Separation and regeneration apparatus and substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-10115609-B2
Application number	US-201514644458-A
Country	US
Kind code	B2
Filing date	Mar 11, 2015
Priority date	Mar 13, 2014
Publication date	Oct 30, 2018
Grant date	Oct 30, 2018

Abstract

Disclosed is a separation and regeneration apparatus including: a supercritical processing unit configured to generate a mixed gas including a first fluorine-containing organic solvent having a first boiling point and a second fluorine-containing organic solvent having a second boiling point lower than the first boiling point; and a distillation tank configured to store hot water having a temperature between the first boiling point and the second boiling point, in which the mixed gas is input into the hot water to be separated into the first fluorine-containing organic solvent in a liquid state and the second fluorine-containing organic solvent in a gas state, in which an introduction line configured to guide the mixed gas from the supercritical processing unit to the distillation tank is provided and a distal end of the introduction line is disposed in the hot water.

First claim

What is claimed is:

1. A separation and regeneration apparatus comprising:
a controller including a processor coupled with a memory;
a mixed gas generating unit configured to receive a wafer covered with a first fluorine-containing organic solvent having a first boiling point;
a supercritical fluid supply line connecting to the mixed gas generating unit, the supercritical fluid supply line being provided with a first valve;
a discharge line connected to the mixed gas generating unit and including a second valve; and
a distillation tank configured to store hot water, the distillation tank including:
a water supply line that allows for periodic supply of water into the distillation tank,
a water level gauge configured to measure a level of the hot water within the distillation tank,
a distillation tank heater, and
an introduction line connected to the discharge line and running between the mixed gas generating unit and the distillation tank, the introduction line terminating in the distillation tank,

wherein the controller is programmed to:
control a mixed gas generating unit heater that heats the mixed gas generating unit to a predetermined temperature;
control the distillation tank heater to maintain the water within the distillation tank at a temperature between the first boiling point and the second boiling point,
open the first valve of the supercritical fluid supply line so as to introduce a second fluorine-containing organic solvent having a second boiling point lower than the first boiling point from the supercritical fluid supply line into the mixed gas generating unit, such that a mixed gas is generated from the first fluorine-containing organic solvent covering the wafer and the second fluorine-containing organic solvent introduced from the supercritical fluid supply line; and
close the first valve of the supercritical fluid supply line and open the second valve of the discharge line so as to discharge the mixed gas from the mixed gas generating unit to the distillation tank through the discharge line such that the mixed gas is conveyed into the hot water within the distillation tank through the introduction line to be separated into a liquid state of the first fluorine-containing organic solvent, a gaseous state of the second fluorine-containing organic solvent, and F ions that will be incorporated into the hot water.

2. The separation and regeneration apparatus of claim 1 , further comprising:
a first tank configured to store the first fluorine-containing organic solvent from the distillation tank; and
a second tank configured to liquefy and store the second fluorine-containing organic solvent from the distillation tank.

3. The separation and regeneration apparatus of claim 2 , wherein the second tank accommodates a water cover configured to cover the second fluorine-containing organic solvent therein.

4. The separation and regeneration apparatus of claim 1 , wherein a first oil-water separator and a second oil-water separator are connected to the first tank and the second tank, respectively.

5. The separation and regeneration apparatus of claim 1 , wherein the mixed gas generating unit includes a supercritical processing unit configured to perform a supercritical processing on a processing target object.

6. The separation and regeneration apparatus of claim 5 , wherein the supercritical processing unit includes:
a second fluorine-containing organic solvent supply source;
a spiral pipe in which the second fluorine-containing organic solvent is supplied from the second fluorine-containing organic solvent supply source; and
a lamp provided inside the spiral pipe and configured to heat the spiral pipe such that the second fluorine-containing organic solvent supplied within the spiral pipe is placed in a supercritical state.

7. The separation and regeneration apparatus of claim 1 , wherein the controller is programmed to control the mixed gas generating unit heater by controlling the power feeding unit that supplies power to the heater.

8. A substrate processing apparatus comprising:
a liquid processing unit configured to supply a first fluorine-containing organic solvent having a first boiling point to a processing target object to perform a liquid processing;
a supercritical processing unit configured to bring a liquid of the first fluorine-containing organic solvent attached to the processing target object after the liquid processing into contact with a supercritical fluid of a second fluorine-containing organic solvent having a second boiling point lower than the first boiling point to remove the liquid; and
a substrate conveyance unit configured to convey the processing target object which has been subjected to the liquid processing in the liquid processing unit to the supercritical processing unit,
wherein the separation and regeneration apparatus of claim 1 is included in the supercritical processing unit.

Assignees

• Tokyo Electron Ltd

Inventors

• Mitsuoka Kazuyuki
• Ohno Hiroki
• Orii Takehiko
• Toshima Takayuki

Classifications

• H10P70/80

  Cleaning only by supercritical fluids · CPC title

• H10P70/20

  Cleaning during device manufacture · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H01L21/02101

  Electricity · mapped topic

• H01L21/67017 Primary

  Electricity · mapped topic