Visualization of three-dimensional semiconductor structures

US10794839B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10794839-B2
Application numberUS-201916283690-A
CountryUS
Kind codeB2
Filing dateFeb 22, 2019
Priority dateFeb 22, 2019
Publication dateOct 6, 2020
Grant dateOct 6, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A semiconductor metrology tool inspects an area of a semiconductor wafer. The inspected area includes a plurality of instances of a 3D semiconductor structure arranged periodically in at least one dimension. A computer system generates a model of a respective instance of the 3D semiconductor structure based on measurements collected during the inspection. The computer system renders an image of the model that shows a 3D shape of the model and provides the image to a device for display.

First claim

Opening claim text (preview).

What is claimed is: 1. A non-transitory computer-readable storage medium storing one or more programs for execution by one or more processors of a computer system, the one or more programs including instructions for: based on inspection by a semiconductor metrology tool of an area of a semiconductor wafer that includes a plurality of instances of a three-dimensional (3D) semiconductor structure arranged periodically, generating a model of a respective instance of the 3D semiconductor structure; rendering an image of the model that shows a 3D shape of the model, the image comprising: at least one of a top surface or a bottom surface of the respective instance of the 3D semiconductor structure, and a user-selectable translucent cross-section of the respective instance of the 3D semiconductor structure between the top and bottom surfaces; and providing the image to a device for display. 2. The computer-readable storage medium of claim 1 , wherein the image comprises a projection of the model to be displayed in two dimensions. 3. The computer-readable storage medium of claim 1 , wherein the image shows uncertainty for the 3D shape in the model. 4. The computer-readable storage medium of claim 1 , wherein the image indicates deviation of the 3D shape or a cross-section of the 3D shape from a nominal shape. 5. The computer-readable storage medium of claim 1 , wherein the image comprises an animation that successively shows successive portions of the 3D shape. 6. The computer-readable storage medium of claim 1 , wherein: the image is a 3D stereographic image; and providing the image comprises sending the image to a 3D stereographic viewer. 7. The computer-readable storage medium of claim 1 , wherein: the plurality of instances of the 3D semiconductor structure comprises a periodic arrangement of memory holes in a 3D memory; and the respective instance of the 3D semiconductor structure comprises a respective memory hole. 8. The computer-readable storage medium of claim 7 , wherein the image shows an elliptical shape of the respective memory hole for multiple cross-sections of the respective memory hole. 9. The computer-readable storage medium of claim 8 , wherein the image shows the helicity of the respective memory hole for the multiple cross-sections, wherein the helicity indicates change in orientation of the elliptical shape. 10. The computer-readable storage medium of claim 7 , wherein the image indicates deviation from an elliptical shape for the multiple cross-sections. 11. The computer-readable storage medium of claim 7 , wherein the image shows tilt of the respective memory hole. 12. The computer-readable storage medium of claim 1 , wherein: the plurality of instances of the 3D semiconductor structure comprises a periodic arrangement of finFETs; and the respective instance of the 3D semiconductor structure comprises a respective finFET or a portion of a respective finFET. 13. The computer-readable storage medium of claim 1 , wherein: the plurality of instances of the 3D semiconductor structure comprises an array of DRAM cells; and the respective instance of the 3D semiconductor structure comprises a respective DRAM cell or a portion of a respective DRAM cell. 14. The computer-readable storage medium of claim 1 , wherein generating the model of the respective instance of the 3D semiconductor structure comprises: obtaining a geometric model of the 3D semiconductor structure with parameterized dimensions; and using measurements collected during the inspecting to determine values of the parameterized dimensions. 15. The computer-readable storage medium of claim 1 , wherein generating the model of the respective instance of the 3D semiconductor structure comprises: obtaining sets of measurements for varying instances of the 3D semiconductor structure, the sets being labeled with respective values of dimensions; and performing machine learning, using the sets and measurements collected during the inspecting, to determine values of the dimensions for the respective instance, wherein the generating is performed without using a parameterized geometric model of the 3D semiconductor structure. 16. The computer-readable storage medium of claim 1 , wherein inspecting the area of the semiconductor wafer comprises performing an optical metrology technique selected from the group consisting of spectroscopic ellipsometry, single-wavelength ellipsometry, beam-profile ellipsometry, beam-profile reflectometry, single-wavelength reflectometry, angle-resolved reflectometry, spectroscopic reflectometry, scatterometry, and Raman spectroscopy. 17. The computer-readable storage medium of claim 1 , wherein inspecting the area of the semiconductor wafer comprises performing small-angle x-ray scattering. 18. A non-transitory computer-readable storage medium storing one or more programs for execution by one or more processors of a computer system, the one or more programs including instructions for: based on inspection by a semiconductor metrology tool of an area of a semiconductor wafer that includes a plurality of instances of a three-dimensional (3D) semiconductor structure arranged periodically, generating a model of a respective instance of the 3D semiconductor structure; rendering from a first perspective a first augmented-reality or virtual-reality (AR/VR) image of the model that shows a 3D shape of the model; providing the first AR/VR image to an AR/VR viewing device for display; after providing the first AR/VR image to the AR/VR viewing device for display, receiving user input requesting a change in perspective; in response to the user input, rendering a second AR/VR image of the model from a second perspective; and providing the second AR/VR image to the AR/VR viewing device for display. 19. A non-transitory computer-readable storage medium storing one or more programs for execution by one or more processors of a computer system, the one or more programs including instructions for: based on inspection by a semiconductor metrology tool of an area of a semiconductor wafer that includes a plurality of instances of a three-dimensional (3D) semiconductor structure arranged periodically, generating a model of a respective instance of the 3D semiconductor structure; rendering a first augmented-reality or virtual-reality (AR/VR) image of the model that shows a 3D shape of the model with an appearance that corresponds to values of a parameter of the model as determined based on measurements collected during the inspection; providing the first AR/VR image to an AR/VR viewing device for display; after providing the first AR/VR image to the AR/VR viewing device for display, receiving user input requesting a change to the values of the parameter; in response to the user input, changing the values of the parameter for the model; rendering a second AR/VR image of the model with an appearance that corresponds to the changed values; and providing the second AR/VR image to the AR/VR viewing device for display. 20. A non-transitory computer-readable storage medium storing one or more programs for execution by one or more processors of a computer system, the one or more programs including instructions for: based on inspection by a semiconductor metrology tool of an area of a semiconductor wafer that includes a periodic arrangement of memory holes in a three-dimensional (3D) semiconductor memory, generating a model of a respective memory hole; rendering an image of the model that shows a 3D shape of the model, w

Assignees

Inventors

Classifications

  • Integrated device layouts · CPC title

  • comprising FinFETs · CPC title

  • Fin field-effect transistors [FinFET] · CPC title

  • Three-dimensional [3D] modelling for computer graphics · CPC title

  • Manipulating three-dimensional [3D] models or images for computer graphics · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10794839B2 cover?
A semiconductor metrology tool inspects an area of a semiconductor wafer. The inspected area includes a plurality of instances of a 3D semiconductor structure arranged periodically in at least one dimension. A computer system generates a model of a respective instance of the 3D semiconductor structure based on measurements collected during the inspection. The computer system renders an image of…
Who is the assignee on this patent?
Kla Tencor Corp, Kla Corp
What technology area does this patent fall under?
Primary CPC classification G06F30/39. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 06 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).