Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
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Choi Yoo-Jeong patents
Choi Yoo-Jeong is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Choi Yoo-Jeong |
| Total patents | 22 |
| First publication | Feb 10, 2015 |
| Latest publication | Jul 9, 2019 |
Notable patents
Publications ranked by popularity score, then publication date.
Monomer, organic layer composition, organic layer, and method of forming patterns
US-10332751-B2 · Jun 25, 2019 · US
Organic layer composition, organic layer, and method of forming patterns
US-10066057-B2 · Sep 4, 2018 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-10018914-B2 · Jul 10, 2018 · US
Polymer, organic layer composition, organic layer, and method of forming patterns
US-9971243-B2 · May 15, 2018 · US
Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
US-2017327640-A1 · Nov 16, 2017 · US
Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
US-9725389-B2 · Aug 8, 2017 · US
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
US-9671688-B2 · Jun 6, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
US-9556094-B2 · Jan 31, 2017 · US
Recent patents
Latest publications not already listed above.
Polymer, organic layer composition, organic layer, and method of forming patterns
US-2016363864-A1 · Dec 15, 2016 · US
Organic layer composition, organic layer, and method of forming patterns
US-2016297932-A1 · Oct 13, 2016 · US
Monomer, organic layer composition, organic layer, and method of forming patterns
US-2016237306-A1 · Aug 18, 2016 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-9371444-B2 · Jun 21, 2016 · US
Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
US-9359276-B2 · Jun 7, 2016 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-2015329718-A1 · Nov 19, 2015 · US
Hardmask composition and method of forming patterns using the hardmask composition
US-2015332931-A1 · Nov 19, 2015 · US
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
US-2015301446-A1 · Oct 22, 2015 · US
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
US-2015274622-A1 · Oct 1, 2015 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-2015187566-A1 · Jul 2, 2015 · US
Hardmask composition including aromatic ring-containing compound, method of forming patterns, and semiconductor integrated circuit device including the patterns
US-9018776-B2 · Apr 28, 2015 · US
Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns
US-8952373-B2 · Feb 10, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Cheil Ind Inc | 13 |
| Samsung Sdi Co Ltd | 12 |
| Choi Yoo-Jeong | 4 |
| Kim Yun-Jun | 3 |
| Lee Chung-Heon | 3 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/094 | 16 |
| G03F7/11 | 12 |
| H10P50/73 | 11 |
| G03F7/0752 | 11 |
| G03F7/091 | 10 |