Method for forming organic film and method for manufacturing substrate for semiconductor apparatus

Patent metadata

Field	Value
Publication number	US-9984891-B2
Application number	US-201715451727-A
Country	US
Kind code	B2
Filing date	Mar 7, 2017
Priority date	Apr 21, 2016
Publication date	May 29, 2018
Grant date	May 29, 2018

Abstract

The present invention provides a method for forming an organic film, including: forming a coating film by spin coating of an organic film-forming composition onto a substrate having an uneven pattern, and thereafter subjecting the substrate to a vibration treatment, and after or simultaneously with the vibration treatment, insolubilizing the coating film to an organic solvent to form the organic film. This provides a method for forming an organic film that can fill an uneven pattern on a substrate to highly flatten a substrate at low cost in a production step of a semiconductor apparatus, etc.

First claim

The invention claimed is:

1. A method for forming an organic film, comprising:
forming a coating film by spin coating of an organic film-forming composition onto a substrate having an uneven pattern, and thereafter
subjecting the substrate to a vibration treatment, and
after or simultaneously with the vibration treatment, insolubilizing the coating film to an organic solvent to form the organic film,
wherein the organic film-forming composition contains an aromatic ring-containing resin.

2. The method for forming an organic film according to claim 1 , wherein the vibration treatment is performed by applying a vibration having a frequency of 0.01 Hz to 10 GHz.

3. The method for forming an organic film according to claim 1 , wherein the insolubilizing is a treatment selected from a heat treatment at 50° C. or more and 500° C. or less, an ultraviolet irradiating treatment using ultraviolet having a wavelength of 400 nm or less, an electron beam irradiating treatment, and a combination of these treatments.

4. The method for forming an organic film according to claim 2 , wherein the insolubilizing is a treatment selected from a heat treatment at 50° C. or more and 500° C. or less, an ultraviolet irradiating treatment using ultraviolet having a wavelength of 400 nm or less, an electron beam irradiating treatment, and a combination of these treatments.

5. A method for manufacturing a substrate for a semiconductor apparatus, comprising: forming an organic film on a substrate having an uneven pattern by using the method according to claim 1 ; forming a silicon-containing resist under layer film on the organic film by using a composition for forming a silicon-containing resist under layer film; forming a resist upper layer film on the silicon-containing resist under layer film by using a photoresist composition; forming a circuit pattern in the resist upper layer film; transferring the pattern to the silicon-containing resist under layer film by dry etching using the resist upper layer film having the formed pattern as a mask; transferring the pattern to the organic film by dry etching using the silicon-containing resist under layer film having the transferred pattern as a mask; and transferring the pattern to the substrate by dry etching using the organic film having the transferred pattern as a mask.

6. A method for manufacturing a substrate for a semiconductor apparatus, comprising: forming an organic film on a substrate having an uneven pattern by using the method according to claim 1 ; forming a silicon-containing resist under layer film on the organic film by using a composition for forming a silicon-containing resist under layer film; forming an organic antireflection film on the silicon-containing resist under layer film; forming a resist upper layer film on the organic antireflection film by using a photoresist composition to provide a four-layer resist film; forming a circuit pattern in the resist upper layer film; transferring the pattern to the organic antireflection film and the silicon-containing resist under layer film by dry etching using the resist upper layer film having the formed pattern as a mask; transferring the pattern to the organic film by dry etching using the organic antireflection film and the silicon-containing resist under layer film having the transferred pattern as a mask; and transferring the pattern to the substrate by dry etching using the organic film having the transferred pattern as a mask.

7. A method for manufacturing a substrate for a semiconductor apparatus, comprising: forming an organic film on a substrate having an uneven pattern by using the method according to claim 1 ; forming any of inorganic hard mask selected from a silicon oxide film, a silicon nitride film, a silicon oxynitride film, an amorphous silicon film, and a titanium nitride film on the organic film; forming a resist upper layer film on the inorganic hard mask by using a photoresist composition; forming a circuit pattern in the resist upper layer film; transferring the pattern to the inorganic hard mask by dry etching using the resist upper layer film having the formed pattern as a mask; transferring the pattern to the organic film by dry etching using the inorganic hard mask having the transferred pattern as a mask; and transferring the pattern to the substrate by dry etching using the organic film having the transferred pattern as a mask.

8. A method for manufacturing a substrate for a semiconductor apparatus, comprising: forming an organic film on a substrate having an uneven pattern by using the method according to claim 1 ; forming any of inorganic hard mask selected from a silicon oxide film, a silicon nitride film, a silicon oxynitride film, an amorphous silicon film, and a titanium nitride film on the organic film; forming an organic antireflection film or a multi-layer resist film composed of an organic film and a silicon-containing resist under layer film on the inorganic hard mask; forming a resist upper layer film on the organic antireflection film or the multi-layer resist film by using a photoresist composition; forming a circuit pattern in the resist upper layer film; transferring the pattern to the inorganic hard mask by dry etching using the resist upper layer film having the formed pattern as a mask via a pattern transfer to the organic antireflection film or the multi-layer resist film; transferring the pattern to the organic film formed on the substrate by dry etching using the inorganic hard mask having the transferred pattern as a mask; and transferring the pattern to the substrate by dry etching using the organic film having the transferred pattern as a mask.

9. The method for manufacturing a substrate for a semiconductor apparatus according to claim 7 , wherein the inorganic hard mask is formed by a CVD method or an ALD method.

10. The method for manufacturing a substrate for a semiconductor apparatus according to claim 8 , wherein the inorganic hard mask is formed by a CVD method or an ALD method.

11. The method for manufacturing a substrate for a semiconductor apparatus according to claim 5 , wherein the circuit pattern is formed by a method selected from a lithography method with a high energy beam having a wavelength of 10 nm or more and 300 nm or less, a direct drawing method with an electron beam, a nano-imprinting method, and a combination of these methods.

12. The method for manufacturing a substrate for a semiconductor apparatus according to claim 5 , wherein the circuit pattern is developed by alkaline development or organic solvent development.

13. The method for manufacturing a substrate for a semiconductor apparatus according to claim 5 , wherein the substrate contains any of a metal film, a metal carbide film, a metal oxide film, a metal nitride film, and a metal oxynitride film.

14. The method for manufacturing a substrate for a semiconductor apparatus according to claim 13 , wherein the metal contained in the substrate is selected from silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, and alloy of these metals.

Assignees

• Shinetsu Chemical Co

Inventors

• Ogihara Tsutomu
• Kikuchi Rie

Classifications

• H10P95/08

  Planarisation of organic insulating materials · CPC title

• H10P76/2043

  using an anti-reflective coating · CPC title

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P50/695

  characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title

• H10P50/287

  by chemical means · CPC title