Integrated optical nanothermometry for real-time wafer temperature monitoring during processing
US-2025224282-A1 · Jul 10, 2025 · US
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Hurd Trace patents
Hurd Trace is listed as an inventor on 10 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Hurd Trace |
| Total patents | 10 |
| First publication | Nov 30, 2017 |
| Latest publication | Jul 10, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
System and methods for wafer drying
US-12002687-B2 · Jun 4, 2024 · US
System and Methods for Wafer Drying
US-2023092779-A1 · Mar 23, 2023 · US
System and methods for wafer drying
US-11515178-B2 · Nov 29, 2022 · US
System and Methods for Wafer Drying
US-2021287919-A1 · Sep 16, 2021 · US
Etching of silicon nitride and silica deposition control in 3D NAND structures
US-10886290-B2 · Jan 5, 2021 · US
Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal
US-10844332-B2 · Nov 24, 2020 · US
Etching of silicon nitride and silica deposition control in 3d nand structures
US-2020027891-A1 · Jan 23, 2020 · US
Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal
US-2019185793-A1 · Jun 20, 2019 · US
Atomic layer etching systems and methods
US-2017345665-A1 · Nov 30, 2017 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 10 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0602 | 5 |
| H10P72/0461 | 4 |
| H10P72/0411 | 4 |
| H10P72/0408 | 4 |
| H10P70/80 | 4 |