Method to fabricate blazed grating using spacer and ion beam etching
US-2026051455-A1 · Feb 19, 2026 · US
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Wang Wenhui patents
Wang Wenhui is listed as an inventor on 59 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wang Wenhui |
| Total patents | 59 |
| First publication | Apr 9, 2015 |
| Latest publication | Feb 19, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for forming staircase gratings with reduced top and bottom critical dimensions
US-2026050127-A1 · Feb 19, 2026 · US
Process integration flow for staircase gratings
US-2025306276-A1 · Oct 2, 2025 · US
Diffuser-less gray-tone lithography process, mask design, and fabrication method
US-2025284200-A1 · Sep 11, 2025 · US
Spin-orbit torque MRAM structure and manufacture thereof
US-12201030-B2 · Jan 14, 2025 · US
Contact over active gate structure
US-12198985-B2 · Jan 14, 2025 · US
Spin-orbit torque mram structure and manufacture thereof
US-2023389441-A1 · Nov 30, 2023 · US
Spin-orbit torque MRAM structure and manufacture thereof
US-11723283-B2 · Aug 8, 2023 · US
Contact over active gate structure
US-2022367285-A1 · Nov 17, 2022 · US
Contact over active gate structure
US-11437284-B2 · Sep 6, 2022 · US
Recent patents
Latest publications not already listed above.
Spin-orbit torque mram structure and manufacture thereof
US-2021351342-A1 · Nov 11, 2021 · US
Method for forming a layer
US-10957590-B2 · Mar 23, 2021 · US
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition
US-10927450-B2 · Feb 23, 2021 · US
Contact over active gate structure
US-10930555-B2 · Feb 23, 2021 · US
Contact over active gate structure
US-10930556-B2 · Feb 23, 2021 · US
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition
US-2020199741-A1 · Jun 25, 2020 · US
Method for forming a layer
US-2020161181-A1 · May 21, 2020 · US
Techniques for contact formation in self-aligned replacement gate device
US-10644117-B2 · May 5, 2020 · US
Contact Over Active Gate Structure
US-2020075409-A1 · Mar 5, 2020 · US
Contact Over Active Gate Structure
US-2020075422-A1 · Mar 5, 2020 · US
Contact Over Active Gate Structure
US-2020075408-A1 · Mar 5, 2020 · US
Techniques for contact formation in self-aligned replacment gate device
US-2019348509-A1 · Nov 14, 2019 · US
Integrated circuit structure including power rail and tapping wire with method of forming same
US-10347546-B2 · Jul 9, 2019 · US
Dummy assist features for pattern support
US-10332745-B2 · Jun 25, 2019 · US
Optical fiber pressure sensor with uniform diaphragm and method of fabricating same
US-10281348-B2 · May 7, 2019 · US
Dummy gate used as interconnection and method of making the same
US-10283505-B2 · May 7, 2019 · US
Structure with local contact for shorting a gate electrode to a source/drain region
US-10204861-B2 · Feb 12, 2019 · US
Via formation using sidewall image transfer process to define lateral dimension
US-10157789-B2 · Dec 18, 2018 · US
Shrink process aware assist features
US-10153162-B2 · Dec 11, 2018 · US
Method, apparatus, and system for two-dimensional power rail to enable scaling of a standard cell
US-10147714-B2 · Dec 4, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Globalfoundries Inc | 33 |
| Applied Materials Inc | 20 |
| IBM | 4 |
| St Microelectronics Inc | 4 |
| Univ Massachusetts | 3 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10W20/069 | 25 |
| H10D84/038 | 21 |
| H10W20/077 | 18 |
| H10W20/0693 | 14 |
| H10D64/017 | 13 |