System to collect and visualize software usage metrics
US-2025260774-A1 · Aug 14, 2025 · US
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Ward William patents
Ward William is listed as an inventor on 34 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Ward William |
| Total patents | 34 |
| First publication | Jan 22, 2015 |
| Latest publication | Aug 14, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
System to collect and visualize software usage metrics
US-12316812-B2 · May 27, 2025 · US
System to collect and visualize software usage metrics
US-2024089185-A1 · Mar 14, 2024 · US
System to collect and visualize software usage metrics
US-11870666-B2 · Jan 9, 2024 · US
System to collect and visualize software usage metrics
US-2023025877-A1 · Jan 26, 2023 · US
System to collect and visualize software usage metrics
US-11444854-B2 · Sep 13, 2022 · US
Polishing composition and method utilizing abrasive particles treated with an aminosilane
US-11034862-B2 · Jun 15, 2021 · US
System to collect and visualize software usage metrics
US-2020204466-A1 · Jun 25, 2020 · US
Polishing composition and method utilizing abrasive particles treated with an aminosilane
US-2020056069-A1 · Feb 20, 2020 · US
System to collect and visualize software usage metrics
US-10554516-B1 · Feb 4, 2020 · US
Recent patents
Latest publications not already listed above.
Polishing composition and method utilizing abrasive particles treated with an aminosilane
US-10508219-B2 · Dec 17, 2019 · US
Method of polishing group III-V materials
US-10418248-B2 · Sep 17, 2019 · US
CMP method for suppression of titanium nitride and titanium/titanium nitride removal
US-9752057-B2 · Sep 5, 2017 · US
Method of polishing group iii-v materials
US-2017236718-A1 · Aug 17, 2017 · US
Compositions and methods for selective polishing of silicon nitride materials
US-9633863-B2 · Apr 25, 2017 · US
Polishing composition and method utilizing abrasive particles treated with an aminosilane
US-9617450-B2 · Apr 11, 2017 · US
Polishing composition and method utilizing abrasive particles treated with an aminosilane
US-2017051181-A1 · Feb 23, 2017 · US
Composition for tungsten CMP
US-9566686-B2 · Feb 14, 2017 · US
Method to selectively polish silicon carbide films
US-9548211-B2 · Jan 17, 2017 · US
Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials
US-9303187-B2 · Apr 5, 2016 · US
Mixed abrasive tungsten CMP composition
US-9303190-B2 · Apr 5, 2016 · US
Composition for tungsten CMP
US-9303188-B2 · Apr 5, 2016 · US
Composition for tungsten CMP
US-9303189-B2 · Apr 5, 2016 · US
Composition for tungsten cmp
US-2016089763-A1 · Mar 31, 2016 · US
Composition for tungsten CMP
US-9238754-B2 · Jan 19, 2016 · US
Mixed abrasive tungsten cmp composition
US-2015267083-A1 · Sep 24, 2015 · US
Composition for tungsten cmp
US-2015259572-A1 · Sep 17, 2015 · US
Composition for tungsten cmp
US-2015259573-A1 · Sep 17, 2015 · US
Composition for tungsten cmp
US-2015259574-A1 · Sep 17, 2015 · US
Cmp method for suppression of titanium nitride and titanium/titanium nitride removal
US-2015221521-A1 · Aug 6, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Cabot Microelectronics Corp | 25 |
| Palantir Technologies Inc | 8 |
| Ward William | 3 |
| Cmc Mat Inc | 1 |
| Ncr Corp | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C09G1/02 | 25 |
| C09K3/1463 | 20 |
| H10P52/403 | 17 |
| C09K3/1436 | 17 |
| H10P52/402 | 15 |