Acid mist suppression in copper electrowinning
US-12098474-B2 · Sep 24, 2024 · US
US10662541B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10662541-B2 |
| Application number | US-201515752617-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 8, 2015 |
| Priority date | Oct 8, 2015 |
| Publication date | May 26, 2020 |
| Grant date | May 26, 2020 |
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Copper electroplating baths include reaction products of amines, polyacrylamides and bisepoxides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
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What is claimed is: 1. An electroplating bath comprising one or more sources of copper ions, one or more accelerators, one or more suppressors, one or more electrolytes and one or more reaction products, wherein the one or more reaction products comprise a bisepoxide, an amine and an acrylamide, wherein the amine has a formula: wherein R′ comprises hydrogen or a moiety: —CH 2 —CH 2 —; R comprises H 2 N—(CH 2 ) m —, HO—(CH 2 ) m —, —HN—CH 2 —CH 2 —, Q-(CH 2 ) m —, a moiety having a structure: a moiety having a structure: or a moiety having a structure: where R 1 -R 14 are independently chosen from hydrogen and (C 1 -C 3 )alkyl; m is an integer from 2-12, n is an integer from 2-10, p is an integer from 1-10, q is an integer from 2-10 and r, s and t are numbers from 1 to 10; Q is a 5-6 membered heterocyclic ring having one or two nitrogen atoms in the ring or Q is a benzene sulfonamide moiety; and with a proviso that when R′ is —CH 2 —CH 2 —, R is —HN—CH 2 —CH 2 — and the nitrogen of R forms a covalent bond with a carbon atom of R′ to form a heterocyclic ring; and the acrylamide has a formula: wherein R″ is a moiety having a structure: a moiety having a structure: a moiety having a structure: or a substituted or unsubstituted triazinane ring or a piperizine ring, wherein R 15 comprises hydrogen or hydroxyl; u is an integer from 1 to 2 and v, x and y are independently integers of 1 to 10; R 16 and R 17 are independently chosen from hydrogen and carbonyl moiety, and with the proviso that when R 16 and R 17 are carbonyl moieties, the carbonyl moieties form a covalent bond with the carbons of the vinyl groups of formula (VI) displacing a hydrogen to form the covalent bond with the carbons of the vinyl groups to form a five membered heterocyclic ring. 2. The electroplating bath of claim 1 , wherein the one or more reaction products of the electroplating bath are in amounts of 0.01 ppm to 1000 ppm. 3. The electroplating bath of claim 1 , wherein the electroplating bath further comprises one or more sources of tin ions. 4. A method of electroplating comprising: a) providing a substrate; b) immersing the substrate in an electroplating bath comprising one or more sources of copper ions, one or more accelerators, one or more suppressors, one or more electrolytes and one or more reaction products, wherein the one or more reaction products comprise a bisepoxide, an amine and an acrylamide, wherein the amine has a formula: wherein R′ comprises hydrogen or a moiety: —CH 2 —CH 2 —; R comprises H 2 N—(CH 2 ) m —, HO—(CH 2 ) m —, —HN—CH 2 —CH 2 —, Q-(CH 2 ) m —, a moiety having a structure: a moiety having a structure: or a moiety having a structure: where R 1 -R 14 are independently chosen from hydrogen and (C 1 -C 3 )alkyl; m is an integer from 2-12, n is an integer from 2-10, p is an integer from 1-10, q is an integer from 2-10 and r, s and t are numbers from 1 to 10; Q is a 5-6 membered heterocyclic ring having one or two nitrogen atoms in the ring or Q is a benzene sulfonamide moiety; and with a proviso that when R′ is —CH 2 —CH 2 —, R is —HN—CH 2 —CH 2 — and the nitrogen of R forms a covalent bond with a carbon atom of R′ to form a heterocyclic ring; and the acrylamide has a formula: wherein R″ is a moiety having a structure: a moiety having a structure: a moiety having a structure: or a substituted or unsubstituted triazinane ring or a piperizine ring, wherein R 15 comprises hydrogen or hydroxyl; u is an integer from 1 to 2 and v, x and y are independently integers of 1 to 10; R 16 and R 17 are independently chosen from hydrogen and carbonyl moiety, and with the proviso that when R 16 and R 17 are carbonyl moieties, the carbonyl moieties form a covalent bond with the carbons of the vinyl groups of formula (VI) displacing a hydrogen to form the covalent bond with the carbons of the vinyl groups to form a five membered heterocyclic ring; c) applying a current to the substrate and the electroplating bath; and d) electroplating copper on the substrate. 5. The method of claim 4 , wherein the substrate comprises a plurality of one or more of through-holes, trenches and vias.
of copper · CPC title
Semiconductors first coated with a seed layer or a conductive layer · CPC title
containing more than 50% by weight of copper · CPC title
Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating · CPC title
Polyalkylene(poly)amines · CPC title
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