Process kit with protective ceramic coatings for hydrogen and nh3 plasma application

Patent metadata

Field	Value
Publication number	US-2022013336-A1
Application number	US-202016926104-A
Country	US
Kind code	A1
Filing date	Jul 10, 2020
Priority date	Jul 10, 2020
Publication date	Jan 13, 2022
Grant date	—

Abstract

A method and apparatus for the use of hydrogen plasma treatments is described herein. The process chamber includes a plurality of chamber components. The plurality of chamber components may be coated with a yttrium zirconium oxide composition, such as a Y2O3—ZrO2 solid solution. Some of the plurality of chamber components are replaced with a bulk yttrium zirconium oxide ceramic. Yet other chamber components are replaced with similar components of different materials.

First claim

What is claimed is:

1 . An apparatus for substrate processing comprising:
a chamber body; a lower liner disposed within the chamber body; an upper liner disposed on top of the lower liner and within the chamber body; a liner door disposed through the upper liner and the chamber body, wherein each of the lower liner, the upper liner, and the liner door further comprise a spray coated yttrium zirconium oxide layer disposed thereon; a chamber lid disposed on top of the chamber body; and a gas nozzle disposed through the chamber lid, wherein the gas nozzle further comprises a bulk ceramic gas nozzle.

2 . The apparatus of claim 1 , further comprising a plasma screen ring disposed on top of the electrostatic chuck, wherein the plasma screen ring is a bulk ceramic plasma screen ring.

3 . The apparatus of claim 1 , further comprising one or more fasteners disposed through and securing the lower liner and the substrate support pedestal, each of the one or more fasteners having a bulk yttrium zirconium oxide ceramic fastener cover disposed thereon.

4 . The apparatus of claim 1 , wherein the chamber lid comprises an Al 2 O 3 lid and a Y 2 O 3 coating.

5 . The apparatus of claim 1 , wherein the chamber lid comprises an Al 2 O 3 —Y 2 O 3 ceramic composite and a Y 2 O 3 coating.

6 . The apparatus of claim 1 , wherein the chamber lid further comprises a quartz lid.

7 . The apparatus of claim 1 , wherein the chamber lid further comprises one of an aluminum oxide lid or an Al 2 O 3 —Y 2 O 3 lid with a laminated or sintered yttrium zirconium oxide coating.

8 . The apparatus of claim 1 , wherein the yttrium zirconium oxide further comprises a Y 2 O 3 —ZrO 2 solid solution.

9 . The apparatus of claim 1 , wherein one or more gaskets are disposed between the lower chamber body and the upper chamber body.

10 . The apparatus of claim 9 , wherein one or more gaskets are disposed between the upper chamber body and the chamber lid.

11 . The apparatus of claim 10 , wherein one or more gaskets are disposed between the lower chamber body and the substrate support pedestal.

12 . The apparatus of claim 11 , wherein each of the one or more gaskets comprises a nickel plated gasket or a stainless steel gasket.

13 . An apparatus for substrate processing comprising:
a chamber body; a lower liner disposed within the chamber body; an upper liner disposed on top of the lower liner and within the chamber body; a liner door disposed through the upper liner and the chamber body, wherein each of the lower liner, the upper liner, and the liner door further comprise a spray coated yttrium zirconium oxide layer disposed thereon, wherein the yttrium zirconium oxide further comprises a Y 2 O 3 —ZrO 2 solid solution; a chamber lid disposed on top of the upper liner; a gas nozzle disposed through the chamber lid, wherein the gas nozzle further comprises a bulk ceramic gas nozzle; and one or more nickel plated or stainless steel gaskets disposed between the lower liner and the upper liner, the upper liner and the chamber lid, and the lower liner and the substrate support pedestal.

14 . The apparatus of claim 13 , wherein the thickness of each of the spray coated yttrium zirconium oxide layer is about 25 microns to about 300 microns.

15 . The apparatus of claim 13 , wherein the chamber lid further comprises an aluminum oxide lid and a PVD coated yttrium zirconium oxide layer, wherein the PVD coated yttrium zirconium oxide layer has a thickness of about 0.5 microns to about 10 microns.

16 . The apparatus of claim 13 , wherein the spray coated yttrium zirconium oxide layer is a purified yttrium zirconium oxide coating with a concentration of 99% or more Y 2 O 3 and ZrO 2 .

17 . The apparatus of claim 16 , wherein the bulk ceramic gas nozzle is a yttrium zirconium oxide ceramic gas nozzle with a porosity of equal to or less than about 0.2%.

18 . The apparatus of claim 13 , further comprising a plasma screen ring disposed on top of the electrostatic chuck, wherein the plasma screen ring is a bulk yttrium zirconium oxide ceramic or an alumina ring coated by Y 2 O 3 —ZrO 2 .

19 . An apparatus for substrate processing comprising:
a chamber body: a lower liner disposed within the chamber body; an upper liner disposed on top of the lower liner and within the chamber body; a liner door disposed through the upper liner and the chamber body, wherein each of the lower liner, the upper liner, and the liner door further comprise a spray coated yttrium zirconium oxide layer disposed thereon; a chamber lid disposed on top of the upper liner; a gas nozzle disposed through the chamber lid, wherein the gas nozzle further comprises a bulk ceramic gas nozzle; an induction coil disposed above the chamber lid; and a shielding electrode disposed between the induction coil and the chamber lid, wherein
the thickness of the spray coated yttrium zirconium oxide layer is about 25 microns to about 300 microns and the spray coated yttrium zirconium oxide layer is a purified yttrium zirconium oxide coating with a concentration of 99% or more Y 2 O 3 and ZrO 2 .

20 . The apparatus of claim 19 , wherein the chamber lid further comprises an aluminum oxide lid and a PVD coated yttrium zirconium oxide coating.

Assignees

• Applied Materials Inc

Inventors

• Wu Jian
• Hawrylchak Lara A
• Duan Ren-Guan
• Hwang Bernard L
• Bevan Malcolm J
• Liu Wei

Classifications

• H10P72/0421

  for drying etching · CPC title

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• H10P72/722

  Details of electrostatic chucks · CPC title

• H01J37/32495 Primary

  Means for protecting the vessel against plasma · CPC title

• H01J37/3244

  Gas supply means · CPC title