Integrated wet clean for gate stack development
US-12575357-B2 · Mar 10, 2026 · US
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Bevan Malcolm J patents
Bevan Malcolm J is listed as an inventor on 48 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Bevan Malcolm J |
| Total patents | 48 |
| First publication | May 5, 2015 |
| Latest publication | Mar 10, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Methods for calibrating an optical emission spectrometer
US-12487121-B2 · Dec 2, 2025 · US
Method and apparatus for selective deposition of dielectric films
US-2025239445-A1 · Jul 24, 2025 · US
Film thickness uniformity improvement using edge ring and bias electrode geometry
US-12266560-B2 · Apr 1, 2025 · US
Treatments to enhance material structures
US-2024379349-A1 · Nov 14, 2024 · US
Edge ring
US-D1034491-S · Jul 9, 2024 · US
Methods for calibrating an optical emission spectrometer
US-2024192055-A1 · Jun 13, 2024 · US
Methods for calibrating an optical emission spectrometer
US-11927482-B2 · Mar 12, 2024 · US
Gate all around I/O engineering
US-11923441-B2 · Mar 5, 2024 · US
Method and apparatus for selective nitridation process
US-11581408-B2 · Feb 14, 2023 · US
Recent patents
Latest publications not already listed above.
Integrated wet clean for gate stack development
US-2023010499-A1 · Jan 12, 2023 · US
Gate All Around I/O Engineering
US-2022399457-A1 · Dec 15, 2022 · US
Gate interface engineering with doped layer
US-11456178-B2 · Sep 27, 2022 · US
Film thickness uniformity improvement using edge ring and bias electrode geometry
US-2022301920-A1 · Sep 22, 2022 · US
Gate all around I/O engineering
US-11450759-B2 · Sep 20, 2022 · US
Film thickness uniformity improvement using edge ring and bias electrode geometry
US-11380575-B2 · Jul 5, 2022 · US
Methods for calibrating an optical emission spectrometer
US-2022178747-A1 · Jun 9, 2022 · US
Cap oxidation for FinFET formation
US-11271097-B2 · Mar 8, 2022 · US
Film thickness uniformity improvement using edge ring and bias electrode geometry
US-2022028656-A1 · Jan 27, 2022 · US
Process kit with protective ceramic coatings for hydrogen and nh3 plasma application
US-2022013336-A1 · Jan 13, 2022 · US
Gate interface engineering with doped layer
US-2021398814-A1 · Dec 23, 2021 · US
Method and apparatus for selective nitridation process
US-2021202702-A1 · Jul 1, 2021 · US
Cap oxidation for finfet formation
US-2021134986-A1 · May 6, 2021 · US
Gate All Around I/O Engineering
US-2021104617-A1 · Apr 8, 2021 · US
Method and Apparatus for Selective Deposition of Dielectric Films
US-2021043448-A1 · Feb 11, 2021 · US
Treatments to enhance material structures
US-10872763-B2 · Dec 22, 2020 · US
Treatments to enhance material structures
US-2020350157-A1 · Nov 5, 2020 · US
System and method for mitigating oxide growth in a gate dielectric
US-10068771-B2 · Sep 4, 2018 · US
Method and apparatus for selective nitridation process
US-10049881-B2 · Aug 14, 2018 · US
Method And Apparatus For Selective Deposition Of Dielectric Films
US-2018211833-A1 · Jul 26, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 31 |
| Texas Instruments Inc | 17 |
| Bevan Malcolm J | 3 |
| Rogers Matthew S | 1 |
| Curtis Roger | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/6339 | 31 |
| H10D64/0134 | 27 |
| H10D64/691 | 27 |
| H10P14/6532 | 25 |
| H10P14/6322 | 24 |