology tool of claim 1 , wherein the selected modulation frequency comprises: a modulation frequency suitable for generating illumination having a set of intensity peaks positioned at distances different from a characteristic optical path length of the optical metrology tool. 7. The optical metrology tool of claim 6 , wherein the characteristic optical path length of the optical metrology tool comprises: a distance between a first reflecting surface of the optical metrology tool and a second reflecting surface of the optical metrology tool. 8. The optical metrology tool of claim 1 , wherein the selected modulation frequency suitable for generating illumination having a selected coherence feature comprises: a modulation frequency suitable for generating illumination having a coherence length below a selected length. 9. The optical metrology tool of claim 8 , wherein the selected length comprises: a characteristic optical path length of the optical metrology tool. 10. The optical metrology tool of claim 9 , wherein the characteristic optical path length of the optical metrology tool comprises: a distance between a first reflecting surface of the optical metrology tool and a second reflecting surface of the optical metrology tool. 11. The optical metrology tool of claim 8 , wherein the selected length comprises: a coherence length of the modulatable illumination source in an unmodulated state. 12. The optical metrology tool of claim 1 , wherein the optical metrology tool is configured to perform at least one of critical dimension metrology, thin film metrology, and overlay metrology. 13. The optical metrology tool of claim 1 , wherein the modulatable illumination source comprises: one or more lasers. 14. The optical metrology tool of claim 13 , wherein the one or more lasers comprise: one or more semiconductor diode lasers. 15. The optical metrology tool of claim 13 , wherein the one or more lasers comprise: one or more diode-pumped solid-state lasers. 16. The optical metrology tool of claim 13 , wherein the one or more lasers comprise: one or more super continuum lasers. 17. The optical metrology tool of claim 1 , wherein the selected modulation frequency is in the radio frequency (RF) range. 18. The optical metrology tool of claim 1 , wherein the modulatable illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in a reflectometry geometry. 19. The optical metrology tool of claim 18 , wherein the modulatable illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in at least one of an angle-resolved reflectometry geometry and a spectroscopic reflectometry geometry. 20. The optical metrology tool of claim 1 , wherein the modulatable illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in a scatterometry geometry. 21. The optical metrology tool of claim 1 , wherein the modulatable illumination source, the detector, the set of illumination optics, and the set of collections optics are configured in an ellipsometry geometry. 22. The optical metrology tool of claim 1 , wherein the detector comprises: at least one of a CCD array, a CMOS array, one-dimensional photodiode array, and a two-dimensional photodiode array. 23. The optical metrology tool of claim 1 , wherein the detector is synchronized with the control system. 24. The optical metrology tool of claim 1 , further comprising: a spectral monitoring system configured to monitor one or more spectral characteristics of illumination from the modulatable illumination source, the spectral monitoring system further configured to transmit a signal indicative of the one or more spectral characteristics to the control system.

Assignees

Inventors

Classifications

  • G01N21/55Primary

    Specular reflectivity · CPC title

  • Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness · CPC title

  • Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching · CPC title

  • Diffuse reflection (precedence is given to G01N21/55 - G01N21/57 if specular component is taken into consideration), e.g. also for testing fluids, fibrous materials · CPC title

  • Interferometers · CPC title

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What does patent US9400246B2 cover?
The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illum…
Who is the assignee on this patent?
Kla Tencor Corp
What technology area does this patent fall under?
Primary CPC classification G01N21/55. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).