Developing method

Patent metadata

Field	Value
Publication number	US-10684548-B2
Application number	US-201816212917-A
Country	US
Kind code	B2
Filing date	Dec 7, 2018
Priority date	Jan 7, 2015
Publication date	Jun 16, 2020
Grant date	Jun 16, 2020

Abstract

In a developing method, a developing nozzle starts discharge of developer to a position set in advance on a substrate, spinning about the center thereof, away from the center. This causes a flow of the developer at the center having a small centrifugal force immediately after the discharge is started. Accordingly, a dissolution product of a resist can be ejected outside the substrate more efficiently than the case when the discharge of the developer to the center is started. Moreover, this achieves distributed arrival positions of the developer directly discharged from the developing nozzle immediately after the discharge is started. Consequently, thin resist patterns especially at the center of the substrate are eliminated to obtain suppression in treatment variation.

First claim

What is claimed is:

1. A developing method for performing development to a substrate, the developing method comprising:
a spinning step of spinning the substrate about the center of the substrate with a spin holder;
a coating step of starting continuous discharge of a prewet liquid through a single discharge port of a prewet nozzle to a prewet liquid position set in advance on the spinning substrate away from the center, and coating the center with spread of the prewet liquid immediately after starting the discharge of the prewet liquid while generating flow of the prewet liquid at the center; and
a discharge starting step of starting discharge of developer through a developing nozzle on the spinning substrate after stopping the discharge of the prewet liquid.

2. The developing method according to claim 1 , further comprising:
a coating step of starting continuous discharge of a rinse liquid through a single discharge port of a rinse nozzle to a rinse liquid position set in advance on the spinning substrate away from the center after stopping the discharge of the developer, and coating the center with spread of the rinse liquid immediately after starting the discharge of the rinse liquid while generating flow of the rinse liquid at the center.

3. A developing method for performing development to a substrate, the developing method comprising:
a spinning step of spinning the substrate about the center of the substrate with a spin holder;
a discharge starting step of starting discharge of developer through a developing nozzle on the spinning substrate; and
a coating step of starting continuous discharge of a rinse liquid through a single discharge port of a rinse nozzle to a rinse liquid position set in advance on the spinning substrate away from the center after stopping the discharge of the developer, and coating the center with spread of the rinse liquid immediately after starting the discharge of the rinse liquid while generating flow of the rinse liquid at the center.

Assignees

• Screen Holdings Co Ltd

Inventors

• Tanaka Yuji
• Miyagi Tadashi
• Harumoto Masahiko
• Kaneyama Koji

Classifications

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P76/204

  of organic photoresist masks · CPC title

• G03F7/32

  Liquid compositions therefor, e.g. developers · CPC title

• G03F7/063

  Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids · CPC title

• B05D1/005

  Spin coating · CPC title