Composition for forming a coating type bpsg film, substrate, and patterning process

Patent metadata

Field	Value
Publication number	US-2016096978-A1
Application number	US-201514851792-A
Country	US
Kind code	A1
Filing date	Sep 11, 2015
Priority date	Oct 3, 2014
Publication date	Apr 7, 2016
Grant date	—

Abstract

A composition for forming a coating type BPSG film, containing one or more silicic acid skeletal structures represented by formula (1), one or more phosphoric acid skeletal structures represented by formula (2), one or more boric acid skeletal structures represented by formula (3), and one or more silicon skeletal structures represented by formula (4), wherein the composition contains a coupling between units in formula (4). The composition is capable of forming a BPSG film that has excellent adhesiveness in fine patterning, can be easily wet etched by a removing liquid which does not cause damage to a semiconductor substrate and a coating type organic film or a CVD film mainly consisting of carbon which is required in the patterning process, can maintain the peelability even after dry etching, and can suppress generation of particles by forming it in the coating process.

First claim

What is claimed is:

1 . A composition for forming a coating type BPSG film, comprising:
one or more silicic acid skeletal structures represented by the formula (1); one or more phosphoric acid skeletal structures represented by the formula (2); one or more boric acid skeletal structures represented by the formula (3); and one or more silicon skeletal structures represented by the formula (4); wherein the composition contains a coupling between units in the formula (4),

wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , and R 8 each represent a hydrogen atom or an organic group having 1 to 30 carbon atoms, wherein a hydrogen atom(s) in the organic group may be substituted by a halogen atom(s); R 9 , R 10 , R 11 , R 12 , R 13 , and R 14 each represent a methyl group, a phenyl group, or a hydroxyl group; m10, m11, m12, and m13 each represent a molar fraction in the silicic acid skeletal structure, and satisfy m10+m11+m12+m13=1, 0≦m10≦0.3, 0≦m11≦0.5, 0≦m12≦0.7, and 0<m13≦1; m20, m21, and m22 each represent a molar fraction in the phosphoric acid skeletal structure, and satisfy m20+m21+m22=1, 0≦m20≦1, 0≦m21≦1, and 0≦m22≦1; m30 and m31 each represent a molar fraction in the boric acid skeletal structure, and satisfy m30+m31=1, 0≦m30≦1, and 0≦m31≦1; and m40, m41, m42, and m43 each represent a molar fraction in the silicon skeletal structure, and satisfy m40+m41+m42+m43=1, 0≦m40≦1, 0≦m41≦1, 0≦m42≦1, and 0≦m43≦1.

2 . The composition for forming a coating type BPSG film according to claim 1 , wherein the composition comprises a solvent and (A) one or more polymers selected from a hydrolysate, a condensate, and a hydrolysis condensate of a mixture containing one or more silicon compounds represented by the formulae (A-1-1) to (A-1-4), one or more phosphorus compounds represented by the formulae (A-2-1) to (A-2-6), one or more boron compounds represented by the formulae (A-3-1) to (A-3-3), and one or more polysilane compounds represented by the formula (A-4-1),
R 1 R 2 R 3 SiOR  (A-1-1)
R 4 R 5 Si(OR) 2   (A-1-2)
R 6 Si(OR) 3   (A-1-3)
Si(OR) 4   (A-1-4)
wherein R represents a hydrocarbon group having 1 to 6 carbon atoms; and R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 have the same meanings as defined above,
PX 3   (A-2-1)

POX 3   (A-2-2)

P 2 O 5   (A-2-3)

H(HPO 3 ) a1 OH  (A-2-4)

R 7 PX 2   (A-2-5)

R 7 POX 2   (A-2-6)

wherein R 7 has the same meaning as defined above; X represents a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms; and a1 is an integer of 1 or more,
BX 3   (A-3-1)

B 2 O 3   (A-3-2)

R 8 BX 2   (A-3-3)

wherein R 8 and X have the same meanings as defined above,
(R 9 R 10 R 11 Si) a2 (R 12 R 13 Si) a3 (R 14 Si) a4 (Si) a5   (A-4-1)

wherein R 9 , R 10 , R 11 , R 12 , R 13 , and R 14 have the same meanings as defined above; and a2, a3, a4, and a5 each represent a molar fraction, and satisfy a2+a3+a4+a5=1, 0≦a2≦1, 0≦a3≦1, 0≦a4≦1, and 0≦a5≦1.

3 . The composition for forming a coating type BPSG film according to claim 2 , wherein the compound represented by the formula (A-4-1) has a weight average molecular weight of 1,000 or less.

4 . The composition for forming a coating type BPSG film according to claim 1 , wherein the composition comprises: a solvent; (A) one or more polymers selected from a hydrolysate, a condensate, and a hydrolysis condensate of a mixture containing one or more silicon compounds represented by the formulae (A-1-1) to (A-1-4), one or more phosphorus compounds represented by the formulae (A-2-1) to (A-2-6), and one or more boron compounds represented by the formulae (A-3-1) to (A-3-3); and (B) one or more polysilane compounds represented by the formula (B-1),
R 1 R 2 R 3 SiOR  (A-1-1)
R 4 R 5 Si(OR) 2   (A-1-2)
R 6 Si(OR) 3   (A-1-3)
Si(OR) 4   (A-1-4)
wherein R represents a hydrocarbon group having 1 to 6 carbon atoms; and R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 have the same meanings as defined above,
PX 3   (A-2-1)

POX 3   (A-2-2)

P 2 O 5   (A-2-3)

H(HPO 3 ) a1 OH  (A-2-4)

R 7 PX 2   (A-2-5)

R 7 POX 2   (A-2-6)

wherein R 7 has the same meaning as defined above; X represents a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms; and a1 is an integer of 1 or more,
BX 3   (A-3-1)

B 2 O 3   (A-3-2)

R 8 BX 2   (A-3-3)

wherein R 8 and X have the same meanings as defined above,
(R 9 R 10 R 11 Si) a2 (R 12 R 13 Si) a3 (R 14 Si) a4 (Si) a5   (B-1)

wherein R 9 , R 10 , R 11 , R 12 , R 13 , and R 14 have the same meanings as defined above; and a2, a3, a4, and a5 each represent a molar fraction, and satisfy a2+a3+a4+a5=1, 0≦a2≦1, 0≦a3≦1, 0≦a4≦1, and 0≦a5≦1.

5 . The composition for forming a coating type BPSG film according to claim 4 , wherein the compound represented by the formula (B-1) has a weight average molecular weight of 1,000 or less.

6 . The composition for forming a coating type BPSG film according to claim 2 , wherein the composition further comprises (C) one or more members selected from one or more silicon compounds represented by the formula (C-1), a hydrolysate, a condensate, and a hydrolysis condensate thereof,
R 1C c1 R 2C c2 R 3C c3 Si(OR 0C ) (4-c1-c2-c3)   (C-1)
wherein R 0C represents a hydrocarbon group having 1 to 6 carbon atoms; R 1C , R 2C , and R 3C each represent a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; and c1, c2, and c3 are each 0 or 1, and satisfy 1≦c1+c2+c3≦3.

7 . The composition for forming a coating type BPSG film according to claim 4 , wherein the composition further comprises (C) one or more members selected from one or more silicon compounds represented by the formula (C-1), a hydrolysate, a condensate, and a hydrolysis condensate thereof,
R 1C c1 R 2C c2 R 3C c3 Si(OR 0C ) (4-c1-c2-c3)   (C-1)
wherein R 0C represents a hydrocarbon group having 1 to 6 carbon atoms; R 1C , R 2C , and R 3C each represent a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; and c1, c2, and c3 are each 0 or 1, and satisfy 1≦c1+c2+c3≦3.

8 . The composition for forming a coating type BPSG film according to claim 6 , wherein one or more of R 1C , R 2C , and R 3C in the formula (C-1) are an organic group having a hydroxyl group or a carboxyl group each substituted by an acid-labile group.

9 . The composition for forming a coating type BPSG film according to claim 7 , wherein one or more of R 1C , R 2C , and R 3C in the formula (C-1) are an organic group having a hydroxyl group or a carboxyl group each substituted by an acid-labile group.

10 . The composition for forming a coating type BPSG film according to claim 6 , wherein the component (C) contains one or more members selected from one or more silicon compounds represented by the formulae (A-1-1) to (A-1-4), one or more phosphorus compounds represented by the formulae (A-2-1) to (A-2-6), and one or more boron compounds represented by the formulae (A-3-1) to (A-3-3) each alone, a mixture thereof, and a hydrolysate, a condensate, and a hydrolysis condensate thereof.

11 . The composition for forming a coating type BPSG film according to claim 7 , wherein the component (C) contains one or more members selected from one or more silicon compounds represented by the formulae (A-1-1) to (A-1-4), one or more phosphorus compounds represented by the formulae (A-2-1) to (A-2-6), and one or more boron compounds represented by the formulae (A-3-1) to (A-3-3) each alone, a mixture thereof, and a hydrolysate, a condensate, and a h

Assignees

• Shinetsu Chemical Co

Inventors

• Tachibana Seiichiro
• Taneda Yoshinori
• Kikuchi Rie
• Ogihara Tsutomu

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P50/283

  by chemical means · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P14/6923

  the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG · CPC title

• H10P14/6686

  the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane · CPC title