Monomer, organic layer composition, organic layer, and method of forming patterns

US2016237306A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016237306-A1
Application numberUS-201514979634-A
CountryUS
Kind codeA1
Filing dateDec 28, 2015
Priority dateFeb 17, 2015
Publication dateAug 18, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:

First claim

Opening claim text (preview).

What is claimed is: 1 . A monomer represented by Chemical Formula 1: wherein, in Chemical Formula 1, X is a substituted or unsubstituted aromatic ring group, A, B, and C are each independently a group represented by Chemical Formula 2, k, m, and n are independently 0 or 1, a sum of k, m, and n being 2 or 3, when k=m=1, A and B are different groups from each other, when k=n=1, A and C are different groups from each other, and when m=n=1, B and C are different groups from each other, and when k=m=n=1, at least two of A, B, and C are different groups from each other, wherein, in Chemical Formula 2, D and E are each independently a substituted or unsubstituted aromatic ring group, a substituted or unsubstituted heteroaromatic ring group, or a combination thereof, Z 4 and Z 5 are each independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a halogen-containing group, or a combination thereof, w is 0 or 1, and * is a linking point. 2 . The monomer as claimed in claim 1 , wherein the monomer is represented by one of Chemical Formulae 1-1 and 1-2: wherein, in Chemical Formulae 1-1 and 1-2, X a is a substituted or unsubstituted aromatic ring group, D a , E a , E b , and E c are each independently a substituted or unsubstituted aromatic ring group, a substituted or unsubstituted heteroaromatic ring group, or a combination thereof, and Z 4a , Z 4b , Z 4c , and Z 5a are each independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a halogen-containing group, or a combination thereof. 3 . The monomer as claimed in claim 2 , wherein: in Chemical Formula 1-1, at least one of D a , E a , and E b is a substituted or unsubstituted polycyclic aromatic ring group, a substituted or unsubstituted polycyclic heteroaromatic ring group, or a combination thereof, or in Chemical Formula 1-1, X a is a substituted or unsubstituted polycyclic aromatic ring group, and in Chemical Formula 1-2, at least one of D a , E a , E b , and E c is a substituted or unsubstituted polycyclic aromatic ring group, a substituted or unsubstituted polycyclic heteroaromatic ring group, or a combination thereof, or in Chemical Formula 1-2, X a is a substituted or unsubstituted polycyclic aromatic ring group. 4 . The monomer as claimed in claim 3 , wherein, in Chemical Formulae 1-1 and 1-2, D a , E a , E b , and E c are each independently a substituted or unsubstituted group of one of the following compounds: wherein, in the above compounds, Z 1 and Z 2 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, C═O, NR, oxygen (O), sulfur (S), or a combination thereof, Z 3 is nitrogen (N), CR, or a combination thereof, and R is hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, a halogen-containing group, or a combination thereof. 5 . The monomer as claimed in claim 3 , wherein, in Chemical Formulae 1-1 and 1-2, X a is a substituted or unsubstituted group of one of the following compounds: 6 . The monomer as claimed in claim 2 , wherein: in Chemical Formula 1-1, at least one of X a , D a , E a , and E b is a group that includes a hydroxy group, and in Chemical Formula 1-2, at least one of X a , D a , E a , E b , and E c is a group that includes a hydroxy group. 7 . The monomer as claimed in claim 1 , wherein the monomer has a molecular weight of about 800 to about 5,000. 8 . An organic layer composition, comprising: a solvent; and a monomer represented by Chemical Formula 1, wherein, in Chemical Formula 1, X is a substituted or unsubstituted aromatic ring group, A, B, and C are each independently a group represented by Chemical Formula 2, k, m, and n are each independently 0 or 1, a sum of k, m, and n being 2 or 3, when k=m=1, A and B are different groups from each other, when k=n=1, A and C are different groups from each other, and when m=n=1, B and C are different groups from each other, and when k=m=n=1, at least two of A, B, and C are different groups from each other, wherein, in Chemical Formula 2, D and E are each independently a substituted or unsubstituted aromatic ring group, a substituted or unsubstituted heteroaromatic ring group, or a combination thereof, Z 4 and Z 5 are each independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a halogen-containing group, or a combination thereof, w is 0 or 1, and * is a linking point. 9 . The organic layer composition as claimed in claim 8 , wherein the monomer is represented by one of Chemical Formulae 1-1 and 1-2: wherein, in Chemical Formulae 1-1 and 1-2, X a is a substituted or unsubstituted aromatic ring group, D a , E a , E b , and E c are each independently a substituted or unsubstituted aromatic ring group, a substituted or unsubstituted heteroaromatic ring group, or a combination thereof, Z 4a , Z 4b , Z 4c , and Z 5a are each independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a halogen-containing group, or a combination thereof. 10 . The organic layer composition as claimed in claim 9 , wherein: in Chemical Formula 1-1, at least one of D a , E a , and E b is a substituted or unsubstituted polycyclic aromatic ring group, a substituted or unsubstituted polycyclic heteroaromatic ring group, or a combination thereof, or in Chemical Formula 1-1, X a is a substituted or unsubstituted polycyclic aromatic ring group, and in Chemical Formula 1-2, at least one of D a , E a , E b , and E c is a substituted or unsubstituted polycyclic aromatic ring group, a substituted or unsubstituted polycyclic heteroaromatic ring group, or a combination thereof, or in Chemical Formula 1-2, X a is a substituted or unsubstituted polycyclic aromatic ring group. 11 . The organic layer composition as claimed in claim 10 , wherein, in Chemical Formulae 1-1 and 1-2, D a , E a , E b , and E c are each independently a substituted or unsubstituted group of one of t

Assignees

Inventors

Classifications

  • by chemical means · CPC title

  • of masks comprising organic materials · CPC title

  • using masks for insulating materials · CPC title

  • H10P50/283Primary

    by chemical means · CPC title

  • other than with oxygen or sulphur atoms in position 2 or 4 · CPC title

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Frequently asked questions

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What does patent US2016237306A1 cover?
A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
Who is the assignee on this patent?
Samsung Sdi Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P50/283. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Aug 18 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).