Treatment system and method

Patent metadata

Field	Value
Publication number	US-10796898-B2
Application number	US-202016735162-A
Country	US
Kind code	B2
Filing date	Jan 6, 2020
Priority date	Sep 30, 2015
Publication date	Oct 6, 2020
Grant date	Oct 6, 2020

Abstract

A method of descumming a dielectric layer is provided. In an embodiment the dielectric layer is deposited over a substrate, and a photoresist is applied, exposed, and developed after the photoresist has been applied. Once the pattern of the photoresist is transferred to the underlying dielectric layer, a descumming process is performed, wherein the descumming process utilizes a mixture of a carbon-containing precursor, a descumming precursor, and a carrier gas. The mixture is ignited into a treatment plasma, and the treatment plasma is applied to the dielectric layer in order to descum the dielectric layer.

First claim

What is claimed is:

1. A method of manufacturing a semiconductor device, the method comprising:
etching a dielectric layer to expose a first surface of the dielectric layer; and
treating the first surface using a first treatment precursor and a recovery precursor, wherein treating the first surface comprises:
removing nitrogen atoms from the first surface of the dielectric layer using the first treatment precursor; and
replacing the removed nitrogen atoms with carbon atoms using the recovery precursor.

2. The method of claim 1 , wherein the first treatment precursor is an oxygen-containing precursor.

3. The method of claim 2 , wherein the recovery precursor is a carbon-containing precursor.

4. The method of claim 3 , wherein the first treatment precursor is oxygen, the recovery precursor is methane.

5. The method of claim 1 , wherein removing nitrogen atoms comprises:
igniting the first treatment precursor into a first plasma; and
applying the first plasma to the first surface.

6. The method of claim 5 , wherein replacing the removed nitrogen atoms comprises:
igniting the recovery precursor into a second plasma; and
applying the second plasma to the first surface.

7. The method of claim 6 , wherein the first plasma and the second plasma are applied to the first surface at a same time.

8. The method of claim 6 , wherein the first plasma and the second plasma are carried to the first surface by a carrier gas.

9. The method of claim 6 , wherein applying the first plasma breaks first bonds between silicon atoms and nitrogen atoms to create first open terminal groups, wherein applying the second plasma bonds carbon atoms to the first open terminal groups.

10. The method of claim 9 , wherein applying the first plasma further breaks second bonds between silicon atoms and carbon atoms to create second open terminal groups, wherein applying the second plasma bonds carbon atoms to the second open terminal groups.

11. The method of claim 1 , wherein the dielectric layer is formed of SiOCN.

12. A method of manufacturing a semiconductor device, the method comprising:
etching a dielectric layer to expose a first surface of the dielectric layer, wherein the first surface comprises first bonds between silicon atoms and carbon atoms and second bonds between silicon atoms and nitrogen atoms;
breaking the second bonds to leave first open terminal groups at the first surface by applying a descumming precursor; and
bonding the first open terminal groups to carbon by applying a recovery precursor.

13. The method of claim 12 , wherein etching the dielectric layer comprises etching the dielectric layer using a reactive ion etch process.

14. The method of claim 12 , wherein the descumming precursor is an oxygen-containing precursor, and the recovery precursor is a carbon-containing precursor.

15. The method of claim 12 , wherein applying the descumming precursor further breaks at least some of the first bonds to create second open terminal groups at the first surface, wherein applying the recovery precursor bonds the second open terminal groups to carbon.

16. The method of claim 12 , wherein applying the descumming precursor and applying the recovery precursor create a treated layer of the dielectric layer proximate to the first surface, wherein the method further comprises removing at least portions of the treated layer of the dielectric layer after applying the descumming precursor and after applying the recovery precursor.

17. A method of manufacturing a semiconductor device, the method comprising:
patterning a dielectric layer, wherein the dielectric layer comprises first bonds between silicon atoms and oxygen atoms and second bonds between silicon atoms and nitrogen atoms;
after the patterning the dielectric layer, breaking the second bonds by applying a plasma of a descumming precursor, wherein breaking the second bonds removes at least some of the nitrogen atoms; and
replacing the removed nitrogen atoms with carbon atoms by applying a plasma of a recovery precursor.

18. The method of claim 17 , wherein the plasma of the descumming precursor and the plasma of the recovery precursor are applied to the dielectric layer at a same time.

19. The method of claim 17 , wherein the descumming precursor is an oxygen-containing precursor, and the recovery precursor is a carbon-containing precursor.

20. The method of claim 17 , wherein the first bonds remain unchanged after applying the plasma of the descumming precursor.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Kao Wan-Yi
• Hsu Kuang-Yuan
• Lee Tze-Liang

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P76/204 Primary

  of organic photoresist masks · CPC title

• H10P70/23 Primary

  during, before or after processing of insulating materials · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P14/6532 Primary

  by exposure to a plasma · CPC title