Substrate support and baffle apparatus
US-2018350593-A1 · Dec 6, 2018 · US
Cleaning only by supercritical fluids
Cleaning only by supercritical fluids · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H10P70/80 |
| Official title | {Cleaning only by supercritical fluids} |
| Display label | Cleaning only by supercritical fluids |
| Total patents | 450 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 14 |
| 2016 | 12 |
| 2017 | 23 |
| 2018 | 40 |
| 2019 | 36 |
| 2020 | 49 |
| 2021 | 33 |
| 2022 | 53 |
| 2023 | 37 |
| 2024 | 65 |
| 2025 | 78 |
| 2026 | 10 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Substrate processing apparatus
US-2018254200-A1 · Sep 6, 2018 · US
Substrate support and baffle apparatus
US-10032624-B2 · Jul 24, 2018 · US
Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatus
US-2018158699-A1 · Jun 7, 2018 · US
Substrate processing apparatus, substrate processing method, and storage medium
US-2018138035-A1 · May 17, 2018 · US
Apparatus and method for treating substrate
US-2018114707-A1 · Apr 26, 2018 · US
Manufacturing method and fluid supply system for treating substrate
US-9941110-B2 · Apr 10, 2018 · US
Anhydrous substrate cleaning composition, substrate treating method, and substrate treating apparatus
US-2018093306-A1 · Apr 5, 2018 · US
Substrate processing method
US-2018061633-A1 · Mar 1, 2018 · US
Substrate processing method, substrate processing apparatus, and storage medium
US-9881784-B2 · Jan 30, 2018 · US
Apparatus and method for treating substrate
US-2018012755-A1 · Jan 11, 2018 · US
Unit for supplying fluid, apparatus and method for treating substrate with the unit
US-2017345687-A1 · Nov 30, 2017 · US
Apparatus and method for treating a substrate
US-2017341113-A1 · Nov 30, 2017 · US
Method for treating substrate
US-9831081-B2 · Nov 28, 2017 · US
Apparatus and method for treating a substrate
US-2017312794-A1 · Nov 2, 2017 · US
Substrate processing apparatus, substrate processing method, and storage medium
US-2017254589-A1 · Sep 7, 2017 · US
Substrate processing apparatus, substrate processing method, and storage medium
US-2017256397-A1 · Sep 7, 2017 · US
Substrate processing apparatus, substrate processing method, and storage medium
US-2017256398-A1 · Sep 7, 2017 · US
Stiction-free drying process with contaminant removal for high-aspect ratio semiconductor device str
US-2017250094-A1 · Aug 31, 2017 · US
Methods of increasing the solubility of materials in supercritical carbon dioxide
US-9676944-B2 · Jun 13, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H10P70/80?
- CPC H10P70/80 is the Cooperative Patent Classification code for “Cleaning only by supercritical fluids.”
- How many patents are filed under CPC H10P70/80 (Cleaning only by supercritical fluids)?
- Our database includes 450 publications tagged with this CPC code.
- Is patent activity under CPC H10P70/80 growing?
- Publication counts under this code: 65 in 2024 vs 78 in 2025 (latest complete years).