Etching method and etching apparatus
US-12575352-B2 · Mar 10, 2026 · US
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You Gen patents
You Gen is listed as an inventor on 26 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | You Gen |
| Total patents | 26 |
| First publication | Feb 28, 2017 |
| Latest publication | Mar 10, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Etching method and etching apparatus
US-12283489-B2 · Apr 22, 2025 · US
Etching method and etching apparatus
US-12272541-B2 · Apr 8, 2025 · US
Etching method and etching apparatus
US-11764070-B2 · Sep 19, 2023 · US
Etching method and etching apparatus
US-2023178378-A1 · Jun 8, 2023 · US
Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers
US-11574812-B2 · Feb 7, 2023 · US
Etching method and etching apparatus
US-2023014819-A1 · Jan 19, 2023 · US
Etching method and etching apparatus
US-2022384178-A1 · Dec 1, 2022 · US
Etching method and etching apparatus
US-2022068657-A1 · Mar 3, 2022 · US
Etching method and etching apparatus
US-2022020601-A1 · Jan 20, 2022 · US
Recent patents
Latest publications not already listed above.
Substrate treatment method, computer storage medium and substrate treatment system
US-2019341255-A1 · Nov 7, 2019 · US
Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers
US-10418242-B2 · Sep 17, 2019 · US
Substrate treatment method, computer storage medium and substrate treatment system
US-10329144-B2 · Jun 25, 2019 · US
High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container
US-10207349-B2 · Feb 19, 2019 · US
Substrate processing method, substrate processing apparatus, and storage medium
US-10199240-B2 · Feb 5, 2019 · US
Substrate processing method and storage medium
US-10096462-B2 · Oct 9, 2018 · US
Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium
US-10046370-B2 · Aug 14, 2018 · US
Substrate treatment method, computer storage medium and substrate treatment system
US-2018065843-A1 · Mar 8, 2018 · US
Method for processing target object
US-9911621-B2 · Mar 6, 2018 · US
Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium
US-2017320107-A1 · Nov 9, 2017 · US
Substrate treatment method, computer storage medium and substrate treatment system
US-2017287749-A1 · Oct 5, 2017 · US
Substrate treatment method, computer readable storage medium and substrate treatment system
US-9741583-B2 · Aug 22, 2017 · US
Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium
US-9662685-B2 · May 30, 2017 · US
Method for processing target object
US-2017148641-A1 · May 25, 2017 · US
Substrate treatment method, computer readable storage medium and substrate treatment system
US-2017133235-A1 · May 11, 2017 · US
Supercritical drying method for semiconductor substrate and supercritical drying apparatus
US-9583330-B2 · Feb 28, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 26 |
| Toshiba Memory Corp | 2 |
| Hayashi Hidekazu | 1 |
| Sato Yohei | 1 |
| Okuchi Hisashi | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0421 | 9 |
| H10P50/266 | 8 |
| G03F7/0002 | 8 |
| H10P76/4085 | 6 |
| H10P72/0458 | 6 |