Registration mark formation during sidewall image transfer process
US-10043760-B2 · Aug 7, 2018 · US
Mark formation
Mark formation · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F9/708 |
| Official title | {Mark formation} |
| Display label | Mark formation |
| Total patents | 260 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 22 |
| 2016 | 18 |
| 2017 | 18 |
| 2018 | 31 |
| 2019 | 29 |
| 2020 | 27 |
| 2021 | 27 |
| 2022 | 26 |
| 2023 | 16 |
| 2024 | 21 |
| 2025 | 22 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Imprint method for an imprint apparatus which transfers a pattern onto a substrate by using a mold
US-9921470-B2 · Mar 20, 2018 · US
Lithography alignment marks
US-9823574-B2 · Nov 21, 2017 · US
Method for in-die overlay control using feol dummy fill layer
US-2017330782-A1 · Nov 16, 2017 · US
Method of fabricating semiconductor device with an overlay mask pattern
US-9812364-B2 · Nov 7, 2017 · US
Writer pole formation
US-9805756-B2 · Oct 31, 2017 · US
Device and method for analysing a defect of a photolithographic mask or of a wafer
US-2017292923-A1 · Oct 12, 2017 · US
Mark structure and fabrication method thereof
US-9773739-B2 · Sep 26, 2017 · US
Patterning device, method of producing a marker on a substrate and device manufacturing method
US-9726991-B2 · Aug 8, 2017 · US
Mark structure and fabrication method thereof
US-2017221833-A1 · Aug 3, 2017 · US
Metrology method and apparatus, lithographic system and device manufacturing method
US-9719945-B2 · Aug 1, 2017 · US
Photolithography alignment mark structures and semiconductor structures
US-2017170129-A1 · Jun 15, 2017 · US
Method of fabricating semiconductor
US-2017125300-A1 · May 4, 2017 · US
Lithography engraving machine
US-2017117227-A1 · Apr 27, 2017 · US
Mark forming method and device manufacturing method
US-2017110410-A1 · Apr 20, 2017 · US
Method for manufacturing silicon carbide semiconductor device
US-9620358-B2 · Apr 11, 2017 · US
Photolithography alignment mark structures, semiconductor structures, and fabrication method thereof
US-9620458-B2 · Apr 11, 2017 · US
Lithography Alignment Marks
US-2017090299-A1 · Mar 30, 2017 · US
Mark formation method and device manufacturing method
US-9568826-B2 · Feb 14, 2017 · US
Light emitting device and method for manufacturing light emitting device
US-2017012189-A1 · Jan 12, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F9/708?
- CPC G03F9/708 is the Cooperative Patent Classification code for “Mark formation.”
- How many patents are filed under CPC G03F9/708 (Mark formation)?
- Our database includes 260 publications tagged with this CPC code.
- Is patent activity under CPC G03F9/708 growing?
- Publication counts under this code: 21 in 2024 vs 22 in 2025 (latest complete years).