Electroless metallization of dielectrics with alkaline stable pyrazine derivative containing catalysts

US9918389B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9918389-B2
Application numberUS-201414477855-A
CountryUS
Kind codeB2
Filing dateSep 4, 2014
Priority dateSep 4, 2013
Publication dateMar 13, 2018
Grant dateMar 13, 2018

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Abstract

Official abstract text for this publication.

Pyrazine derivatives which contain one or more electron donating groups on the ring are used as catalytic metal complexing agents in aqueous alkaline environments to catalyze electroless metal plating on metal clad and un-clad substrates. The catalysts are monomers and free of tin and antioxidants.

First claim

Opening claim text (preview).

What is claimed is: 1. A method comprising: a) providing a substrate comprising a dielectric, wherein the dielectric is chosen from one or more of fiberglass, epoxy resin, acrylonitrile butadienestyrene, polyphenylene ethers, polyphenylene sulfides, polysulfones and polytetrafluoroethylene; b) applying an aqueous alkaline catalyst solution to the substrate comprising the dielectric, the aqueous alkaline catalyst comprises a monomeric complex of palladium ions and one or more pyrazine derivatives having formula: wherein R 1 , R 2 , R 3 and R 4 may be the same or different and are hydrogen, linear or branched (C 1 -C 5 )alky, —N(R) 2 , linear or branched amino(C 1 -C 5 )alkyl, acetyl, linear or branched hydroxy(C 1 -C 5 )alkyl, or linear or branched (C 1 -C 5 )alkoxy, and where R may be the same or different and is linear or branched (C 1 -C 5 )alkyl, and with the proviso that at least one of R 1 , R 2 , R 3 and R 4 is other than hydrogen, wherein the aqueous alkaline catalyst is free of tin; c) applying a reducing agent to the substrate comprising the dielectric and the aqueous alkaline catalyst comprising the monomeric complex and the palladium ions to reduce the palladium ions to their metallic state prior to metallization of the substrate; and d) immersing the substrate comprising the dielectric and palladium metal into an alkaline metal plating bath to electrolessly plate metal on the substrate comprising the dielectric. 2. The method of claim 1 , wherein the one or more pyrazine derivatives are chosen from 2,6-dimethylpyrazine, 2,3-dimethylpyrazine, 2,5-dimethylpyrazine, 2,3,5-trimethylpyraizine, 2-acetylpyrazine, ethylpyrazine, methoxypyrazine, 3,4-dimethylpyrazine and 2-(2′-hydroxyethyl)pyrazine. 3. The method of claim 1 , wherein a molar ratio of the one or more pyrazine derivatives to the metal ions is 1:1 to 4:1. 4. The method of claim 1 , wherein the electrolessly plated metal on the substrate is copper, copper alloy, nickel or nickel alloy. 5. The method of claim 1 , wherein the aqueous alkaline catalyst solution has a pH of 8.5 or greater. 6. The method of claim 5 , wherein the aqueous alkaline catalyst solution has pH of 9 or greater. 7. The method of claim 1 , wherein the substrate comprising the dielectric further comprises a plurality of through-holes. 8. The method of claim 7 , wherein the substrate comprising the dielectric further comprises metal cladding.

Assignees

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Classifications

  • C23C18/30Primary

    Activating {or accelerating or sensitising with palladium or other noble metal} · CPC title

  • using reducing agents · CPC title

  • General concepts, e.g. reviews, relating to methods of using catalyst systems, the concept being defined by a common method or theory, e.g. microwave heating or multiple stereoselectivity · CPC title

  • with two steps starting with addition of reducing agent followed by metal deposition · CPC title

  • using reducing agents · CPC title

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What does patent US9918389B2 cover?
Pyrazine derivatives which contain one or more electron donating groups on the ring are used as catalytic metal complexing agents in aqueous alkaline environments to catalyze electroless metal plating on metal clad and un-clad substrates. The catalysts are monomers and free of tin and antioxidants.
Who is the assignee on this patent?
Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C23C18/30. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).