Substrate support having customizable and replaceable features for enhanced backside contamination performance

US11114330B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11114330-B2
Application numberUS-201916549239-A
CountryUS
Kind codeB2
Filing dateAug 23, 2019
Priority dateAug 24, 2018
Publication dateSep 7, 2021
Grant dateSep 7, 2021

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A workpiece support has a support surface where one or more standoffs are selectively removably coupled to the support surface. The one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface. A gap may be defined between the support surface and the workpiece. The one or more standoffs may be an electrically insulative film, such as a polyimide film that is selectively removably coupled to the support surface by an adhesive. The workpiece support may be an electrostatic chuck (ESC). Electrodes positioned below the support surface may electrostatically attract the workpiece toward the support, where a gas may be introduced in the gap.

First claim

Opening claim text (preview).

What is claimed is: 1. A workpiece support, comprising: an electrostatic chuck (ESC) having a support surface; and one or more standoffs selectively removably coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface. 2. The workpiece support of claim 1 , wherein the one or more standoffs define a gap between the support surface and the workpiece. 3. The workpiece support of claim 2 , wherein the electrostatic chuck comprises one or more electrodes positioned below the support surface, wherein the one or more electrodes are operable to electrostatically attract the workpiece toward the support surface based, at least in part, on an electrical voltage or current applied to the one or more electrodes. 4. The workpiece support of claim 3 , wherein the support surface is electrically insulative. 5. The workpiece support of claim 2 , wherein the electrostatic chuck comprises one or more gas orifices associated with the support surface, wherein the one or more gas orifices are fluidly coupled to the gap. 6. The workpiece support of claim 5 , further comprising a gas source operable to supply a gas to the gap between the workpiece and support surface via the one or more gas orifices. 7. The workpiece support of claim 1 , wherein the support surface is substantially planar and is devoid of protrusions extending therefrom. 8. The workpiece support of claim 1 , wherein the support surface is substantially planar and comprises a plurality of mesas extending a protrusion distance from a planar region of the support surface, wherein the protrusion distance is less than the standoff distance. 9. The workpiece support of claim 1 , wherein the one or more standoffs comprise a resilient material. 10. The workpiece support of claim 9 , wherein the one or more standoffs comprise a non-metallic material. 11. The workpiece support of claim 1 , wherein the one or more standoffs comprise an adhesive operable to selectively couple the one or more standoffs to the support surface. 12. The workpiece support of claim 11 , wherein the adhesive comprises a silicone adhesive. 13. The workpiece support of claim 1 , wherein the one or more standoffs comprise a polyimide film. 14. The workpiece support of claim 1 , wherein the one or more standoffs comprise an electrically insulative film. 15. The workpiece support of claim 1 , wherein the predetermined standoff distance is between approximately 0.001 inches and approximately 0.005 inches. 16. The workpiece support of claim 1 , wherein the one or more standoffs are comprised of a material operable to withstand high temperatures ranging between approximately 50 C and approximately 600 C without substantial degradation or compression. 17. The workpiece support of claim 1 , wherein the one or more standoffs are comprised of a material having a hardness that is less than a hardness of the workpiece. 18. The workpiece support of claim 1 , wherein the one or more standoffs are formed in a predetermined shape when viewed perpendicular to the support surface, wherein the predetermined shape is one of a rounded shape, circular shape, ovular shape, polygonal shape, and a freeform shape. 19. The workpiece support of claim 1 , wherein the one or more standoffs are positioned on the support surface based on predetermined criteria. 20. The workpiece support of claim 1 , wherein the workpiece support comprises one or more of a thermal workpiece support operable to heat and/or cool the workpiece. 21. A workpiece support, comprising: an electrostatic chuck (ESC) having a support surface; and one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs have a low thermal conductivity. 22. A workpiece support, comprising: an electrostatic chuck (ESC) having a support surface; and one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs and the support surface have similar dielectric strengths. 23. A workpiece support, comprising: an electrostatic chuck (ESC) having a support surface; and one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs are spaced along the support surface in a predetermined pattern, and wherein the one or more standoffs are initially defined on a transfer sheet, whereby the predetermined pattern is operable to be transferred from the transfer sheet to the support surface by placement of the transfer sheet on the support surface and selectively adhering the one or more standoffs from the transfer sheet to the support surface. 24. A workpiece support, comprising: an electrostatic chuck (ESC) having a support surface; and one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs are initially comprised of a liquid that is applied to the support surface and subsequently cured on the support surface. 25. A workpiece support, comprising: an electrostatic chuck (ESC) having a support surface; and one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs comprise a polyimide film. 26. An electrostatic chuck comprising one or more removable standoffs operable to support a workpiece at a predetermined distance from a surface of the electrostatic chuck. 27. The electrostatic chuck of claim 26 , wherein the one or more removable standoffs comprise an electrically insulative film, and wherein an adhesive selectively couples the electrically insulative film to the surface of the electrostatic chuck.

Assignees

Inventors

Classifications

  • characterised by a coating, a hardness or a material · CPC title

  • characterised by edge profile or support profile · CPC title

  • Details of electrostatic chucks · CPC title

  • Monitoring of warpages, curvatures, damages, defects or the like · CPC title

  • Temperature monitoring · CPC title

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Frequently asked questions

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What does patent US11114330B2 cover?
A workpiece support has a support surface where one or more standoffs are selectively removably coupled to the support surface. The one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface. A gap may be defined between the support surface and the workpiece. The one or more standoffs may be an electrically insulative film, such as a …
Who is the assignee on this patent?
Axcelis Tech Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/7614. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 07 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).