EPI base ring

Patent metadata

Field	Value
Publication number	US-9322097-B2
Application number	US-201313846355-A
Country	US
Kind code	B2
Filing date	Mar 18, 2013
Priority date	Mar 13, 2013
Publication date	Apr 26, 2016
Grant date	Apr 26, 2016

Abstract

Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

First claim

The invention claimed is:

1. A base ring assembly for a substrate processing chamber, comprising:
a ring body to be disposed within an inner circumference of the substrate processing chamber, the ring body comprising:
a substrate loading port;
a gas inlet;
a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and wherein the substrate loading port is angularly offset at about 90° with respect to the gas inlet and the gas outlet, and the substrate loading port, the gas inlet, and the gas outlet are at substantially the same level;
an upper trench formed in a top surface of the ring body; and
a lower trench formed in a bottom surface of the ring body;

an upper ring disposed within the upper trench of the ring body, the upper ring and the upper trench define a first annular fluid flow path therebetween, wherein the ring body further comprises a top wall extending upwardly from the top surface of the ring body, the top wall is disposed around an inner circumference of the ring body; and an outer portion of the to wall and an inner portion of the upper ring defines a to annular trench for placement of an O-ring; and
a lower ring disposed within the lower trench of the ring body, the lower ring and the lower trench define a second annular fluid flow path therebetween, wherein the ring body further comprises a bottom wall extending downwardly from the bottom surface of the ring body, the bottom wall is disposed around an inner circumference of the ring body; and an outer portion of the bottom wall and an inner portion of the lower ring defines a bottom annular trench for placement of an O-ring, and wherein the upper ring and the lower ring are individual pieces separated from the upper trench and the lower trench, respectively, and the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

2. The base ring assembly of claim 1 , wherein the ring body is formed of aluminum or stainless steel.

3. The base ring assembly of claim 1 , wherein the substrate loading port, the gas inlet, and the gas outlet are disposed at substantially the same level.

4. The base ring assembly of claim 1 , wherein the ring body has a generally oblong shape with a long side on the substrate loading port and the short sides on the gas inlet and the gas outlet, respectively.

5. The base ring assembly of claim 1 , wherein the substrate loading port has a height of about 0.5 inches to about 2 inches.

6. The base ring assembly of claim 1 , wherein the ring body has a height of about 2 inches to about 6 inches.

7. The base ring assembly of claim 1 , wherein the upper ring and the lower ring have a general “H” shaped cross-section.

8. The base ring assembly of claim 1 , wherein the upper ring, the lower ring, and the ring body are welded together as an integrated body.

9. A process kit for a substrate processing chamber, comprising:
a ring body, comprising:
a substrate loading port;
a gas inlet; and
a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and the substrate loading port, gas inlet, and the gas outlet are disposed at substantially the same level; and

an upper ring disposed on a top surface of the ring body, wherein the upper ring is shaped to define a first annular fluid flow path between the upper ring and the top surface of the ring body, wherein the ring body further comprises a to wall extending upwardly from the top surface of the ring body, the top wall is disposed around an inner circumference of the ring body; and an outer portion of the to wall and an inner portion of the upper ring defines a to annular trench for placement of an O-ring; and
a lower ring disposed on a bottom surface of the ring body, wherein the lower ring is shaped to define a second annular fluid flow path between the lower ring and the bottom surface of the ring body, wherein the ring body further comprises a bottom wall extending downwardly from the bottom surface of the ring body, the bottom wall is disposed around an inner circumference of the ring body; and an outer portion of the bottom wall and an inner portion of the lower ring defines a bottom annular trench for placement of an O-ring, and wherein the upper ring and the lower ring are individual pieces separated from the ring body, and the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

10. A process chamber for processing a substrate, comprising:
a rotatable substrate support disposed within the process chamber, the substrate support having a substrate support surface;
a lower dome disposed relatively below the substrate support;
an upper dome disposed relatively above the substrate support, the upper dome being opposed to the lower dome; and
a ring body disposed between the upper dome and the lower dome, the ring body is disposed within an inner circumference of the process chamber, wherein the upper dome, the ring body, and the lower dome generally defining an internal volume of the process chamber, the ring body having:
a substrate loading port;
a gas inlet;
a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body;
an upper trench formed in a top surface of the ring body;
a lower trench formed in a bottom surface of the ring body;
an upper ring disposed within the upper trench of the ring body, the upper ring and the upper trench define a first annular fluid path therebetween, wherein the ring body further comprises a top wall extending upwardly from the top surface of the ring body, the top wall is disposed around an inner circumference of the ring body; and an outer portion of the to wall and an inner portion of the upper ring defines a to annular trench for placement of an O-ring; and
a lower ring disposed within the lower trench of the ring body, the lower ring and the lower trench define a second annular fluid path therebetween, wherein the ring body further comprises a bottom wall extending downwardly from the bottom surface of the ring body, the bottom wall is disposed around an inner circumference of the ring body; and an outer portion of the bottom wall and an inner portion of the lower ring defines a bottom annular trench for placement of an O-ring, and wherein the upper ring and the lower ring are individual pieces separated from the upper trench and the lower trench, respectively.

11. The process chamber of claim 10 , wherein the substrate loading port is angularly offset at about 90° with respect to the gas inlet and the gas outlet, and the substrate loading port, the gas inlet, and the gas outlet are at substantially the same level.

12. The process chamber of claim 10 , wherein the upper ring and the lower ring have a general “H” shaped cross-section.

13. The process chamber of claim 10 , wherein the upper dome comprises:
a central window portion; and
a peripheral flange engaging the central window portion at a circumference of the central window portion, wherein a tangent line on an inside surface of the central window portion that passes through an intersection of the central window portion and the peripheral flange is at an angle of about 8° to about 16° with respect to a planar upper surface of the peripheral flange.

14. The process chamber of claim 10 , wherein the lower dome comprises:
a central opening;
a peripheral flange; and
a bottom extended radially outward to connect the peripheral flange and the central opening, wherein a tangent line on an outside surface of the bottom that passes through an intersection of the bottom and the pe

Assignees

• Applied Materials Inc

Inventors

• Aboagye Steve
• Brillhart Paul
• Kumar Surajit
• Chang Anzhong
• Kuppurao Satheesh
• Samir Mehmet Tugrul
• Carlson David K

Classifications

• H10P72/0436 Primary

  mainly by radiation · CPC title

• C23C16/45504 Primary

  Laminar flow · CPC title

• C23C16/45563

  Gas nozzles · CPC title

• C23C16/4584

  the substrate being rotated · CPC title

• C23C16/481

  by radiant heating of the substrate · CPC title