Methods of forming self-aligned vias
US-11094544-B2 · Aug 17, 2021 · US
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Schmiege Benjamin patents
Schmiege Benjamin is listed as an inventor on 51 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Schmiege Benjamin |
| Total patents | 51 |
| First publication | Apr 14, 2015 |
| Latest publication | Aug 17, 2021 |
Notable patents
Publications ranked by popularity score, then publication date.
Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
US-10906925-B2 · Feb 2, 2021 · US
Methods and apparatus for depositing yttrium-containing films
US-2020392624-A1 · Dec 17, 2020 · US
Methods and apparatus for depositing yttrium-containing films
US-10760159-B2 · Sep 1, 2020 · US
Ruthenium Precursors For ALD And CVD Thin Film Deposition And Uses Thereof
US-2020148712-A1 · May 14, 2020 · US
In-situ formation of non-volatile lanthanide thin film precursors and use in ALD and CVD
US-10643838-B2 · May 5, 2020 · US
Selective deposition defects removal by chemical etch
US-10643840-B2 · May 5, 2020 · US
System and method for controllable non-volatile metal removal
US-10633743-B2 · Apr 28, 2020 · US
Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
US-10577386-B2 · Mar 3, 2020 · US
Methods Of Forming Self-Aligned Vias
US-2019385849-A1 · Dec 19, 2019 · US
Recent patents
Latest publications not already listed above.
Oxide and metal removal
US-10465294-B2 · Nov 5, 2019 · US
Methods of forming self-aligned vias
US-10410865-B2 · Sep 10, 2019 · US
Precursors for deposition of metal, metal nitride and metal oxide based films of transition metals
US-10323054-B2 · Jun 18, 2019 · US
Methods of etching films comprising transition metals
US-10297462-B2 · May 21, 2019 · US
Selective dry etching of metal films comprising multiple metal oxides
US-10242885-B2 · Mar 26, 2019 · US
Methods of etching films with reduced surface roughness
US-10233547-B2 · Mar 19, 2019 · US
Selective Deposition Defects Removal By Chemical Etch
US-2019080904-A1 · Mar 14, 2019 · US
Lanthanide, Yttrium and Scandium precursors for ALD, CVD and Thin Film Doping and Methods of Use
US-2019062916-A1 · Feb 28, 2019 · US
Methods and Apparatus for Depositing Yttrium-Containing Films
US-2019017171-A1 · Jan 17, 2019 · US
Methods Of Forming Self-Aligned Vias
US-2019013202-A1 · Jan 10, 2019 · US
In-Situ Formation of Non-Volatile Lanthanide Thin Film Precursors and Use in ALD and CVD
US-2018366322-A1 · Dec 20, 2018 · US
Selective Dry Etching of Metal Films Comprising Multiple Metal Oxides
US-2018342403-A1 · Nov 29, 2018 · US
Methods of forming self-aligned vias
US-10083834-B2 · Sep 25, 2018 · US
System And Method For Controllable Non-Volatile Metal Removal
US-2018265988-A1 · Sep 20, 2018 · US
Methods of Etching Films with Reduced Surface Roughness
US-2018195179-A1 · Jul 12, 2018 · US
System and method for controllable non-volatile metal removal
US-10000853-B2 · Jun 19, 2018 · US
Ruthenium Precursors For ALD And CVD Thin Film Deposition And Uses Thereof
US-2018155379-A1 · Jun 7, 2018 · US
Precursors For Deposition Of Metal, Metal Nitride And Metal Oxide Based Films Of Transition Metals
US-2018148466-A1 · May 31, 2018 · US
Methods Of Forming Self-Aligned Vias
US-2018096847-A1 · Apr 5, 2018 · US
Methods of etching films with reduced surface roughness
US-9896770-B2 · Feb 20, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 45 |
| Varian Semiconductor Equipment Ass Inc | 6 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23F1/12 | 24 |
| C23F4/00 | 21 |
| H10P50/266 | 18 |
| C23C16/45553 | 12 |
| C23C16/34 | 12 |