Substrate treatment method, computer storage medium and substrate treatment system

US10329144B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10329144-B2
Application numberUS-201615554026-A
CountryUS
Kind codeB2
Filing dateFeb 10, 2016
Priority dateMar 5, 2015
Publication dateJun 25, 2019
Grant dateJun 25, 2019

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A substrate treatment method using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer includes a polymer separating step, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to a hexagonal close-packed structure in a plan view after the polymer separating step, and at the polymer separating step, a columnar first hydrophilic polymer is phase-separated on each of circular patterns of hydrophobic coating films and a columnar second hydrophilic polymer is phase-separated between the first hydrophilic polymers, and a diameter of the circular pattern is set so that the first hydrophilic polymers and the second hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in a plan view.

First claim

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What is claimed is: 1. A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, the substrate treatment method comprising: a neutral layer forming step of forming a neutral layer on the substrate; a coating film pattern forming step of forming a plurality of circular patterns of hydrophobic coating films at predetermined positions on the substrate after the neutral layer forming step, wherein the predetermined positions are based on a desired pattern which is a hexagonal close-packed structure in a plan view; a block copolymer coating step of applying the block copolymer onto the substrate on which the circular patterns of the hydrophobic coating films are formed; a polymer separating step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer; and a polymer removing step of selectively removing the hydrophilic polymer from the phase-separated block copolymer, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in the plan view after the polymer separating step, and wherein at the polymer separating step, a columnar first hydrophilic polymer is phase-separated on each of the circular patterns of the hydrophobic coating films and a columnar second hydrophilic polymer is phase-separated between the first hydrophilic polymers, and a diameter of the circular pattern of the hydrophobic coating film is set to 2(L 0 −R) or less so that the first hydrophilic polymers and the second hydrophilic polymers align at the positions corresponding to the hexagonal close-packed structure in the plan view, where L 0 : a pitch between the first hydrophilic polymer and the second hydrophilic polymer adjacent to each other, and R: a radius of the second hydrophilic polymer. 2. The substrate treatment method according to claim 1 , wherein the ratio of a molecular weight of the hydrophilic polymer in the block copolymer is 32% to 34%. 3. The substrate treatment method according to claim 1 , wherein the hydrophilic polymer is polymethyl methacrylate, and wherein the hydrophobic polymer is polystyrene. 4. The substrate treatment method according to claim 1 , wherein the hydrophobic coating film is a polystyrene film. 5. A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, the substrate treatment method comprising: a neutral layer forming step of forming a neutral layer on the substrate; a coating film pattern forming step of forming a plurality of circular patterns of hydrophobic coating films at predetermined positions on the substrate after the neutral layer forming step, wherein the predetermined positions are based on a desired pattern which is a hexagonal close-packed structure in a plan view; a block copolymer coating step of applying the block copolymer onto the substrate on which the circular patterns of the hydrophobic coating films are formed; a polymer separating step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer; and a polymer removing step of selectively removing the hydrophilic polymer from the phase-separated block copolymer, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in the plan view after the polymer separating step, and wherein the circular pattern of the hydrophobic coating films formed at the coating film pattern forming step is decided based on following (1) to (3): (1) a diameter of the circular pattern of the hydrophobic coating films is 0.8 to 1.5 times a desired pitch between the hydrophilic polymers aligning after the polymer separating step; (2) a distance between closest adjacent circular patterns of the hydrophobic coating films is twice the desired pitch; and (3) at least one of the circular patterns of the hydrophobic coating films is arranged on a circumference having a radius of 2√{square root over ( )}3 times the desired pitch around the circular pattern of the hydrophobic coating films. 6. The substrate treatment method according to claim 5 , wherein the ratio of a molecular weight of the hydrophilic polymer in the block copolymer is 32% to 34%. 7. The substrate treatment method according to claim 5 , wherein the hydrophilic polymer is polymethyl methacrylate, and wherein the hydrophobic polymer is polystyrene. 8. The substrate treatment method according to claim 5 , wherein the hydrophobic coating film is a polystyrene film. 9. A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, the substrate treatment method comprising: a neutral layer forming step of forming a neutral layer on the substrate; a coating film pattern forming step of forming a plurality of circular patterns of hydrophobic coating films at predetermined positions on the substrate after the neutral layer forming step, wherein the predetermined positions are based on a desired pattern which is a hexagonal close-packed structure in a plan view; a block copolymer coating step of applying the block copolymer onto the substrate on which the circular patterns of the hydrophobic coating films are formed; a polymer separating step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer; and a polymer removing step of selectively removing the hydrophilic polymer from the phase-separated block copolymer, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in the plan view after the polymer separating step, and wherein the circular patterns of the hydrophobic coating films formed at the coating film pattern forming step are arranged in an equilateral triangle shape having a pitch twice a desired pitch between the hydrophilic polymers aligning after the polymer separating step. 10. The substrate treatment method according to claim 9 , wherein the ratio of a molecular weight of the hydrophilic polymer in the block copolymer is 32% to 34%. 11. The substrate treatment method according to claim 9 , wherein the hydrophilic polymer is polymethyl methacrylate, and wherein the hydrophobic polymer is polystyrene. 12. The substrate treatment method according to claim 9 , wherein the hydrophobic coating film is a polystyrene film.

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Classifications

  • characterised by the processes involved to create the masks · CPC title

  • of masks comprising organic materials · CPC title

  • Mechanical parts of transfer devices · CPC title

  • vertical arrangement · CPC title

  • Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer · CPC title

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What does patent US10329144B2 cover?
A substrate treatment method using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer includes a polymer separating step, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to a hexagonal close-packed structure in a plan view after the polyme…
Who is the assignee on this patent?
Tokyo Electron Ltd
What technology area does this patent fall under?
Primary CPC classification B81C1/00428. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 25 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).