Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching
US-12049699-B2 · Jul 30, 2024 · US
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Van Schravendijk Bart patents
Van Schravendijk Bart is listed as an inventor on 36 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Van Schravendijk Bart |
| Total patents | 36 |
| First publication | Feb 12, 2015 |
| Latest publication | Jul 30, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Dielectric gapfill using atomic layer deposition (ald), inhibitor plasma and etching
US-2022205096-A1 · Jun 30, 2022 · US
Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching
US-11293098-B2 · Apr 5, 2022 · US
Dielectric gapfill using atomic layer deposition (ald), inhibitor plasma and etching
US-2020017967-A1 · Jan 16, 2020 · US
Semiconductor substrate processing apparatus including uniformity baffles
US-10351955-B2 · Jul 16, 2019 · US
Systems and methods for creating airgap seals using atomic layer deposition and high density plasma chemical vapor deposition
US-10224235-B2 · Mar 5, 2019 · US
Ultra-high vacuum transport and storage
US-10153282-B1 · Dec 11, 2018 · US
Plasma activated conformal dielectric film deposition
US-10043655-B2 · Aug 7, 2018 · US
UV and reducing treatment for K recovery and surface clean in semiconductor processing
US-10037905-B2 · Jul 31, 2018 · US
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
US-9966299-B2 · May 8, 2018 · US
Recent patents
Latest publications not already listed above.
Method of densifying films in semiconductor device
US-9786496-B2 · Oct 10, 2017 · US
Densification of dielectric film using inductively coupled high density plasma
US-9741584-B1 · Aug 22, 2017 · US
Systems and methods for creating airgap seals using atomic layer deposition and high density plasma chemical vapor deposition
US-2017229337-A1 · Aug 10, 2017 · US
Method for depositing a chlorine-free conformal SiN film
US-9670579-B2 · Jun 6, 2017 · US
Plasma activated conformal dielectric film deposition
US-2017148628-A1 · May 25, 2017 · US
Method of densifying films in semiconductor device
US-2017053799-A1 · Feb 23, 2017 · US
Plasma activated conformal dielectric film deposition
US-9570274-B2 · Feb 14, 2017 · US
Air gap spacer integration for improved fin device performance
US-9515156-B2 · Dec 6, 2016 · US
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
US-2016329238-A1 · Nov 10, 2016 · US
Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery
US-9447499-B2 · Sep 20, 2016 · US
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
US-9425078-B2 · Aug 23, 2016 · US
Systems and methods for eliminating seams in atomic layer deposition of silicon dioxide film in gap fill applications
US-9406544-B1 · Aug 2, 2016 · US
Method for forming a mask by etching conformal film on patterned ashable hardmask
US-9362133-B2 · Jun 7, 2016 · US
Conformal film deposition for gapfill
US-9355886-B2 · May 31, 2016 · US
Air gap spacer integration for improved fin device performance
US-2016111515-A1 · Apr 21, 2016 · US
Flowable oxide film with tunable wet etch rate
US-9299559-B2 · Mar 29, 2016 · US
CVD flowable gap fill
US-9257302-B1 · Feb 9, 2016 · US
Systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia
US-9147589-B2 · Sep 29, 2015 · US
Method for depositing a chlorine-free conformal sin film
US-2015259791-A1 · Sep 17, 2015 · US
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
US-2015243545-A1 · Aug 27, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 20 |
| Novellus Systems Inc | 16 |
| Van Schravendijk Bart | 4 |
| Roy Shambhu N | 1 |
| Burkhart Vincent E | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/6336 | 26 |
| H10P14/69215 | 23 |
| H10P14/6339 | 23 |
| C23C16/045 | 18 |
| H01L21/0228 | 17 |