Etching method and etching device
US-12538728-B2 · Jan 27, 2026 · US
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Orii Takehiko patents
Orii Takehiko is listed as an inventor on 55 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Orii Takehiko |
| Total patents | 55 |
| First publication | Mar 3, 2015 |
| Latest publication | Jan 27, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Gas cluster processing device and gas cluster processing method
US-12172198-B2 · Dec 24, 2024 · US
Etching method and etching device
US-2023223270-A1 · Jul 13, 2023 · US
Etching method and apparatus
US-11594417-B2 · Feb 28, 2023 · US
Etching method and etching apparatus
US-11581192-B2 · Feb 14, 2023 · US
Substrate cleaning method, substrate cleaning system, and memory medium
US-2022277968-A1 · Sep 1, 2022 · US
Substrate cleaning method, substrate cleaning system, and memory medium
US-11367630-B2 · Jun 21, 2022 · US
Gas cluster processing device and gas cluster processing method
US-2022143655-A1 · May 12, 2022 · US
Gas cluster processing device and gas cluster processing method
US-11267021-B2 · Mar 8, 2022 · US
Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing film
US-11189498-B2 · Nov 30, 2021 · US
Recent patents
Latest publications not already listed above.
Etching method and etching apparatus
US-2021305056-A1 · Sep 30, 2021 · US
Etching method
US-11011383-B2 · May 18, 2021 · US
Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium
US-10998183-B2 · May 4, 2021 · US
Gas Cluster Processing Device and Gas Cluster Processing Method
US-2021107041-A1 · Apr 15, 2021 · US
Substrate cleaning method, substrate cleaning system, and memory medium
US-2020395230-A1 · Dec 17, 2020 · US
Etching method and apparatus
US-2020395219-A1 · Dec 17, 2020 · US
Substrate processing method
US-10835908-B2 · Nov 17, 2020 · US
Substrate cleaning method, substrate cleaning system, and memory medium
US-10811283-B2 · Oct 20, 2020 · US
Etching method and substrate processing system
US-10734243-B2 · Aug 4, 2020 · US
Etching Method and Etching Apparatus
US-2020234974-A1 · Jul 23, 2020 · US
Etching method and etching apparatus
US-10665470-B2 · May 26, 2020 · US
Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing film
US-2019355589-A1 · Nov 21, 2019 · US
Etching Method
US-2019228981-A1 · Jul 25, 2019 · US
Etching Method and Etching Apparatus
US-2019221440-A1 · Jul 18, 2019 · US
Etching method and etching apparatus
US-2019198349-A1 · Jun 27, 2019 · US
High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container
US-10207349-B2 · Feb 19, 2019 · US
Substrate processing method, substrate processing apparatus, and storage medium
US-10199240-B2 · Feb 5, 2019 · US
Substrate processing method, substrate processing system and memory medium
US-2019030558-A1 · Jan 31, 2019 · US
Separation and regeneration apparatus and substrate processing apparatus
US-10115609-B2 · Oct 30, 2018 · US
Substrate processing method and storage medium
US-10096462-B2 · Oct 9, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 55 |
| Iwatani Corp | 4 |
| Orii Takehiko | 4 |
| Toshiba Memory Corp | 2 |
| Central Glass Co Ltd | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P70/20 | 25 |
| H10P72/0414 | 23 |
| H01L21/02057 | 20 |
| H01L21/67051 | 19 |
| H10P72/0402 | 16 |