Mask forming method
US-11205571-B2 · Dec 21, 2021 · US
Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/063 |
| Official title | {Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids} |
| Display label | Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids |
| Total patents | 70 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2016 | 4 |
| 2017 | 10 |
| 2018 | 6 |
| 2019 | 15 |
| 2020 | 18 |
| 2021 | 7 |
| 2022 | 4 |
| 2023 | 5 |
| 2024 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Liquid dispensing nozzle and substrate treating apparatus
US-11148150-B2 · Oct 19, 2021 · US
Method and apparatus for dynamic lithographic exposure
US-2021255549-A1 · Aug 19, 2021 · US
Treatment liquid, kit, and method for washing substrate
US-11072767-B2 · Jul 27, 2021 · US
Apparatus for processing a substrate
US-2021156031-A1 · May 27, 2021 · US
Composition for TiN hard mask removal and etch residue cleaning
US-11017995-B2 · May 25, 2021 · US
Method and apparatus for dynamic lithographic exposure
US-11003089-B2 · May 11, 2021 · US
Treatment System and Method
US-2020411310-A1 · Dec 31, 2020 · US
Apparatus for treating substrate
US-2020393766-A1 · Dec 17, 2020 · US
Humidity Control in EUV Lithography
US-2020319565-A1 · Oct 8, 2020 · US
Treatment system and method
US-10796898-B2 · Oct 6, 2020 · US
Method and apparatus for dynamic lithographic exposure
US-2020241427-A1 · Jul 30, 2020 · US
Substrate treating method
US-10698315-B2 · Jun 30, 2020 · US
Developing method
US-10684548-B2 · Jun 16, 2020 · US
Treatment liquid, kit, and method for washing substrate
US-2020165547-A1 · May 28, 2020 · US
Method and apparatus for dynamic lithographic exposure
US-10663868-B2 · May 26, 2020 · US
Treatment System and Method
US-2020152449-A1 · May 14, 2020 · US
Chemical supply structure and a developing apparatus having the same
US-2020150539-A1 · May 14, 2020 · US
Chemical liquid and chemical liquid storage body
US-2020131118-A1 · Apr 30, 2020 · US
Liquid dispensing nozzle and substrate treating apparatus
US-2020122165-A1 · Apr 23, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/063?
- CPC G03F7/063 is the Cooperative Patent Classification code for “Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids.”
- How many patents are filed under CPC G03F7/063 (Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids)?
- Our database includes 70 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/063 growing?
- Publication counts under this code: 5 in 2023 vs 1 in 2024 (latest complete years).