Method and device for cleaning substrates
US-2025328088-A1 · Oct 23, 2025 · US
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Lin Kuan-Wen patents
Lin Kuan-Wen is listed as an inventor on 38 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Lin Kuan-Wen |
| Total patents | 38 |
| First publication | Jan 13, 2015 |
| Latest publication | Oct 23, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Method and device for cleaning substrates
US-12393129-B2 · Aug 19, 2025 · US
Acoustic measurement of fabrication equipment clearance
US-12320782-B2 · Jun 3, 2025 · US
Acoustic Measurement of Fabrication Equipment Clearance
US-2024377364-A1 · Nov 14, 2024 · US
Method and device for cleaning substrates
US-2024310744-A1 · Sep 19, 2024 · US
Particle removing assembly and method of cleaning mask for lithography
US-12085866-B2 · Sep 10, 2024 · US
Method and device for cleaning substrates
US-12032302-B2 · Jul 9, 2024 · US
Acoustic Measurement of Fabrication Equipment Clearance
US-2023366857-A1 · Nov 16, 2023 · US
Particle removing assembly and method of cleaning mask for lithography
US-2023314963-A1 · Oct 5, 2023 · US
Acoustic measurement of fabrication equipment clearance
US-11709153-B2 · Jul 25, 2023 · US
Recent patents
Latest publications not already listed above.
Particle removing assembly and method of cleaning mask for lithography
US-11698592-B2 · Jul 11, 2023 · US
Method and device for cleaning substrates
US-2022308464-A1 · Sep 29, 2022 · US
Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors
US-11430671-B2 · Aug 30, 2022 · US
Particle removing assembly and method of cleaning mask for lithography
US-2022252993-A1 · Aug 11, 2022 · US
Particle removing assembly and method of cleaning mask for lithography
US-11294292-B2 · Apr 5, 2022 · US
Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors
US-2022037171-A1 · Feb 3, 2022 · US
System and method for localized EUV pellicle glue removal
US-11079669-B2 · Aug 3, 2021 · US
Particle removing assembly and method of cleaning mask for lithography
US-2021200107-A1 · Jul 1, 2021 · US
Acoustic Measurement of Fabrication Equipment Clearance
US-2021072196-A1 · Mar 11, 2021 · US
Acoustic measurement of film thickness
US-10845342-B2 · Nov 24, 2020 · US
Acoustic measurement of fabrication equipment clearance
US-10794872-B2 · Oct 6, 2020 · US
System and Method for Localized EUV Pellicle Glue Removal
US-2020150523-A1 · May 14, 2020 · US
System and method for localized EUV pellicle glue removal
US-10520805-B2 · Dec 31, 2019 · US
Systems and methods of EUV mask cleaning
US-10156784-B2 · Dec 18, 2018 · US
Acoustic Measurement of Fabrication Equipment Clearance
US-2018348171-A1 · Dec 6, 2018 · US
Systems and Methods of EUV Mask Cleaning
US-2018157168-A1 · Jun 7, 2018 · US
System and Method for Localized EUV Pellicle Glue Removal
US-2018031962-A1 · Feb 1, 2018 · US
Damage prevention on EUV mask
US-9740094-B2 · Aug 22, 2017 · US
Method and system for EUV mask cleaning with non-thermal solution
US-9665000-B1 · May 30, 2017 · US
Mask pellicle indicator for haze prevention
US-9658526-B2 · May 23, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Taiwan Semiconductor Mfg Co Ltd | 36 |
| Taiwan Semiconductor Mfg | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| B08B13/00 | 19 |
| G03F1/82 | 17 |
| G03F1/22 | 15 |
| B08B7/0035 | 11 |
| G03F7/70925 | 11 |