Etching method and etching apparatus

Patent metadata

Field	Value
Publication number	US-12575352-B2
Application number	US-202318098112-A
Country	US
Kind code	B2
Filing date	Jan 18, 2023
Priority date	Jul 20, 2020
Publication date	Mar 10, 2026
Grant date	Mar 10, 2026

Abstract

An etching method includes a preparing step and a removing step. In the preparing step, a substrate is prepared which includes a first film, a second film stacked on the first film, and a hard mask stacked on the second film, such that the second film is etched with the hard mask having a formed pattern as a mask until the first film is exposed. In the removing step, the hard mask is removed using a fluorine-containing gas. Further, the removing step is executed for a time longer than a first time from a start of a supply of the fluorine-containing gas to a start of an etching of the hard mask, and shorter than a second time from the start of the supply of the fluorine-containing gas to a start of an etching of the first film.

First claim

The invention claimed is:

1 . An etching method comprising:
preparing a substrate which includes a first film, a second film stacked on the first film, and a hard mask stacked on the second film, the hard mask having a pattern that exposes an exposed portion of the second film to etching such that the etching of the exposed portion of the second film continues until the first film is exposed; removing the hard mask using a fluorine-containing gas, and modifying surfaces of the first film and the hard mask by supplying a modification gas to the substrate after the removing, wherein the removing is executed for a time longer than a first time that occurs from a start of a supply of the fluorine-containing gas to a start of an etching of the hard mask, and shorter than a second time from the start of the supply of the fluorine-containing gas to a start of an etching of the first film, and wherein the removing is further executed after the modifying.

2 . The etching method according to claim 1 , wherein the modifying and the removing are collectively repeated in order one or more times.

3 . The etching method according to claim 2 , wherein the hard mask is a metal compound containing a same type of metal as a metal included in the first film.

4 . The etching method according to claim 2 , wherein the fluorine-containing gas includes at least any one of a CIF3 gas, an F2 gas, an SF6 gas, and an IF7 gas.

5 . The etching method according to claim 2 , wherein the second film is a silicon nitride film, a carbon-containing silicon nitride film, or a silicon oxide film.

6 . The etching method according to claim 2 , wherein the modification gas is a rare gas, a nitrogen gas, an oxygen gas, steam, a hydrogen gas, or a carbon monoxide gas.

7 . The etching method according to claim 6 , wherein the hard mask is a metal compound containing a same type of metal as a metal included in the first film.

8 . The etching method according to claim 1 , wherein the modification gas is a rare gas, a nitrogen gas, an oxygen gas, steam, a hydrogen gas, or a carbon monoxide gas.

9 . The etching method according to claim 8 , wherein the hard mask is a metal compound containing a same type of metal as a metal included in the first film.

10 . The etching method according to claim 8 , wherein the fluorine-containing gas includes at least any one of a CIF3 gas, an F2 gas, an SF6 gas, and an IF7 gas.

11 . The etching method according to claim 8 , wherein the second film is a silicon nitride film, a carbon-containing silicon nitride film, or a silicon oxide film.

12 . The etching method according to claim 1 , wherein the hard mask is a metal compound containing a same type of metal as a metal included in the first film.

13 . The etching method according to claim 12 , wherein the metal is tungsten.

14 . The etching method according to claim 1 , wherein the fluorine-containing gas includes at least any one of a CIF3 gas, an F2 gas, an SF6 gas, and an IF7 gas.

15 . The etching method according to claim 1 , wherein the second film is a silicon nitride film, a carbon-containing silicon nitride film, or a silicon oxide film.

Assignees

• Tokyo Electron Ltd

Inventors

• Okabe Noriaki
• Shindo Naoki
• You Gen
• Seino Takuya

Classifications

• H10P72/0421 Primary

  for drying etching · CPC title

• H10P50/73 Primary

  using masks for insulating materials · CPC title

• H10P50/283 Primary

  by chemical means · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H10P72/00

  Handling or holding of wafers, substrates or devices during manufacture or treatment thereof · CPC title