Batch thermal process chamber
US-12593643-B2 · Mar 31, 2026 · US
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Kumar Surajit patents
Kumar Surajit is listed as an inventor on 31 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Kumar Surajit |
| Total patents | 31 |
| First publication | Mar 26, 2015 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
US-12528151-B2 · Jan 20, 2026 · US
Apparatus and method for cmp temperature control
US-2024157504-A1 · May 16, 2024 · US
Apparatus and method for CMP temperature control
US-11919123-B2 · Mar 5, 2024 · US
Wafer heater with backside and integrated bevel purge
US-11769684-B2 · Sep 26, 2023 · US
Uniform radiation heating control architecture
US-2023297740-A1 · Sep 21, 2023 · US
Batch thermal process chamber
US-2023230859-A1 · Jul 20, 2023 · US
Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
US-2023182259-A1 · Jun 15, 2023 · US
Wafer edge temperature correction in batch thermal process chamber
US-2023167581-A1 · Jun 1, 2023 · US
Wafer Heater With Backside And Integrated Bevel Purge
US-2023113057-A1 · Apr 13, 2023 · US
Recent patents
Latest publications not already listed above.
Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
US-11577358-B2 · Feb 14, 2023 · US
Apparatus and method for cmp temperature control
US-2021402555-A1 · Dec 30, 2021 · US
Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
US-2021402552-A1 · Dec 30, 2021 · US
High quality factor embedded resonator wafers
US-11209398-B2 · Dec 28, 2021 · US
Liner for processing chamber
US-11021790-B2 · Jun 1, 2021 · US
Wafer Heater With Backside And Integrated Bevel Purge
US-2021111059-A1 · Apr 15, 2021 · US
High quality factor embedded resonator wafers
US-2021080431-A1 · Mar 18, 2021 · US
Liner for processing chamber
US-2020040451-A1 · Feb 6, 2020 · US
Apparatus for controlling temperature uniformity of a substrate
US-10386126-B2 · Aug 20, 2019 · US
Heating modulators to improve epi uniformity tuning
US-10132003-B2 · Nov 20, 2018 · US
EPI base ring
US-10119192-B2 · Nov 6, 2018 · US
Heating modulators to improve epi uniformity tuning
US-2018023214-A1 · Jan 25, 2018 · US
Quartz upper and lower domes
US-2018005856-A1 · Jan 4, 2018 · US
Quartz upper and lower domes
US-9768043-B2 · Sep 19, 2017 · US
Process chamber with reflector
US-2016348276-A1 · Dec 1, 2016 · US
Epi base ring
US-2016230276-A1 · Aug 11, 2016 · US
Apparatus for controlling temperature uniformity of a substrate
US-2016169593-A1 · Jun 16, 2016 · US
EPI base ring
US-9322097-B2 · Apr 26, 2016 · US
Apparatus for controlling the temperature uniformity of a substrate
US-9267742-B2 · Feb 23, 2016 · US
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
US-9248509-B2 · Feb 2, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 31 |
| Bera Kallol | 2 |
| Zhou Xiaoping | 2 |
| Buchberger Jr Douglas A | 2 |
| Tavassoli Hamid | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0436 | 10 |
| C23C16/46 | 8 |
| B24B55/02 | 7 |
| B24B37/015 | 7 |
| H10P52/402 | 7 |