Pad design for electrostatic chuck surface

Patent metadata

Field	Value
Publication number	US-9613846-B2
Application number	US-201414550106-A
Country	US
Kind code	B2
Filing date	Nov 21, 2014
Priority date	Nov 22, 2013
Publication date	Apr 4, 2017
Grant date	Apr 4, 2017

Abstract

Embodiments are directed to an electrostatic chuck surface having minimum contact area features. More particularly, embodiments of the present invention provide an electrostatic chuck assembly having a pattern of raised, elongated surface features for providing reduced particle generation and reduced wear of substrates and chucking devices.

First claim

The invention claimed is:

1. An electrostatic chuck, comprising:
a chuck surface; and
a pattern of bumps on the chuck surface, the pattern comprising:
a serpentine bump at a central region of the chuck surface; and
a first group of bumps with three sub-groups spaced at equal angular distance around a periphery of the chuck.

2. The electrostatic chuck of claim 1 , wherein the pattern of bumps further comprises a second group of bumps with three sub-groups, each sub-group of the second group of bumps disposed between two sub-groups of the first group of bumps.

3. The electrostatic chuck of claim 2 , wherein the pattern of bumps further comprises a plurality of elongated bumps arranged in concentric rings.

4. The electrostatic chuck of claim 3 , wherein the serpentine bump has a central straight portion and two outer curved portions, and the pattern of bumps further comprises a group of round bumps in two sub-groups, one sub-group on either side of the central straight portion of the serpentine bump.

5. The electrostatic chuck of claim 4 , further comprising a plurality of elongated bumps between the second group of bumps and the serpentine bump.

6. The electrostatic chuck of claim 5 , wherein the bumps of the plurality of bumps between the second group of bumps and the serpentine bump are curved, radially aligned, and arranged in concentric rings.

7. The electrostatic chuck of claim 4 , wherein the plurality of bumps between the second group of bumps and the serpentine bump has a radial extent between about 22% and about 70% of a radius of the electrostatic chuck.

8. The electrostatic chuck of claim 4 , wherein the round bumps are between the central straight portion of the serpentine bump and the outer curved portions of the serpentine bump.

9. The electrostatic chuck of claim 1 , wherein the serpentine bump has a central straight portion and two outer curved portions.

Assignees

• Applied Materials Inc

Inventors

• Raj Govinda
• Tsai Cheng-Hsiung
• Hirahara Robert T
• Narendrnath Kadthala R
• Koppa Manjunatha
• Marshall Ross

Classifications

• H10P72/72 Primary

  using electrostatic chucks · CPC title

• H10P72/7614 Primary

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• Y10T428/24314

  Slit or elongated · CPC title

• Y10T428/24298

  Noncircular aperture [e.g., slit, diamond, rectangular, etc.] · CPC title

• H01L21/6831

  Electricity · mapped topic