Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
US-10577386-B2 · Mar 3, 2020 · US
Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
US10906925B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10906925-B2 |
| Application number | US-202016747220-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 20, 2020 |
| Priority date | Dec 6, 2016 |
| Publication date | Feb 2, 2021 |
| Grant date | Feb 2, 2021 |
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Abstract
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where each R is independently a C1-C13 alkyl or aryl group and each R′ is independently H, C1-C10 alkyl or aryl group are described. Processing methods using the metal coordination complexes are also described.
First claim
Opening claim text (preview).
What is claimed is: 1. A metal coordination complex having a structure represented by: wherein each R is independently a C 1 -C 13 alkyl or aryl group and each R′ is independently H, C 1 -C 10 alkyl or aryl group, M is a metal selected from the group consisting of ruthenium (Ru), tungsten (W), rhodium (Rh), osmium (Os), iridium (Ir), nickel (Ni), cobalt (Co), lanthanum (La), cerium (Ce), praseodymium (Pr), neodymium (Nd), promethium (Pm), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb), lutetium (Lu), yttrium (Y), and scandium (Sc), L is a neutral donor ligand selected from the group consisting of one or more of CO, NR″ 3 , PR″ 3 , dimethyl ether (DME), tetrahydrofuran (THF) and tetramethylethylenediamine (TMEDA) where each R″ is independently H, C 1 -C 6 alkyl or aryl group. 2. The metal coordination complex of claim 1 , wherein M comprises ruthenium (Ru). 3. The metal coordination complex of claim 1 , wherein at least one of the R′ groups is not hydrogen. 4. The metal coordination complex of claim 3 , wherein at least one of the R′ groups comprises an alkyl group having 4 or 5 carbon atoms. 5. The metal coordination complex of claim 1 , wherein at least one neutral donor ligand is CO. 6. A metal coordination complex having a structure represented by: wherein each R is independently a C 1 -C 13 alkyl or aryl group and each R′ is independently H, C 1 -C 10 alkyl or aryl group, L is a neutral donor ligand selected from the group consisting of one or more of CO, NR″ 3 , PR″ 3 , dimethyl ether (DME), tetrahydrofuran (THF) and tetramethylethylenediamine (TMEDA) where each R″ is independently H, C 1 -C 6 alkyl or aryl group, wherein at least one of the R′ groups is not hydrogen. 7. The metal coordination complex of claim 6 , wherein at least one of the R′ groups comprises an alkyl group having 4 or 5 carbon atoms. 8. The metal coordination complex of claim 6 , wherein at least one neutral donor ligand is CO.
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Classifications
characterized by the use of precursors specially adapted for ALD · CPC title
using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title
- C07F15/0053Primary
without a metal-carbon linkage · CPC title
Use of plasma, radiation or electromagnetic fields · CPC title
Ruthenium compounds · CPC title
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Frequently asked questions
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- What does patent US10906925B2 cover?
- where each R is independently a C1-C13 alkyl or aryl group and each R′ is independently H, C1-C10 alkyl or aryl group are described. Processing methods using the metal coordination complexes are also described.
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification C07F15/0053. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 02 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).