Flowable oxide film with tunable wet etch rate

Patent metadata

Field	Value
Publication number	US-9299559-B2
Application number	US-201414466222-A
Country	US
Kind code	B2
Filing date	Aug 22, 2014
Priority date	Mar 5, 2012
Publication date	Mar 29, 2016
Grant date	Mar 29, 2016

Abstract

Provided herein are integration-compatible dielectric films and methods of depositing and modifying them. According to various embodiments, the methods can include deposition of flowable dielectric films targeting specific film properties and/or modification of those properties with an integration-compatible treatment process. In certain embodiments, methods of depositing and modifying flowable dielectric films having tunable wet etch rates and other properties are provided. Wet etch rates can be tuned during integration through am integration-compatible treatment process. Examples of treatment processes include plasma exposure and ultraviolet radiation exposure.

First claim

The invention claimed is:

1. A method comprising:
after performing one or more integration operations including at least one of a lithography process, an ion implantation process, a photoresist strip process, a wet etch clean, and a dry etch process on a substrate including a flowable dielectric film, treating the flowable dielectric film to modify a wet etch rate of the flowable dielectric film, wherein the one or more integration operations are performed on a film other than the flowable dielectric film.

2. The method of claim 1 , wherein treating the flowable dielectric film comprises removing at least one of carbon, nitrogen or hydrogen from the flowable dielectric film.

3. The method of claim 1 , wherein treating the flowable dielectric film comprises adding at least one of carbon, nitrogen, or hydrogen to the flowable dielectric film.

4. The method of claim 1 , wherein treating the flowable dielectric film comprises exposing it to reactive oxygen species from a direct or remote plasma.

5. The method of claim 1 , wherein treating the flowable dielectric film comprises exposing it to reactive hydrogen species from a direct or remote plasma.

6. The method of claim 1 , wherein treating the flowable dielectric film comprises exposing it to reactive nitrogen species from a direct or remote plasma.

7. The method of claim 1 , wherein treating the flowable dielectric film comprises exposing it to ultraviolet radiation.

8. The method of claim 1 , wherein the flowable dielectric film substrate fills one or more gaps on the substrate.

9. The method of claim 8 , wherein the flowable dielectric film is in a layer that covers the one or more gaps.

10. The method of claim 1 , wherein treating the flowable dielectric film comprises densifying the flowable dielectric film.

11. The method of claim 10 , wherein the carbon concentration of the densified flowable dielectric film is less than about 5% atomic.

12. The method of claim 10 , wherein the carbon concentration of the densified flowable dielectric film is between 5 and 35% atomic.

13. The method of claim 1 , wherein treating the flowable dielectric film increases the wet etch rate in one or more of dilute HF in H 2 O, buffered oxide etch (BOE), NH 4 OH:H 2 O 2 :H 2 O solution, H 2 SO 4 :H 2 O 2 :H 2 O solution, phosphoric acid solutions, and tetramethylammonium hydroxide (TMAH).

14. The method of claim 1 , wherein treating the flowable dielectric film decreases the wet etch rate in one or more of dilute HF in H 2 O, buffered oxide etch (BOE), NH 4 OH:H 2 O 2 :H 2 O solution, H 2 SO 4 :H 2 O 2 :H 2 O solution, phosphoric acid solutions, and tetramethylammonium hydroxide (TMAH).

Assignees

• Novellus Systems Inc

Inventors

• Draeger Nerissa
• Shannon Karena
• Van Schravendijk Bart
• Ashtiani Kaihan

Classifications

• H10P50/283

  by chemical means · CPC title

• H10P14/69433

  the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

• H10P14/69215

  the material being a silicon oxide, e.g. SiO2 · CPC title

• H10P14/6927

  the material being a silicon oxynitride, e.g. SiON or SiON:H · CPC title

• H10P14/6922

  the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title