Copper electroplating baths containing reaction products of amines, polyacrylamides and bisepoxoides
US-12398479-B2 · Aug 26, 2025 · US
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Rzeznik Maria patents
Rzeznik Maria is listed as an inventor on 25 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Rzeznik Maria |
| Total patents | 25 |
| First publication | Oct 8, 2015 |
| Latest publication | Aug 26, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Copper electroplating baths containing compounds of reaction products of amines, polyacrylamides and sultones
US-11761107-B2 · Sep 19, 2023 · US
Copper electroplating baths containing reaction products of amines, polyacrylamides and and bisepoxoides
US-2021205052-A9 · Jul 8, 2021 · US
Copper electroplating baths containing compounds of reaction products of amines and polyacrylamides
US-10738388-B2 · Aug 11, 2020 · US
Copper electroplating baths containing reaction products of amines, polyacrylamides and and bisepoxoides
US-2020179087-A1 · Jun 11, 2020 · US
Copper electroplating baths containing reaction products of aminex, polyacrylamides and bisepoxides
US-10662541-B2 · May 26, 2020 · US
Copper electroplating baths containing compounds of reaction products of amines, polyacrylamides and sultones
US-2020149176-A1 · May 14, 2020 · US
Copper electroplating baths containing compounds of reaction products of amines, polyacrylamides and sultones
US-10604858-B2 · Mar 31, 2020 · US
Copper electroplating baths containing compounds of reaction products of amines and quinones
US-10590556-B2 · Mar 17, 2020 · US
Nitrogen containing polymers as levelers
US-10196751-B2 · Feb 5, 2019 · US
Recent patents
Latest publications not already listed above.
Polymers containing benzimidazole moieties as levelers
US-10201097-B2 · Feb 5, 2019 · US
Copper electroplating baths containing reaction products of aminex, polyacrylamides and bisepoxides
US-2018245228-A1 · Aug 30, 2018 · US
Copper electroplating baths containing compounds of reaction products of amines, polyacrylamides and sultones
US-2018237931-A1 · Aug 23, 2018 · US
Copper electroplating baths containing compounds of reaction products of amines and quinones
US-2018237930-A1 · Aug 23, 2018 · US
Copper electroplating baths containing compounds of reaction products of amines and polyacrylamides
US-2018237929-A1 · Aug 23, 2018 · US
Electroless metallization of dielectrics with alkaline stable pyrazine derivative containing catalysts
US-9918389-B2 · Mar 13, 2018 · US
Horizontal method of electroless metal plating of substrates with ionic catalysts
US-2017251557-A1 · Aug 31, 2017 · US
Electroless metallization of dielectrics with alkaline stable pyrimidine derivative containing catalysts
US-2017175272-A9 · Jun 22, 2017 · US
Electroless metallization of dielectrics with alkaline stable pyrazine derivative containing catalysts
US-2017156216-A9 · Jun 1, 2017 · US
Stable catalysts for electroless metallization
US-9611549-B2 · Apr 4, 2017 · US
Electroless metallization of dielectrics with alkaline stable pyrimidine derivative containing catalysts
US-2017044671-A1 · Feb 16, 2017 · US
Electroless metallization of dielectrics with alkaline stable pyrazine derivative containing catalysts
US-2017042039-A1 · Feb 9, 2017 · US
Polymers containing benzimidazole moieties as levelers
US-2016255729-A1 · Sep 1, 2016 · US
Nitrogen containing polymers as levelers
US-2016237579-A1 · Aug 18, 2016 · US
Stable catalysts for electroless metallization
US-2015284856-A1 · Oct 8, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Mat | 24 |
| Dow Global Technologies Llc | 17 |
| Rohm And Haas Elecironic Mat Llc | 2 |
| Rphm And Haas Electronic Mat Llc | 1 |
| Rohm and Haas Electronic Meterials llc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C25D3/38 | 17 |
| C25D7/123 | 17 |
| C25D3/58 | 15 |
| C23C18/1653 | 9 |
| C23C18/30 | 8 |