Copper electroplating baths containing reaction products of aminex, polyacrylamides and bisepoxides

US10662541B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10662541-B2
Application numberUS-201515752617-A
CountryUS
Kind codeB2
Filing dateOct 8, 2015
Priority dateOct 8, 2015
Publication dateMay 26, 2020
Grant dateMay 26, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Copper electroplating baths include reaction products of amines, polyacrylamides and bisepoxides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.

First claim

Opening claim text (preview).

What is claimed is: 1. An electroplating bath comprising one or more sources of copper ions, one or more accelerators, one or more suppressors, one or more electrolytes and one or more reaction products, wherein the one or more reaction products comprise a bisepoxide, an amine and an acrylamide, wherein the amine has a formula: wherein R′ comprises hydrogen or a moiety: —CH 2 —CH 2 —; R comprises H 2 N—(CH 2 ) m —, HO—(CH 2 ) m —, —HN—CH 2 —CH 2 —, Q-(CH 2 ) m —, a moiety having a structure: a moiety having a structure: or a moiety having a structure: where R 1 -R 14 are independently chosen from hydrogen and (C 1 -C 3 )alkyl; m is an integer from 2-12, n is an integer from 2-10, p is an integer from 1-10, q is an integer from 2-10 and r, s and t are numbers from 1 to 10; Q is a 5-6 membered heterocyclic ring having one or two nitrogen atoms in the ring or Q is a benzene sulfonamide moiety; and with a proviso that when R′ is —CH 2 —CH 2 —, R is —HN—CH 2 —CH 2 — and the nitrogen of R forms a covalent bond with a carbon atom of R′ to form a heterocyclic ring; and the acrylamide has a formula: wherein R″ is a moiety having a structure: a moiety having a structure: a moiety having a structure: or a substituted or unsubstituted triazinane ring or a piperizine ring, wherein R 15 comprises hydrogen or hydroxyl; u is an integer from 1 to 2 and v, x and y are independently integers of 1 to 10; R 16 and R 17 are independently chosen from hydrogen and carbonyl moiety, and with the proviso that when R 16 and R 17 are carbonyl moieties, the carbonyl moieties form a covalent bond with the carbons of the vinyl groups of formula (VI) displacing a hydrogen to form the covalent bond with the carbons of the vinyl groups to form a five membered heterocyclic ring. 2. The electroplating bath of claim 1 , wherein the one or more reaction products of the electroplating bath are in amounts of 0.01 ppm to 1000 ppm. 3. The electroplating bath of claim 1 , wherein the electroplating bath further comprises one or more sources of tin ions. 4. A method of electroplating comprising: a) providing a substrate; b) immersing the substrate in an electroplating bath comprising one or more sources of copper ions, one or more accelerators, one or more suppressors, one or more electrolytes and one or more reaction products, wherein the one or more reaction products comprise a bisepoxide, an amine and an acrylamide, wherein the amine has a formula: wherein R′ comprises hydrogen or a moiety: —CH 2 —CH 2 —; R comprises H 2 N—(CH 2 ) m —, HO—(CH 2 ) m —, —HN—CH 2 —CH 2 —, Q-(CH 2 ) m —, a moiety having a structure: a moiety having a structure: or a moiety having a structure: where R 1 -R 14 are independently chosen from hydrogen and (C 1 -C 3 )alkyl; m is an integer from 2-12, n is an integer from 2-10, p is an integer from 1-10, q is an integer from 2-10 and r, s and t are numbers from 1 to 10; Q is a 5-6 membered heterocyclic ring having one or two nitrogen atoms in the ring or Q is a benzene sulfonamide moiety; and with a proviso that when R′ is —CH 2 —CH 2 —, R is —HN—CH 2 —CH 2 — and the nitrogen of R forms a covalent bond with a carbon atom of R′ to form a heterocyclic ring; and the acrylamide has a formula: wherein R″ is a moiety having a structure: a moiety having a structure: a moiety having a structure: or a substituted or unsubstituted triazinane ring or a piperizine ring, wherein R 15 comprises hydrogen or hydroxyl; u is an integer from 1 to 2 and v, x and y are independently integers of 1 to 10; R 16 and R 17 are independently chosen from hydrogen and carbonyl moiety, and with the proviso that when R 16 and R 17 are carbonyl moieties, the carbonyl moieties form a covalent bond with the carbons of the vinyl groups of formula (VI) displacing a hydrogen to form the covalent bond with the carbons of the vinyl groups to form a five membered heterocyclic ring; c) applying a current to the substrate and the electroplating bath; and d) electroplating copper on the substrate. 5. The method of claim 4 , wherein the substrate comprises a plurality of one or more of through-holes, trenches and vias.

Assignees

Inventors

Classifications

  • C25D3/38Primary

    of copper · CPC title

  • Semiconductors first coated with a seed layer or a conductive layer · CPC title

  • containing more than 50% by weight of copper · CPC title

  • Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating · CPC title

  • Polyalkylene(poly)amines · CPC title

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What does patent US10662541B2 cover?
Copper electroplating baths include reaction products of amines, polyacrylamides and bisepoxides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
Who is the assignee on this patent?
Dow Global Technologies Llc, Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C25D3/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 26 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).