Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
US-10620537-B2 · Apr 14, 2020 · US
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Kikuchi Rie patents
Kikuchi Rie is listed as an inventor on 18 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Kikuchi Rie |
| Total patents | 18 |
| First publication | Mar 3, 2016 |
| Latest publication | Apr 14, 2020 |
Notable patents
Publications ranked by popularity score, then publication date.
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
US-10429739-B2 · Oct 1, 2019 · US
Method for forming organic film and method for manufacturing substrate for semiconductor apparatus
US-9984891-B2 · May 29, 2018 · US
Composition for forming a coating type BPSG film, substrate, and patterning process
US-9902875-B2 · Feb 27, 2018 · US
Composition for forming a coating type silicon-containing film, substrate, and patterning process
US-9880470-B2 · Jan 30, 2018 · US
Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
US-2018011405-A1 · Jan 11, 2018 · US
Polymer for resist under layer film composition, resist under layer film composition, and patterning process
US-9805943-B2 · Oct 31, 2017 · US
Method for forming organic film and method for manufacturing substrate for semiconductor apparatus
US-2017309493-A1 · Oct 26, 2017 · US
Organic film composition, process for forming organic film, patterning process, and compound
US-9728420-B2 · Aug 8, 2017 · US
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
US-2017183531-A1 · Jun 29, 2017 · US
Recent patents
Latest publications not already listed above.
Patterning process using a boron phosphorus silicon glass film
US-9580623-B2 · Feb 28, 2017 · US
Organic film composition, process for forming organic film, patterning process, and compound
US-2016336189-A1 · Nov 17, 2016 · US
Polymer for resist under layer film composition, resist under layer film composition, and patterning process
US-2016284559-A1 · Sep 29, 2016 · US
Patterning process
US-2016276152-A1 · Sep 22, 2016 · US
Method for producing semiconductor apparatus substrate
US-9312127-B2 · Apr 12, 2016 · US
Composition for forming a coating type bpsg film, substrate, and patterning process
US-2016096978-A1 · Apr 7, 2016 · US
Composition for forming a coating type silicon-containing film, substrate, and patterning process
US-2016096977-A1 · Apr 7, 2016 · US
Method for producing semiconductor apparatus substrate
US-2016064220-A1 · Mar 3, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Shinetsu Chemical Co | 18 |
| IBM | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P76/405 | 18 |
| H10P50/283 | 16 |
| H10P50/73 | 16 |
| H01L21/31144 | 15 |
| H10P50/287 | 12 |