Patterning process

Patent metadata

Field	Value
Publication number	US-2016276152-A1
Application number	US-201514664503-A
Country	US
Kind code	A1
Filing date	Mar 20, 2015
Priority date	Mar 20, 2015
Publication date	Sep 22, 2016
Grant date	—

Abstract

The present invention provides a patterning process, which comprises step of forming a BPSG film on the under layer film by using a composition for forming a coating type BPSG film including a base polymer and an organic compound with a content of 25 parts by mass or more of the organic compound with respect to 100 parts by mass of the base polymer, the base polymer having a silicon containing unit, a boron containing unit and a phosphorus containing unit with a total content of the boron containing unit and the phosphorus containing unit being 10 mol % or more, the organic compound having two or more hydroxyl groups or carboxyl groups per one molecule. There can be provided a patterning process in which a fine mask pattern can be formed on the substrate to be processed by the multilayer resist method, and the residue of the resist under layer film on the mask pattern can be removed cleanly enough to process the substrate to be processed without causing damage to the substrate to be processed and the under layer film.

First claim

What is claimed is:

1 . A patterning process of forming a mask pattern on a substrate to be processed for use in processing the substrate to be processed, comprising the steps of:
(I) forming an under layer film consisting of an organic under layer film or a CVD hard mask on the substrate to be processed; (II) forming a BPSG film on the under layer film by using a composition for forming a coating type BPSG film including a base polymer and an organic compound with a content of 25 parts by mass or more of the organic compound with respect to 100 parts by mass of the base polymer, the base polymer having a silicon containing unit, a boron containing unit and a phosphorus containing unit with a total content of the boron containing unit and the phosphorus containing unit being 10 mol % or more, the organic compound having two or more hydroxyl groups or carboxyl groups per one molecule; (III) forming a resist upper layer film on the BPSG film; (IV) forming a pattern to the resist upper layer film; (V) transferring the pattern to the BPSG film by dry etching using the resist upper layer film having the formed pattern as a mask; (VI) transferring the pattern to the under layer film by dry etching using a gas including N 2 , H 2 or both and the BPSG film having the formed pattern as a mask; and (VII) removing a residue of the BPSG film remaining on the under layer film having the formed pattern by wet etching using an ammonia aqueous solution containing hydrogen peroxide; to form a mask pattern for use in processing the substrate to be processed.

2 . The patterning process according to claim 1 , wherein, in the step (VII), the residue of the BPSG film remaining on the under layer film having the formed pattern is removed such that a silicon content on the under layer film is 5 atomic percent or less when X-ray photoelectron spectroscopy is performed on the under layer film.

3 . The patterning process according to claim 1 , wherein the substrate to be processed is a material in which any of a metal film, an amorphous metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film and a metal oxynitride film is formed on a semiconductor apparatus substrate on which a part or whole of semiconductor circuits has/have been formed, as a layer to be processed.

4 . The patterning process according to claim 2 , wherein the substrate to be processed is a material in which any of a metal film, an amorphous metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film and a metal oxynitride film is formed on a semiconductor apparatus substrate on which a part or whole of semiconductor circuits has/have been formed, as a layer to be processed.

5 . The patterning process according to claim 3 , wherein the metal constitutes the substrate to be processed comprises silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, or an alloy thereof.

6 . The patterning process according to claim 4 , wherein the metal constitutes the substrate to be processed comprises silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, or an alloy thereof.

7 . The patterning process according to claim 1 , wherein the pattern formation of the resist upper layer film is carried out by any of a lithography method using light with a wavelength of 300 nm or less or EUV light, an electron beam direct drawing method, a directed self-assembly method and a nano-imprinting lithography method.

8 . The patterning process according to claim 2 , wherein the pattern formation of the resist upper layer film is carried out by any of a lithography method using light with a wavelength of 300 nm or less or EUV light, an electron beam direct drawing method, a directed self-assembly method and a nano-imprinting lithography method.

9 . The patterning process according to claim 3 , wherein the pattern formation of the resist upper layer film is carried out by any of a lithography method using light with a wavelength of 300 nm or less or EUV light, an electron beam direct drawing method, a directed self-assembly method and a nano-imprinting lithography method.

10 . The patterning process according to claim 4 , wherein the pattern formation of the resist upper layer film is carried out by any of a lithography method using light with a wavelength of 300 nm or less or EUV light, an electron beam direct drawing method, a directed self-assembly method and a nano-imprinting lithography method.

11 . The patterning process according to claim 5 , wherein the pattern formation of the resist upper layer film is carried out by any of a lithography method using light with a wavelength of 300 nm or less or EUV light, an electron beam direct drawing method, a directed self-assembly method and a nano-imprinting lithography method.

12 . The patterning process according to claim 6 , wherein the pattern formation of the resist upper layer film is carried out by any of a lithography method using light with a wavelength of 300 nm or less or EUV light, an electron beam direct drawing method, a directed self-assembly method and a nano-imprinting lithography method.

Assignees

• Shinetsu Chemical Co
• IBM

Inventors

• Tachibana Seiichiro
• Taneda Yoshinori
• Kikuchi Rie
• Ogihara Tsutomu
• Kawai Yoshio
• Petrillo Karen
• Glodde Martin

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P50/287

  by chemical means · CPC title

• H10P50/285

  of materials not containing Si, e.g. PZT or Al2O3 · CPC title

• H10P50/283

  by chemical means · CPC title

• H10P50/73

  using masks for insulating materials · CPC title