Metrology target design for tilted device designs
US-2025035489-A1 · Jan 30, 2025 · US
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Amit Eran patents
Amit Eran is listed as an inventor on 60 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Amit Eran |
| Total patents | 60 |
| First publication | Jun 25, 2015 |
| Latest publication | Jan 30, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Metrology target design for tilted device designs
US-12117347-B2 · Oct 15, 2024 · US
Device-like metrology targets
US-11709433-B2 · Jul 25, 2023 · US
Method and System for Providing a Quality Metric for Improved Process Control
US-2023051705-A1 · Feb 16, 2023 · US
Method and system for providing a quality metric for improved process control
US-11372340-B2 · Jun 28, 2022 · US
Device-like metrology targets
US-2022197152-A1 · Jun 23, 2022 · US
Machine Learning in Metrology Measurements
US-2022107175-A1 · Apr 7, 2022 · US
Machine learning in metrology measurements
US-11248905-B2 · Feb 15, 2022 · US
Single Cell Grey Scatterometry Overlay Targets and Their Measurement Using Varying Illumination Parameter(s)
US-2021373445-A1 · Dec 2, 2021 · US
Overlay measurement using multiple wavelengths
US-11158548-B2 · Oct 26, 2021 · US
Recent patents
Latest publications not already listed above.
Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)
US-11119417-B2 · Sep 14, 2021 · US
Enhancing metrology target information content
US-11085754-B2 · Aug 10, 2021 · US
System for combined imaging and scatterometry metrology
US-11067904-B2 · Jul 20, 2021 · US
Polarization measurements of metrology targets and corresponding target designs
US-11060845-B2 · Jul 13, 2021 · US
Device metrology targets and methods
US-11054752-B2 · Jul 6, 2021 · US
Overlay measurement using multiple wavelengths
US-2020381312-A1 · Dec 3, 2020 · US
Recipe optimization based zonal analysis
US-10763146-B2 · Sep 1, 2020 · US
Quick adjustment of metrology measurement parameters according to process variation
US-10699969-B2 · Jun 30, 2020 · US
Metrology using overlay and yield critical patterns
US-10685165-B2 · Jun 16, 2020 · US
Single Cell Grey Scatterometry Overlay Targets and Their Measurement Using Varying Illumination Parameter(s)
US-2020159129-A1 · May 21, 2020 · US
Polarization measurements of metrology targets and corresponding target designs
US-2020158492-A1 · May 21, 2020 · US
Device-like metrology targets
US-2020124981-A1 · Apr 23, 2020 · US
Overlay measurement using phase and amplitude modeling
US-10622238-B2 · Apr 14, 2020 · US
Device metrology targets and methods
US-10571811-B2 · Feb 25, 2020 · US
Metrology targets with supplementary structures in an intermediate layer
US-10551749-B2 · Feb 4, 2020 · US
Compound imaging metrology targets
US-10527951-B2 · Jan 7, 2020 · US
Overlay Measurement Using Phase and Amplitude Modeling
US-2019378737-A1 · Dec 12, 2019 · US
Target location in semiconductor manufacturing
US-10504802-B2 · Dec 10, 2019 · US
Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals
US-10473460-B2 · Nov 12, 2019 · US
Polarization measurements of metrology targets and corresponding target designs
US-10458777-B2 · Oct 29, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kla Tencor Corp | 56 |
| Kla Corp | 8 |
| Kandel Daniel | 1 |
| Cohen Guy | 1 |
| Klein Dana | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70633 | 41 |
| G03F7/70683 | 19 |
| H10P74/203 | 18 |
| G03F7/70625 | 18 |
| G01B11/272 | 16 |