Substrate correction device, substrate lamination device, substrate processing system, substrate correction method, substrate processing method, and semiconductor device manufacturing method
US-2024404859-A1 · Dec 5, 2024 · US
Electricity
Electricity · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H10P72/7611 |
| Official title | — |
| Display label | Electricity (mapped technology topic) |
| Total patents | 2,416 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 70 |
| 2016 | 101 |
| 2017 | 141 |
| 2018 | 166 |
| 2019 | 225 |
| 2020 | 242 |
| 2021 | 281 |
| 2022 | 315 |
| 2023 | 282 |
| 2024 | 259 |
| 2025 | 271 |
| 2026 | 63 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Edge ring arrangement with moveable edge rings
US-2024355667-A1 · Oct 24, 2024 · US
Substrate processing apparatus and holding method of substrate
US-2024105497-A1 · Mar 28, 2024 · US
Seasoning method and plasma processing apparatus
US-2024030014-A1 · Jan 25, 2024 · US
Susceptor for epitaxial processing and epitaxial reactor including the susceptor
US-2024006225-A1 · Jan 4, 2024 · US
Vacuum Chuck with Polymeric Embossments
US-2015380294-A1 · Dec 31, 2015 · US
Substrate holding apparatus, exposure apparatus, and device fabricating method
US-9224632-B2 · Dec 29, 2015 · US
Focus ring and manufacturing method therefor
US-9196512-B2 · Nov 24, 2015 · US
Wafer Releasing
US-2015332951-A1 · Nov 19, 2015 · US
Substrate supporting edge ring with coating for improved soak performance
US-9184085-B2 · Nov 10, 2015 · US
Consumable isolation ring for movable substrate support assembly of a plasma processing chamber
US-9171702-B2 · Oct 27, 2015 · US
Cooled tape frame lift and low contact shadow ring for plasma heat isolation
US-9165812-B2 · Oct 20, 2015 · US
Substrate support device
US-9153463-B2 · Oct 6, 2015 · US
Substrate table, immersion lithographic apparatus and device manufacturing method
US-2015277238-A1 · Oct 1, 2015 · US
Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
US-2015267294-A1 · Sep 24, 2015 · US
Wafer rotation in a semiconductor chamber
US-2015262859-A1 · Sep 17, 2015 · US
Bevel etcher
US-9136105-B2 · Sep 15, 2015 · US
Method and system for a semiconductor for device package with a die-to-packaging substrate first bond
US-9136159-B2 · Sep 15, 2015 · US
Edge ring for a thermal processing chamber
US-9130001-B2 · Sep 8, 2015 · US
Device for holding wafer shaped articles
US-9130002-B2 · Sep 8, 2015 · US
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H10P72/7611?
- CPC H10P72/7611 is the Cooperative Patent Classification code for “Electricity.”
- How many patents are filed under CPC H10P72/7611 (Electricity)?
- Our database includes 2,416 publications tagged with this CPC code.
- Is patent activity under CPC H10P72/7611 growing?
- Publication counts under this code: 259 in 2024 vs 271 in 2025 (latest complete years).