Organic layer composition, organic layer, and method of forming patterns

Patent metadata

Field	Value
Publication number	US-10066057-B2
Application number	US-201514954403-A
Country	US
Kind code	B2
Filing date	Nov 30, 2015
Priority date	Apr 10, 2015
Publication date	Sep 4, 2018
Grant date	Sep 4, 2018

Abstract

An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,

First claim

What is claimed is:

1. An organic layer composition, comprising:
a polymer that includes a moiety represented by Chemical Formula 1,
a monomer represented by Chemical Formula 2, and
a solvent,

wherein, in Chemical Formula 1,
A 1 and A 2 are each independently a divalent group of a compound listed in Group 1,
A 3 and A 4 are each independently a cyclic group including at least one substituted or unsubstituted benzene ring,
m is 0 or 1, and
“*” is a linking point,

wherein, in Group 1,
R 1 , R 2 , and R 3 are each independently hydrogen, a hydroxy group, a methoxy group, an ethoxy group, a halogen, a substituted or unsubstituted C6 to C30 aryl group, or a combination thereof,
Z 1 to Z 6 are each independently a hydroxy group, a methoxy group, an ethoxy group, a halogen, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C7 to C20 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C1 to C4 alkyl ether group, a substituted or unsubstituted C7 to C20 arylalkylene ether group, a substituted or unsubstituted C1 to C30 haloalkyl group, or a combination thereof, and
a, b, c, d, e, and f are each independently an integer of 0 to 2,

wherein, in Chemical Formula 2,
B 0 is a substituted or unsubstituted C3 to C60 cyclic group, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, or a combination thereof,
B a and B b are each independently substituted or unsubstituted C3 to C60 cyclic group,
X a and X b are each independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a halogen-containing group, a substituted or unsubstituted C1 to C30 alkoxy group, or a combination thereof,
L a , L b , L c , and L d are each independently a single bond, a substituted or unsubstituted C1 to C6 alkylene group, a substituted or unsubstituted C6 to C30 arylene group, or a combination thereof, and
n a and n b are each independently an integer of 1 to 6, provided that n a +n b ≤a maximum number of substituents of B 0 .

2. The organic layer composition as claimed in claim 1 , wherein, in Chemical Formula 1, A 3 and A 4 are each independently one of the following groups:

wherein, in the above groups,
X 1 and X 2 are each independently a substituted or unsubstituted C6 to C50 arylene group, a substituted or unsubstituted C1 to C10 alkyleneoxide-containing group, or a combination thereof,
Y 1 and Y 2 are each independently substituted or unsubstituted C6 to C30 aryl group,
Z 7 to Z 10 are each independently a hydroxy group, a methoxy group, an ethoxy group, a halogen, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C7 to C20 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C1 to C4 alkyl ether group, a substituted or unsubstituted C7 to C20 arylalkylene ether group, a substituted or unsubstituted C1 to C30 haloalkyl group, or a combination thereof,
g, h, i, and j are each independently an integer of 0 to 2,
k is an integer of 1 to 3, and
“*” is a linking point.

3. The organic layer composition as claimed in claim 2 , wherein X 1 and X 2 are each independently a substituted or unsubstituted C6 to C50 arylene group, the C6 to C50 arylene group being a divalent group of one of the following compounds:

4. The organic layer composition as claimed in claim 2 , wherein Y 1 and Y 2 are each independently a substituted or unsubstituted C6 to C30 aryl group, the C6 to C30 aryl group being a monovalent group of one of the following compounds:

5. The organic layer composition as claimed in claim 1 , wherein, in Group 1, R 1 , R 2 , and R 3 are each independently hydrogen or a substituted or unsubstituted phenyl group.

6. The organic layer composition as claimed in claim 1 , wherein, in Chemical Formula 2, the cyclic group of B 0 , B a , or B b is a group including one of the following moieties:

wherein, in the above compounds,
Q 1 and Q 2 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, C═O, NR a , oxygen (O), sulfur (S), or a combination thereof, and
Q 3 is nitrogen (N), CR b , or a combination thereof,
wherein R a and R b are each independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, a halogen-containing group, or a combination thereof.

7. The organic layer composition as claimed in claim 1 , wherein, in Chemical Formula 2, at least one of B 0 , B a , and B b is a substituted or unsubstituted polycyclic group.

8. The organic layer composition as claimed in claim 7 , wherein, in Chemical Formula 2, at least one of B 0 , B a , and B b is a substituted or unsubstituted polycyclic aromatic group.

9. The organic layer composition as claimed in claim 1 , wherein, in Chemical Formula 2, n a +n b is 2 or 3.

10. The organic layer composition as claimed in claim 1 , wherein the polymer that includes a moiety represented by Chemical Formula 1 includes a moiety represented by one of the following Chemical Formulae 1-1 to 1-3:

wherein, in Chemical Formulae

Assignees

• Samsung Sdi Co Ltd

Inventors

• Park Yu-Shin
• Kim Yun-Jun
• Kim Tae-Ho
• Park You-Jung
• Choi Yoo-Jeong
• Kwon Hyo-Young
• Kim Seung-Hyun
• Namgung Ran
• Rathwell Dominea
• Mun Soo-Hyoun
• Song Hyun-Ji
• Jung Hyeon-Il
• Heo Yu-Mi

Classifications

• G03F7/0041

  providing an etching agent upon exposure (G03F7/075 takes precedence; photolytic halogen compounds G03F7/0295) · CPC title

• G03F7/091

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• H01L51/0018

  Electricity · mapped topic

• G03F7/094

  Multilayer resist systems, e.g. planarising layers · CPC title

• C08G73/0672 Primary

  with only one nitrogen atom in the ring · CPC title